Abstract: According to an embodiment, a method for estimating robustness of a trained machine learning model is disclosed. The method comprises receiving a labelled dataset, a model of an object for which defect detection is required, and the trained machine learning model. Further, the method comprises determining one or more parameters associated with image capturing conditions in the environment. Furthermore, the method comprises performing an auto extraction of one or more defects using the model of the object and the labelled dataset based on image processing. Furthermore, the method comprises generating one or more images based on the one or more parameters and the one or more defects. Additionally, the method comprises testing the trained machine learning model using the generated images. Moreover, the method comprises estimating a robustness report for the machine learning model based on the testing of the machine learning model.

Abstract: The present invention provides a method for determining hydrogen sulfide (H2S) by headspace single-drop liquid phase microextraction and intelligent device colorimetry, which comprises: taking a silver-gold core-shell triangular nanosheet (Ag@Au TNS) as a nanodetection probe, in combination with an analysis method of headspace single-drop microextraction (HS-SDME), specifically extracting H2S volatilized from a sample to be detected by the nanodetection probe, and detecting H2S in the extracted sample with the help of the photographing function of an intelligent device and a color picking software. Compared with the prior art, the present invention adopts intelligent device colorimetry, with the limit of detection of about 65 nM and the linear range of 0.1-100 ?M, and the established method can be applied to the determination of H2S in actual samples such as egg white, milk and other opaque samples, and has the advantages of few procedures, simple operation, high detection efficiency and the like.

Abstract: Disclosed are a pallet configured to bear a battery cell. The pallet includes an external fixing rack and a plurality of supporting beams. A mounting space is formed inside the external fixing rack. The plurality of supporting beams are disposed in the mounting space. The plurality of supporting beams are arranged along a first direction. The plurality of supporting beams are connected to the external fixing rack separately. At least two of the supporting beams are spaced apart. The plurality of supporting beams are configured to bear the battery cell.

Abstract: The present disclosure provides techniques of preloading video data. The techniques comprises acquiring a video to be played; acquiring information indicative of historical behaviors of users who watched the video; segmenting the video into a plurality of video segments; determining a historical search rate corresponding to each of the plurality of video segments based on the information indicative of the historical behaviors of the users; and determining a video segment among the plurality of video segments as a first target video segment based on the historical search rate corresponding to each of the plurality of video segments, wherein the video segment has a historical search rate greater than or equal to a preset probability threshold; and preloading the first target video segment of the video.

Abstract: A constraining apparatus and a constraining device are described. The constraining apparatus includes a base, a positioning assembly, and a cushion assembly. The positioning assembly includes a plurality of positioning members arranged in sequence and located between two end plate assemblies. The cushion assembly is disposed on at least one of two sides of the positioning member that are opposite each other in the first direction. The constraining apparatus includes a first state and a second state, where in the first state, adjacent two of the positioning members abut against each other, such that an accommodating space for accommodating a battery cell is formed between the adjacent two of the positioning members, and the cushion assembly is configured to abut against the battery cell and the positioning members. In the second state, the plurality of positioning members are spaced apart from each other in the first direction.

Abstract: According to the present disclosure, a measuring method of liquid mixture purity includes steps as follows. A storage tank is provided, wherein the storage tank is configured for storing a liquid mixture including formic acid and water. A calculating unit is provided, wherein a plurality of formic acid purity values are saved in the calculating unit. A pressure-decreasing and heating step is performed by reducing a pressure of the storage tank and heating the storage tank. A measuring step is performed by measuring in the inner space of the storage tank to obtain a pressure value, and measuring the liquid mixture simultaneously to obtain a temperature value. A calculating step is performed by inputting the pressure value and the temperature value into the calculating unit, wherein the calculating unit outputs one of the formic acid purity values corresponding thereto.

Abstract: In a method of patterning an integrated circuit, test layer thickness variation data is received when a test layer with a known thickness disposed over a test substrate undergoes tilted angle plasma etching. Overlay offset data per substrate locations caused by the tilted angle plasma etching is determined. The overlay offset data is determined based on the received thickness variation data. The overlay offset data is associated with an overlay between first circuit patterns of a first layer on the semiconductor substrate and corresponding second circuit patterns of a second layer disposed over the first layer on the substrate. A location of the substrate is adjusted based on the overlay offset data during a lithography operation to pattern a resist layer over the second layer. The second layer is patterned based on the projected layout patterns of the reticle and using the tilted angle plasma etching.

Abstract: The present invention relates to the field of air conditioners, and in particular to an air conditioner front panel control method and a front panel apparatus. A first air outlet and a front panel movably provided on the front end face are provided on the front end face of an air conditioner; when moving forward and backward relative to the front end face, the front panel forms, with the front end face, an air outlet channel communicated with the first air outlet, and the air outlet channel forms at least one second air outlet at the peripheral edge of the front panel. The front panel control method comprises the steps of: controlling a front panel to move and adjusting a spatial position thereof, so as to control an air inlet volume of the air outlet channel.

Abstract: A method and system for sampling and augmenting a dataset associated with a first class and a second class, respectively, to balance the dataset of images is described. The method includes receiving a required number of reduced set of dataset images associated with the first class, creating a plurality of clusters from a set of images associated with the first class, and selecting a representative image from each cluster to provide a reduced set of images. Further, a median image and a non-defect artifact mask is generated corresponding to the set of images associated with the first class. Additionally, a defect foreground is extracted based on the median image and each defect image of another set of images associated with the second class. Finally, the at least one non-defect artifact is removed from the defect foreground to provide a new synthetic defect image for each defect image for augmentation.

Abstract: A cable management device in a server chassis able to hold and safeguard a greatly extended range of cable lengths, and server chassis including same, comprises connecting assembly, sliding rail assembly, and cable management assembly. The sliding rail assembly includes parallel first and second sliding rails, the first sliding rail including outer, middle, and inner rails, and the second sliding rail including similar outer, middle, and inner rails. The assembly includes first to fourth sliding arms, together with a supporting bar. The first sliding arm is movably connected to the outer rail of the second sliding rail, and the fourth sliding arm is movably connected to the inner rail of the first sliding rail. One end of the supporting bar is connected to the middle rail of the first sliding rail, the other end is connected to the middle rail of the second sliding rail.

Abstract: An optical lens includes a first lens group, a second lens group and an aperture stop. The first lens group includes three lenses with refractive powers. The second lens group has a positive refractive power and includes two lenses with refractive power. The aperture stop is disposed between the first lens group and the second lens group. The optical lens satisfies the conditions of 2 mm<DL<6 mm, LT<15 mm and 0.2<DL/LT<0.38, where DL is a diameter of a lens surface of the second lens group furthest from the first lens group, and LT is a length measured on the optical axis between two outermost lens surfaces of the optical lens.

Abstract: A method for evaluation of thin film non-uniform stress using high order wafer warpage, the steps including measuring a net wafer warpage across a wafer area due to thin film deposition, fitting a two dimensional low-order polynomial to the wafer warpage measurements and subtracting the low-order polynomial from the net wafer warpage across the wafer area.

Abstract: In a method of patterning an integrated circuit, test layer thickness variation data is received when a test layer with a known thickness disposed over a test substrate undergoes tilted angle plasma etching. Overlay offset data per substrate locations caused by the tilted angle plasma etching is determined. The overlay offset data is determined based on the received thickness variation data. The overlay offset data is associated with an overlay between first circuit patterns of a first layer on the semiconductor substrate and corresponding second circuit patterns of a second layer disposed over the first layer on the substrate. A location of the substrate is adjusted based on the overlay offset data during a lithography operation to pattern a resist layer over the second layer. The second layer is patterned based on the projected layout patterns of the reticle and using the tilted angle plasma etching.

Abstract: The present invention relates to a compound as shown in general formula (I) below (in formula (I), each of R1 and R2 independently represents a hydrogen atom or a C1-10 linear or branched alkyl optionally having a substituent, or the two together form a cycloalkyl with 3 to 8 ring carbon atoms; each of R3 and R4 independently represents a hydrogen atom or a C1-10 linear or branched alkyl optionally having a substituent or a C6-12 aryl optionally having a substituent, or the two together form a cycloalky with 3 to 8 ring carbon atoms; X represents C or N; and Y represents a linear or branched alkenyl or alkynyl with 2 to 6 carbon atoms and optionally having a substituent, or carboxyl). The compound has good antibacterial properties against bacteria, especially gram-negative bacteria, has low drug resistance, and has good prospects for the effective treatment of various conditions.

Abstract: A liquid chromatography method for simultaneously detecting multiple microRNAs based on a duplex-specific nuclease (DSN) cyclic amplification technology comprises the following steps: designing a fluorophore-modified single-stranded DNA probe according to a target microRNA to be detected and loading the probe onto a surface of a streptavidin-coated magnetic bead (MB) to serve as a detection probe; adding a target microRNA sample to be detected and DSN to the detection probe, fully mixing the same, and incubating the mixture; after the incubation, completely removing the magnetic bead and the unreacted DNA probe to obtain a separated solution; and injecting the separated solution into a high-performance liquid chromatography system for separation and quantification.

Abstract: A method to perform. beam management (BM) and/or synchronization (Sync) using primary synchronization signal (PSS) when pilot contamination is low to improve system performance is proposed. A UE first determines pilot contamination. level on PSS of a synchronization signal block (SSB), depending on different network deployment. scenarios. The UE then adaptively perform BM or Sync, by dynamically adjusting to the pilot contamination level on PSS. If the pilot contamination level is high, then the UE follows a 3-symbol mode, e.g., uses only PBCH0, SSS, and PBCH2 symbols for performing BM or Sync. Otherwise, if the pilot contamination level is low, then the UE follows a 4-symbol mode, e.g., uses PSS as an extra symbol for BM or Sync to improve system performance.

Abstract: The present subject matter describes a method for labeling data in a computing system based on artificial intelligent techniques. The method comprises receiving input data and ordering the received input-data in a plurality of classes inferred based on at-least one of clustering and anomaly detection. The method further comprises receiving one more manual annotated labels for the ordered data. A first machine-learning (ML) model is trained with respect to the ordered data and thereby generating new labels. The performance of the first ML model is computed based on a comparison between the manual labels and the new labels. The labels are automatically propagated to unlabelled-portion of the ordered data based on execution of the first ML model based on accuracy of first ML model being above a predefined threshold.

Abstract: In a method of patterning an integrated circuit, test layer thickness variation data is received when a test layer with a known thickness disposed over a test substrate undergoes tilted angle plasma etching. Overlay offset data per substrate locations caused by the tilted angle plasma etching is determined. The overlay offset data is determined based on the received thickness variation data. The overlay offset data is associated with an overlay between first circuit patterns of a first layer on the semiconductor substrate and corresponding second circuit patterns of a second layer disposed over the first layer on the substrate. A location of the substrate is adjusted based on the overlay offset data during a lithography operation to pattern a resist layer over the second layer. The second layer is patterned based on the projected layout patterns of the reticle and using the tilted angle plasma etching.

Abstract: A method for manufacturing a memory device includes forming a dielectric layer over a wafer, wherein the wafer has a device region and a peripheral region adjacent to the device region. A bottom via opening is formed in the dielectric layer and over the device region of the wafer and a trench is fanned in the dielectric layer and over the peripheral region of the wafer. A bottom electrode via is formed in the bottom via opening. A bottom electrode layer is conformally formed over the bottom electrode via and lining a sidewall and a bottom of the trench. A memory layer and a top electrode are formed over the bottom electrode layer.

Abstract: A cable management device in a server chassis able to hold and safeguard a greatly extended range of cable lengths, and server chassis including same, comprises connecting assembly, sliding rail assembly, and cable management assembly. The sliding rail assembly includes parallel first and second sliding rails, the first sliding rail including outer, middle, and inner rails, and the second sliding rail including similar outer, middle, and inner rails. The assembly includes first to fourth sliding arms, together with a supporting bar. The first sliding arm is movably connected to the outer rail of the second sliding rail, and the fourth sliding arm is movably connected to the inner rail of the first sliding rail. One end of the supporting bar is connected to the middle rail of the first sliding rail, the other end is connected to the middle rail of the second sliding rail.