Patents by Inventor SHENG-YAO HSUEH

SHENG-YAO HSUEH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10457621
    Abstract: A process for preparing aryl ketones is disclosed. The process includes photo-oxidizing a compound of formula (V), (VI), (VII) or (VIII): in the presence of an oxidative system comprising at least one bromide compound to form aryl ketones. X1, X2, R1, R2, R3, L1, L2, L3, L4, t, n, m and p have the meanings as described in the specification and claims.
    Type: Grant
    Filed: August 5, 2016
    Date of Patent: October 29, 2019
    Assignee: ETERNAL MATERIALS CO., LTD.
    Inventors: Sheng-Yao Hsueh, Chih-An Chen, You-Han Lin, Hao-Tien Bai
  • Publication number: 20180057429
    Abstract: A system for preparing an aromatic derivative is provided, including: a photo-bromination reaction section for performing a photocatalytic reaction of an aromatic hydrocarbon and a brominating agent to form an aromatic hydrocarbon bromide; a substitution reaction section for performing a substitution reaction of the an aromatic hydrocarbon bromide from the photo-bromination reaction section with an alkali base compound or an alkali carboxylate compound to form an aromatic derivative; and a regeneration unit for reacting an alkali metal bromide formed by the substitution reaction section with an acid to form a hydrobromic acid. The regeneration unit is in fluid communication with the photo-bromination reaction section, such that the hydrobromic acid is recycled to the photo-bromination reaction section. A method for preparing the aromatic derivative is also provided.
    Type: Application
    Filed: August 24, 2017
    Publication date: March 1, 2018
    Inventors: Chan-Chia HSU, Sheng-Yao HSUEH
  • Publication number: 20170036981
    Abstract: A process for preparing aryl ketones is disclosed. The process includes photo-oxidizing a compound of formula (V), (VI), (VII) or (VIII): in the presence of an oxidative system comprising at least one bromide compound to form aryl ketones. X1, X2, R1, R2, R3, L1, L2, L3, L4, t, n, m and p have the meanings as described in the specification and claims.
    Type: Application
    Filed: August 5, 2016
    Publication date: February 9, 2017
    Applicant: ETERNAL MATERIALS CO., LTD.
    Inventors: Sheng-Yao HSUEH, Chih-An CHEN, You-Han LIN, Hao-Tien BAI
  • Patent number: 9340644
    Abstract: A self-sensitive polymerizable liquid resin is provided, which contains an uncrosslinked Michael addition reaction product of the following components: a Michael donor, a Michael accepter and optionally a viscosity modifier. The Michael accepter has 5 to 18 acryloyl functional groups. The self-sensitive polymerizable liquid resin of the present invention is capable of being used as an aid in a coating composition and providing a good property in deep radiation curing, and is particularly applicable in color coatings.
    Type: Grant
    Filed: May 3, 2013
    Date of Patent: May 17, 2016
    Assignee: ETERNAL MATERIALS CO., LTD.
    Inventors: Sheng-Yao Hsueh, Hung-Yu Wang
  • Patent number: 9068046
    Abstract: Sulfur-containing oligomer and dendrimer of acrylate and preparation methods thereof are provided. The sulfur-containing oligomer and dendrimer of acrylate are prepared by reacting monomers A and B in Michael addition reaction.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: June 30, 2015
    Assignee: Eternal Materials Co., Ltd.
    Inventors: Xiu-Xia Ma, Wen-Fang Shi, Jing Jiang, Sheng-Yao Hsueh, Chih-Kang Chou
  • Publication number: 20140171597
    Abstract: Sulfur-containing oligomer and dendrimer of acrylate and preparation methods thereof are provided. The sulfur-containing oligomer and dendrimer of acrylate are prepared by reacting monomers A and B in Michael addition reaction.
    Type: Application
    Filed: September 27, 2013
    Publication date: June 19, 2014
    Inventors: Xiu-Xia MA, Wen-Fang Shi, Jing Jiang, Sheng-Yao Hsueh, Chih-Kang Chou
  • Publication number: 20130296485
    Abstract: A self-sensitive polymerizable liquid resin is provided, which contains an uncrosslinked Michael addition reaction product of the following components: a Michael donor, a Michael accepter and optionally a viscosity modifier. The Michael accepter has 5 to 18 acryloyl functional groups. The self-sensitive polymerizable liquid resin of the present invention is capable of being used as an aid in a coating composition and providing a good property in deep radiation curing, and is particularly applicable in color coatings.
    Type: Application
    Filed: May 3, 2013
    Publication date: November 7, 2013
    Applicant: ETERNAL CHEMICAL CO., LTD.
    Inventors: SHENG-YAO HSUEH, HUNG-YU WANG