Patents by Inventor Sheng-Jie Hsu

Sheng-Jie Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12188974
    Abstract: A method for testing LEDs includes: Step 1: providing a wafer including a plurality of LEDs and selecting N LEDs from the plurality of LEDs to form an LED group; Step 2: selecting n LEDs from the LED group, where 1<n<N, and testing the n LEDs at a time to obtain a subgroup optical parameter of the LED group; Step 3: performing the Step 2 on the N LEDs repeatedly and alternately for another n LEDs in the LED group to obtain a plurality of the subgroup optical parameters; and Step 4: obtaining an optical parameter of each of the LEDs in the LED group from the plurality of the subgroup optical parameters.
    Type: Grant
    Filed: April 11, 2022
    Date of Patent: January 7, 2025
    Assignee: EPISTAR CORPORATION
    Inventors: Sheng Jie Hsu, Chia Hui Lin, Po Chun Liu
  • Publication number: 20230187473
    Abstract: A light-emitting device includes a substrate with a top surface; a first light-emitting structure unit and a second light-emitting structure unit separately formed on the top surface and adjacent to each other, and wherein the first light-emitting structure unit includes a first sidewall and the second light-emitting structure unit includes a second sidewall; an isolation layer formed on the first sidewall and the second sidewall, including a first edge on the first light-emitting structure unit and wherein the first edge has an acute angle in a cross-sectional view; and an electrical connection formed on the isolation layer, the first light-emitting structure unit and the second light-emitting structure unit, and electrically connecting the first light-emitting structure unit and the second light-emitting structure unit; wherein the first sidewall and the second sidewall are inclined; and wherein the electrical connection includes a first part on the first light-emitting structure unit, and the first part do
    Type: Application
    Filed: February 2, 2023
    Publication date: June 15, 2023
    Inventors: Chien-Fu SHEN, Chao-Hsing CHEN, Tsun-Kai KO, Schang-Jing HON, Sheng-Jie HSU, De-Shan KUO, Hsin-Ying WANG, Chiu-Lin YAO, Chien-Fu HUANG, Hsin-Mao LIU, Chien-Kai CHUNG
  • Patent number: 11594573
    Abstract: A light-emitting device, includes a substrate with a top surface; a first light-emitting structure unit and a second light-emitting structure unit separately formed on the top surface and adjacent to each other, and wherein the first light-emitting structure unit includes a first sidewall and a second sidewall; a trench between the first and the second light-emitting structure units; and an electrical connection arranged on the first sidewall and the second light-emitting structure unit, and electrically connecting the first light-emitting structure unit and the second light-emitting structure unit; wherein the first sidewall connects to the top surface; wherein the first sidewall faces the second light-emitting structure units, and the second sidewall is not between the first light-emitting structure unit and the second light-emitting structure unit; and wherein the second sidewall is steeper than the first sidewall.
    Type: Grant
    Filed: February 8, 2021
    Date of Patent: February 28, 2023
    Assignee: EPISTAR CORPORATION
    Inventors: Chien-Fu Shen, Chao-Hsing Chen, Tsun-Kai Ko, Schang-Jing Hon, Sheng-Jie Hsu, De-Shan Kuo, Hsin-Ying Wang, Chiu-Lin Yao, Chien-Fu Huang, Hsin-Mao Liu, Chien-Kai Chung
  • Publication number: 20220326297
    Abstract: A method for testing LEDs includes: Step 1: providing a wafer including a plurality of LEDs and selecting N LEDs from the plurality of LEDs to form an LED group; Step 2: selecting n LEDs from the LED group, where 1<n<N, and testing the n LEDs at a time to obtain a subgroup optical parameter of the LED group; Step 3: performing the Step 2 on the N LEDs repeatedly and alternately for another n LEDs in the LED group to obtain a plurality of the subgroup optical parameters; and Step 4: obtaining an optical parameter of each of the LEDs in the LED group from the plurality of the subgroup optical parameters.
    Type: Application
    Filed: April 11, 2022
    Publication date: October 13, 2022
    Inventors: Sheng Jie HSU, Chia Hui LIN, Po Chun LIU
  • Publication number: 20210183942
    Abstract: A light-emitting device, includes a substrate with a top surface; a first light-emitting structure unit and a second light-emitting structure unit separately formed on the top surface and adjacent to each other, and wherein the first light-emitting structure unit includes a first sidewall and a second sidewall; a trench between the first and the second light-emitting structure units; and an electrical connection arranged on the first sidewall and the second light-emitting structure unit, and electrically connecting the first light-emitting structure unit and the second light-emitting structure unit; wherein the first sidewall connects to the top surface; wherein the first sidewall faces the second light-emitting structure units, and the second sidewall is not between the first light-emitting structure unit and the second light-emitting structure unit; and wherein the second sidewall is steeper than the first sidewall.
    Type: Application
    Filed: February 8, 2021
    Publication date: June 17, 2021
    Inventors: Chien-Fu SHEN, Chao-Hsing CHEN, Tsun-Kai KO, Schang-Jing HON, Sheng-Jie HSU, De-Shan KUO, Hsin-Ying WANG, Chiu-Lin YAO, Chien-Fu HUANG, Hsin-Mao LIU, Chien-Kai CHUNG
  • Patent number: 10950652
    Abstract: Disclosed herein is a light-emitting device.
    Type: Grant
    Filed: July 17, 2018
    Date of Patent: March 16, 2021
    Assignee: EPISTAR CORPORATION
    Inventors: Chien-Fu Shen, Chao-Hsing Chen, Tsun-Kai Ko, Schang-Jing Hon, Sheng-Jie Hsu, De-Shan Kuo, Hsin-Ying Wang, Chiu-Lin Yao, Chien-Fu Huang, Hsin-Mao Liu, Chien-Kai Chung
  • Publication number: 20190035846
    Abstract: Disclosed herein is a light-emitting device.
    Type: Application
    Filed: July 17, 2018
    Publication date: January 31, 2019
    Inventors: Chien-Fu SHEN, Chao-Hsing CHEN, Tsun-Kai KO, Schang-Jing HON, Sheng-Jie HSU, De-Shan KUO, Hsin-Ying WANG, Chiu-Lin YAO, Chien-Fu HUANG, Hsin-Mao LIU, Chien-Kai CHUNG
  • Patent number: 10062730
    Abstract: Disclosed herein is a light-emitting device. The light-emitting device includes a substrate; a first light-emitting unit and a second light-emitting unit, separately formed on the substrate; a trench between the first and the second light-emitting units, including a bottom portion exposing the substrate; an insulating layer, comprising a first part formed on the first light-emitting unit or the second light-emitting unit, and a second part conformably formed on the trench covering the bottom portion and sidewalls of the first light-emitting unit and the second light-emitting unit; and an electrical connection, electrically connecting the first light-emitting unit and the second light-emitting unit, comprising a bridging portion formed on the second part of the insulating layer, and only covering a portion of the trench; and a joining portion, extending from the bridging portion and formed on the first part of the insulating layer; wherein the bridging portion is wider than the joining portion in a top view.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: August 28, 2018
    Assignee: EPISTAR CORPORATION
    Inventors: Chien-Fu Shen, Chao-Hsing Chen, Tsun-Kai Ko, Schang-Jing Hon, Sheng-Jie Hsu, De-Shan Kuo, Hsin-Ying Wang, Chiu-Lin Yao, Chien-Fu Huang, Hsin-Mao Liu, Chien-Kai Chung
  • Publication number: 20160307961
    Abstract: Disclosed herein is a light-emitting device. The light-emitting device includes a substrate; a first light-emitting unit and a second light-emitting unit, separately formed on the substrate; a trench between the first and the second light-emitting units, including a bottom portion exposing the substrate; an insulating layer, conformably formed on the trench and covering the bottom portion and sidewalls of the first and the second light-emitting units; and an electrical connection, formed on the insulating layer and electrically connecting the first and the second light-emitting units. The electrical connection includes a bridging portion covering the trench and a joining portion extending from the bridging portion and formed on the first and the second light-emitting units; wherein the bridging portion is wider than the joining portion; wherein a part of the insulating layer is formed under the joining portion.
    Type: Application
    Filed: June 29, 2016
    Publication date: October 20, 2016
    Inventors: Chien-Fu SHEN, Chao-Hsing CHEN, Tsun-Kai KO, Schang-Jing HON, Sheng-Jie HSU, De-Shan KUO, Hsin-Ying WANG, Chiu-Lin YAO, Chien-Fu HUANG, Hsin-Mao LIU, Chien-Kai CHUNG
  • Patent number: 9406719
    Abstract: A light-emitting structure, comprising a substrate; a first unit and a second unit, separately formed on the substrate; a trench between the first unit and the second unit, comprising a bottom portion exposing the substrate; an insulating layer arranged on the trench, conformably covering the bottom portion and sidewalls of the first unit and the second unit; and an electrical connection, conformably covering the insulating layer, electrically connecting the first unit and the second unit and comprising a bridging portion and a joining portion extending from the bridging portion, wherein the bridging portion is wider than the joining portion and the bridging portion covers the trench, and the joining portion covers the first unit and the second unit.
    Type: Grant
    Filed: October 27, 2015
    Date of Patent: August 2, 2016
    Assignee: EPISTAR CORPORATION
    Inventors: Chien-Fu Shen, Chao-Hsing Chen, Tsun-Kai Ko, Schang-Jing Hon, Sheng-Jie Hsu, De-Shan Kuo, Hsin-Ying Wang, Chiu-Lin Yao, Chien-Fu Huang, Hsin-Mao Liu, Chien-Kai Chung
  • Publication number: 20160049442
    Abstract: A light-emitting structure, comprising a substrate; a first unit and a second unit, separately formed on the substrate; a trench between the first unit and the second unit; and an electrical connection, electrically connecting the first unit and the second unit and comprising a bridging portion and a joining portion extending from the bridging portion, wherein the bridging portion is wider than the joining portion and the bridging portion is configured to cover the trench, and the joining portion is configured to cover first unit and the second unit.
    Type: Application
    Filed: October 27, 2015
    Publication date: February 18, 2016
    Inventors: Chien-Fu SHEN, Chao-Hsing CHEN, Tsun-Kai KO, Schang-Jing HON, Sheng-Jie HSU, De-Shan KUO, Hsin-Ying WANG, Chiu-Lin YAO, Chien-Fu HUANG, Hsin-Mao LIU, Chien-Kai CHUN
  • Patent number: 9196605
    Abstract: An embodiment of the present application discloses a light-emitting structure, comprising a substrate, a first unit and a second unit separately form on the substrate; a trench formed between the first unit and the second unit, and having a bottom portion exposing the substrate, a less steep sidewall and a steeper sidewall steeper than the less steep sidewall; and an electrical connection connecting the first unit and the second unit and covering the first unit, the second unit and the less steep sidewall; wherein the sidewalls directly connect to the bottom portion, and the steeper sidewall is devoid of the electrical connection covering.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: November 24, 2015
    Assignee: EPISTAR CORPORATION
    Inventors: Chien-Fu Shen, Chao-Hsing Chen, Tsun-Kai Ko, Schang-Jing Hon, Sheng-Jie Hsu, De-Shan Kuo, Hsin-Ying Wang, Chiu-Lin Yao, Chien-Fu Huang, Hsin-Mao Liu, Chien-Kai Chung
  • Patent number: 8580694
    Abstract: A method of patterning a hard mask layer for defining a deep trench is described. A substrate formed with an isolation structure therein is provided. A hard mask layer is formed over the substrate provided. A patterned photoresist layer is formed over the hard mask layer, having therein a deep-trench opening pattern over the isolation structure. An etching gas not containing hydrogen is used to etch the hard mask layer with the patterned photoresist layer as a mask and thereby transfer the deep-trench opening pattern to the hard mask layer.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: November 12, 2013
    Assignee: United Microelectronics Corp.
    Inventors: Sheng-Jie Hsu, Shin-He Siao
  • Publication number: 20130052831
    Abstract: A method of patterning a hard mask layer for defining a deep trench is described. A substrate formed with an isolation structure therein is provided. A hard mask layer is formed over the substrate provided. A patterned photoresist layer is formed over the hard mask layer, having therein a deep-trench opening pattern over the isolation structure. An etching gas not containing hydrogen is used to etch the hard mask layer with the patterned photoresist layer as a mask and thereby transfer the deep-trench opening pattern to the hard mask layer.
    Type: Application
    Filed: August 25, 2011
    Publication date: February 28, 2013
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Sheng-Jie Hsu, Shin-He Siao
  • Publication number: 20120061694
    Abstract: An embodiment of the present application discloses a light-emitting structure, comprising a first unit; a second unit; a trench formed between the first unit and the second unit, and having a less steep sidewall and a steeper sidewall steeper than the less steep sidewall; and an electrical connection arranged on the less steep sidewall.
    Type: Application
    Filed: September 13, 2011
    Publication date: March 15, 2012
    Applicant: Epistar Corporation
    Inventors: Chien-Fu Shen, Chao-Hsing Chen, Tsun-Kai Ko, Schang-Jing Hon, Sheng-Jie Hsu, De-Shan Kuo, Hsin-Ying Wang, Chiu-Lin Yao, Chien-Fu Huang, Hsin-Mao Liu, Chien-Kai Chung
  • Publication number: 20070082498
    Abstract: A wafer having a metal layer inclding salicide regions and unreacted metal regions disposed thereon is provided. Subsequently, an acidic solution is provided to remove the unreacted metal regions. Following that, a cold APM solution is used to remove particles subsequent to using the acidic solution to remove the unreacted metal regions. Finally, a mega sonic energy is applied to the wafer together with the cold APM solution or separately.
    Type: Application
    Filed: October 7, 2005
    Publication date: April 12, 2007
    Inventors: Chien-Hsun Chen, Kuang-Hua Shih, Sheng-Jie Hsu, Jung-Wei Huang