Abstract: A method for fabricating a semiconductor device includes the steps of first forming a shallow trench isolation (STI) in a substrate, forming a first gate structure on the substrate and adjacent to the STI, forming a first doped region between the first gate structure and the STI, forming a second doped region between the first doped region and the first gate structure, forming a first contact plug on the first doped region, and then forming a second contact plug on the second doped region.

Abstract: A p-GaN high-electron-mobility transistor (HEMT) includes a buffer layer stacked on a substrate, a channel layer stacked on the buffer layer, a supply layer stacked on the channel layer, a doped layer stacked on the supply layer, and a hydrogen barrier layer covering the supply layer and the doped layer. A source and a drain are electrically connected to the channel layer and the supply layer, respectively. A gate is located on the doped layer. The hydrogen barrier layer is doped with fluorine.

Abstract: A paper blocking device includes a pick roller, a cover plate, a paper blocking component, a driving mechanism, a gear mechanism and a motor. The cover plate has a pick roller window penetrated the cover plate. The pick roller is positioned in the pick roller window. The paper blocking component is coupled to the cover plate. The driving mechanism has a driving shaft and a cam being connected to the driving shaft. The cam is connected to the paper blocking component. The gear mechanism is connected to the driving shaft. The motor is connected to the gear mechanism. As described above, the paper blocking device can block papers and align the leading edges of papers.

Abstract: An adaptive image shading correction method and an adaptive image shading system are provided. The method includes: configuring an image capturing device to obtain a current frame; and configuring a processing unit to: divide the current frame into blocks; select block pairs from the blocks, in which each of the block pairs includes an inner block and an outer block; perform a filtering process for each of the block pairs to determine whether a brightness condition, a saturation condition, a hue similarity condition, and a sharpness similarity condition are met; in response to obtaining filtered block pairs, calculate a sum similarity threshold based on hue statistical data, a saturation difference, and a brightness difference; and use filtered blocks with individual thresholds less than the sum similarity threshold to calculate a shadow compensation value to adjust the current frame.

Abstract: A display device includes a circuit substrate, a blocker, a first and second pad located on the circuit substrate, a light-emitting element, and a first and second connecting portion. The blocker is located on the circuit substrate, and has an opposite first and second side and an opposite third and fourth side. The first pad is adjacent to the first side of the blocker. The second pad is adjacent to the second side of the blocker. The light-emitting element is located on the blocker and the first and second pads, and includes a first and second electrode. The first connecting portion is connected to the first electrode and the first pad. The second connecting portion is connected to the second electrode and the second pad. The third and fourth sides of the blocker are aligned with a side of each of the first and second connecting portions.

Abstract: A polarizer substrate includes a substrate, a reflective layer, and a metal pattern layer. The reflective layer is located on the substrate and has a transmission area and a reflective area. The metal pattern layer is located on the reflective layer and the substrate. The metal pattern layer includes a polarizer structure and a microstructure. The polarizer structure includes a plurality of grid lines overlapping the transmission area. A thickness of each of the grid lines is 200 nm to 500 nm, a width of each of the grid lines is 30 nm to 70 nm, and a distance between each adjacent two of the grid lines is 30 nm to 70 nm. The microstructure overlaps the reflective area, and a thickness of the microstructure is 20 nm to 500 nm.

Abstract: An active device substrate including a substrate, first metal grid wires, a first transparent conductive layer, a gate insulating layer, a semiconductor layer, a source, and a drain is provided. The first metal grid wires are located on the substrate. The first transparent conductive layer includes a scan line and a gate connected to the scan line. The scan line and/or the gate is directly connected to at least a part of the first metal grid wires. The gate insulating layer is located on the first transparent conductive layer. The semiconductor layer is located on the gate insulating layer and overlapped with the gate. The source and the drain are electrically connected to the semiconductor layer.

Abstract: A polarizer substrate includes a substrate, an organic planarization layer, an inorganic buffer layer, and a plurality of strip-shaped polarizer structures. The organic planarization layer is located on the substrate. The inorganic buffer layer is located on the organic planarization layer. The inorganic buffer layer has a plurality of trenches located on a first surface. The trenches do not penetrate through the inorganic buffer layer. The strip-shaped polarizer structures are located on the first surface of the inorganic buffer layer. Each of the trenches is located between two adjacent polarizer structures. A display panel is also provided.

Abstract: A polarizer substrate includes a substrate, a reflective layer, and a metal pattern layer. The reflective layer is located on the substrate and has a transmission area and a reflective area. The metal pattern layer is located on the reflective layer and the substrate. The metal pattern layer includes a polarizer structure and a microstructure. The polarizer structure includes a plurality of grid lines overlapping the transmission area. A thickness of each of the grid lines is 200 nm to 500 nm, a width of each of the grid lines is 30 nm to 70 nm, and a distance between each adjacent two of the grid lines is 30 nm to 70 nm. The microstructure overlaps the reflective area, and a thickness of the microstructure is 20 nm to 500 nm.

Abstract: A photosensitive device includes a display panel, a photosensitive element substrate, and a first quarter wave plate. The photosensitive element substrate is located on the back of the display panel. The photosensitive element substrate includes a first substrate, a plurality of first light emitting diodes, a plurality of photosensitive elements, and a first polarizer structure. The first light emitting diodes and the photosensitive elements are located on the first substrate. The first polarizer structure is located on the first light emitting diodes and the photosensitive elements. The first quarter wave plate is located between the first polarizer structure and the display panel.

Abstract: An active device substrate including a substrate, first metal grid wires, a first transparent conductive layer, a gate insulating layer, a semiconductor layer, a source, and a drain is provided. The first metal grid wires are located on the substrate. The first transparent conductive layer includes a scan line and a gate connected to the scan line. The scan line and/or the gate is directly connected to at least a part of the first metal grid wires. The gate insulating layer is located on the first transparent conductive layer. The semiconductor layer is located on the gate insulating layer and overlapped with the gate. The source and the drain are electrically connected to the semiconductor layer.

Abstract: An imprint mold and a method for manufacturing the same are provided. The imprint mold includes a plurality of substantially identical or different mold patterns, wherein there isn't any height difference between the mold patterns.

Abstract: A control method of a system supporting fault tolerance is provided, at first, a first host executes a transmission control protocol agent to receive a data stream from a client device. Then the TCP agent transmits an acknowledgement packet to the client device in response to the data stream from the client device. Then the TCP agent determines whether a fault tolerance mechanism of the virtual machine is activated. When the TCP agent determines that the fault tolerance mechanism of the virtual machine is activated, the TCP agent determines whether the virtual machine operates in a running state. When the TCP agent determines that the virtual machine is not in the running state, the TCP agent temporarily storing the data stream. When the TCP agent determines that the virtual machine operates in a running state, the TCP agent transmits the data stream to the virtual machine.

Abstract: A wire grid polarizer and a display panel using the same are provided. The wire grid polarizer includes a substrate, a plurality of wire grids, a plurality of patterned light absorbing layers, and a surface covering layer. The plurality of wire grids are disposed on the substrate, wherein there are a plurality of gaps between every two wire grids. The plurality of patterned light absorbing layers are disposed corresponding to and overlapping the wire grids respectively, wherein every two of the patterned light absorbing layers have one of the gaps. The surface covering layer is disposed on the patterned light absorbing layers and directly contacts the patterned light absorbing layers.

Abstract: A polarizer substrate includes a substrate, an organic planarization layer, an inorganic buffer layer, and a plurality of strip-shaped polarizer structures. The organic planarization layer is located on the substrate. The inorganic buffer layer is located on the organic planarization layer. The inorganic buffer layer has a plurality of trenches located on a first surface. The trenches do not penetrate through the inorganic buffer layer. The strip-shaped polarizer structures are located on the first surface of the inorganic buffer layer. Each of the trenches is located between two adjacent polarizer structures. A display panel is also provided.

Abstract: A polarizer substrate and manufacturing method thereof are provided. The polarizer substrate includes a substrate, a plurality of polarizer structures, a plurality of barrier structures, and a passivation layer. The polarizer structures are disposed on the substrate. Each of the polarizer structures includes a wire-grid and a capping structure disposed on the wire-grid. The barrier structures are disposed on the capping structures and not contacting with the side walls of the wire-grids. A gap between two adjacent barrier structures is smaller than a gap between two adjacent wire-grids. The passivation layer is disposed on the barrier structures.

Abstract: An aerosol generating apparatus with interchangeable parts is disclosed. The aerosol generating apparatus includes a holder for accommodating a structure plate and an oscillation generator. The structure plate includes an inlet surface, an outlet surface, a projection extending from the face of the inlet surface, and a through hole. The through hole penetrates the structure plate. The oscillation generator is coupled with and vibrates the structure plate. A reservoir for providing a liquid medicament is also disclosed. The reservoir is detachably engaged with the holder and includes a membrane with a plurality of orifices. During aerosolization, the liquid medicament passes through the plurality of orifices. When the reservoir is engaged with the holder, the membrane of the reservoir is in contact with the projection extending from the face of the inlet surface. In addition, the oscillation generator vibrates the membrane through the projection on the inlet surface.

Abstract: A wire grid polarizer and a display panel using the same are provided. The wire grid polarizer includes a substrate, a plurality of wire grids, a plurality of patterned light absorbing layers, and a surface covering layer. The plurality of wire grids are disposed on the substrate, wherein there are a plurality of gaps between every two wire grids. The plurality of patterned light absorbing layers are disposed corresponding to and overlapping the wire grids respectively, wherein every two of the patterned light absorbing layers have one of the gaps. The surface covering layer is disposed on the patterned light absorbing layers and directly contacts the patterned light absorbing layers.

Abstract: An imprint mold and a method for manufacturing the same are provided. The imprint mold includes a plurality of substantially identical or different mold patterns, wherein there isn't any height difference between the mold patterns.

Abstract: A touch polarizer and a touch display device are provided. The touch polarizer includes a first substrate, a transparent electrode layer, a wire-grid electrode layer, and a touch circuit. The transparent electrode layer is disposed on the first substrate. The wire-grid electrode layer is disposed on one side of the transparent electrode layer and includes a plurality of wires arranged parallel to each other and spaced to form a wire-grid. The touch circuit respectively connects to the transparent electrode layer and the plurality of wires and generates a touch signal based on a feedback from the transparent electrode layer and the wire-grid electrode layer.