Abstract: A method includes forming a semiconductor fin protruding above a substrate; forming a first 2D material layer across the semiconductor fin; depositing a gate material layer over the first 2D material layer; etching the gate material layer and the first 2D material layer to form a gate structure and a patterned first 2D material layer under the gate structure; laterally growing a second 2D material layer from the patterned first 2D material layer to beyond the gate structure; after laterally growing the second 2D material layer, forming gate spacers respectively on opposite sidewalls of the gate structure; and after forming the gate spacers, forming a third 2D material layer on the second 2D material layer until a combination of the third 2D material layer and the second 2D material layer comprises at least three or more monolayers of PtSe2.

Abstract: Present invention is related to a composite modified layer attached on a current collector comprising a lithiophilic particle being covered or coated by a polymer layer. The composite modified layer further could be coated with an additional carbon layer or artificial protective film as several suitable embodiments presented in this invention. The lithiophilic particle, such as sliver nano-particle, will firstly form a lithium-silver alloys to reduce a thermodynamic instability during the growth of lithium nuclei. The sliver nano-particle is able to be attached securely on the current collector by the polymer with high adhesion ability. The fuel cell including the composite modified layer in the present invention has higher average Coulombic efficiency and higher capacity retention.

Abstract: A method includes etching a dielectric layer to form a dielectric fin, depositing a transition metal dichalcogenide layer on the dielectric fin, and performing an anisotropic etching process on the transition metal dichalcogenide layer. Horizontal portions of the transition metal dichalcogenide layer are removed, and vertical portions of the transition metal dichalcogenide layer on sidewalls of the dielectric fin remain to form a vertical semiconductor ring. The method further includes forming a gate stack on a first portion of the two-dimensional semiconductor vertical semiconductor ring, and forming a source/drain contact plug, wherein the source/drain contact plug contacts sidewalls of a second portion of the vertical semiconductor ring.

Abstract: A method includes forming a semiconductor fin protruding above a substrate; forming a first 2D material layer across the semiconductor fin; depositing a gate material layer over the first 2D material layer; etching the gate material layer and the first 2D material layer to form a gate structure and a patterned first 2D material layer under the gate structure; laterally growing a second 2D material layer from the patterned first 2D material layer to beyond the gate structure; after laterally growing the second 2D material layer, forming gate spacers respectively on opposite sidewalls of the gate structure; and after forming the gate spacers, forming a third 2D material layer on the second 2D material layer until a combination of the third 2D material layer and the second 2D material layer comprises at least three or more monolayers of PtSe2.

Abstract: The present invention provides a metal and metallic ion mixed battery, which contains a positive electrode, a negative electrode, and an electrolyte, the positive electrode contains a positive electrode material with a metallic component of the battery; It only coats a small amount of negative electrode active materials that can form a metallic ion battery on the negative electrode and makes the negative electrode of the battery included dual advantages of metal and metallic ion battery; when charging, the metallic ions from the positive electrode are embedded in the negative electrode active material to make the battery have the characteristics of a metallic ion battery, and then continue to deposit on the current collector to form a metal battery. After several cycles, the battery can be charged and discharged stably and retains more than 99% of Coulombic efficiency, enhancing the overall energy density of the battery.

Abstract: A method includes etching a dielectric layer to form a dielectric fin, depositing a transition metal dichalcogenide layer on the dielectric fin, and performing an anisotropic etching process on the transition metal dichalcogenide layer. Horizontal portions of the transition metal dichalcogenide layer are removed, and vertical portions of the transition metal dichalcogenide layer on sidewalls of the dielectric fin remain to form a vertical semiconductor ring. The method further includes forming a gate stack on a first portion of the two-dimensional semiconductor vertical semiconductor ring, and forming a source/drain contact plug, wherein the source/drain contact plug contacts sidewalls of a second portion of the vertical semiconductor ring.

Abstract: A method includes depositing a dielectric layer over a substrate, forming carbon nanotubes on the dielectric layer, forming a dummy gate stack on the carbon nanotubes, forming gate spacers on opposing sides of the dummy gate stack, and removing the dummy gate stack to form a trench between the gate spacers. The carbon nanotubes are exposed to the trench. The method further includes etching a portion of the dielectric layer underlying the carbon nanotubes, with the carbon nanotubes being suspended, forming a replacement gate dielectric surrounding the carbon nanotubes, and forming a gate electrode surrounding the replacement gate dielectric.

Abstract: A method includes depositing a dielectric layer over a substrate, forming carbon nanotubes on the dielectric layer, forming a dummy gate stack on the carbon nanotubes, forming gate spacers on opposing sides of the dummy gate stack, and removing the dummy gate stack to form a trench between the gate spacers. The carbon nanotubes are exposed to the trench. The method further includes etching a portion of the dielectric layer underlying the carbon nanotubes, with the carbon nanotubes being suspended, forming a replacement gate dielectric surrounding the carbon nanotubes, and forming a gate electrode surrounding the replacement gate dielectric.

Abstract: A method includes etching a dielectric layer to form a dielectric fin, depositing a transition metal dichalcogenide layer on the dielectric fin, and performing an anisotropic etching process on the transition metal dichalcogenide layer. Horizontal portions of the transition metal dichalcogenide layer are removed, and vertical portions of the transition metal dichalcogenide layer on sidewalls of the dielectric fin remain to form a vertical semiconductor ring. The method further includes forming a gate stack on a first portion of the two-dimensional semiconductor vertical semiconductor ring, and forming a source/drain contact plug, wherein the source/drain contact plug contacts sidewalls of a second portion of the vertical semiconductor ring.

Abstract: A method includes etching a dielectric layer to form a dielectric fin, depositing a transition metal dichalcogenide layer on the dielectric fin, and performing an anisotropic etching process on the transition metal dichalcogenide layer. Horizontal portions of the transition metal dichalcogenide layer are removed, and vertical portions of the transition metal dichalcogenide layer on sidewalls of the dielectric fin remain to form a vertical semiconductor ring. The method further includes forming a gate stack on a first portion of the two-dimensional semiconductor vertical semiconductor ring, and forming a source/drain contact plug, wherein the source/drain contact plug contacts sidewalls of a second portion of the vertical semiconductor ring.

Abstract: In some examples, a device can include a display coupled to a locking mechanism, wherein the locking mechanism applies a first force in a first direction, an enclosure coupled to the display with the locking mechanism, and a spring mechanism coupled to the enclosure and the locking mechanism to prevent a tension level between the display and the enclosure from exceeding a tension threshold, wherein the spring mechanism applies a second force in a second direction.

Abstract: A method includes forming a semiconductor fin protruding above a substrate; forming a first 2D material layer across the semiconductor fin; depositing a gate material layer over the first 2D material layer; etching the gate material layer and the first 2D material layer to form a gate structure and a patterned first 2D material layer under the gate structure; laterally growing a second 2D material layer from the patterned first 2D material layer to beyond the gate structure; after laterally growing the second 2D material layer, forming gate spacers respectively on opposite sidewalls of the gate structure; and after forming the gate spacers, forming a third 2D material layer on the second 2D material layer until a combination of the third 2D material layer and the second 2D material layer comprises at least three or more monolayers of PtSe2.

Abstract: A method includes depositing a dielectric layer over a substrate, forming carbon nanotubes on the dielectric layer, forming a dummy gate stack on the carbon nanotubes, forming gate spacers on opposing sides of the dummy gate stack, and removing the dummy gate stack to form a trench between the gate spacers. The carbon nanotubes are exposed to the trench. The method further includes etching a portion of the dielectric layer underlying the carbon nanotubes, with the carbon nanotubes being suspended, forming a replacement gate dielectric surrounding the carbon nanotubes, and forming a gate electrode surrounding the replacement gate dielectric.

Abstract: A semiconductor device includes a substrate, a gate structure, semimetallic source/drain structures, and source/drain contacts. The gate structure is over the substrate. The semimetallic source/drain structures are respectively on opposite sides of the gate structure, in which a band structure of each of the semimetallic source/drain structures has a valence band and a conduction band at different symmetry k-points. The source/drain contacts land on top surfaces of the semimetallic source/drain structures, respectively.

Abstract: In some examples, a device can include a display coupled to a locking mechanism, wherein the locking mechanism applies a first force in a first direction, an enclosure coupled to the display with the locking mechanism, and a spring mechanism coupled to the enclosure and the locking mechanism to prevent a tension level between the display and the enclosure from exceeding a tension threshold, wherein the spring mechanism applies a second force in a second direction.

Abstract: A method includes etching a dielectric layer to form a dielectric fin, depositing a transition metal dichalcogenide layer on the dielectric fin, and performing an anisotropic etching process on the transition metal dichalcogenide layer. Horizontal portions of the transition metal dichalcogenide layer are removed, and vertical portions of the transition metal dichalcogenide layer on sidewalls of the dielectric fin remain to form a vertical semiconductor ring. The method further includes forming a gate stack on a first portion of the two-dimensional semiconductor vertical semiconductor ring, and forming a source/drain contact plug, wherein the source/drain contact plug contacts sidewalls of a second portion of the vertical semiconductor ring.

Abstract: A semiconductor device includes a substrate, a gate structure, semimetallic source/drain structures, and source/drain contacts. The gate structure is over the substrate. The semimetallic source/drain structures are respectively on opposite sides of the gate structure, in which a band structure of each of the semimetallic source/drain structures has a valence band and a conduction band at different symmetry k-points. The source/drain contacts land on top surfaces of the semimetallic source/drain structures, respectively.

Abstract: A latch mechanism that includes first and second latch members is described according to one aspect of the present disclosure. The first latch member is connected to a back cover of an electronic device and has an engaging portion. The second latch member is connected to a main casing body of the electronic device and has an engaging segment and a pushing segment. The second latch member is rotatable between a locking position, where the engaging segment engages the engaging portion, and a releasing position, where the engaging segment is disengaged from the engaging portion and the pushing segment pushes the first latch member, thereby facilitating removal of the back cover from the main casing body.