Abstract: A method of manufacturing an optical system is described. The method comprises designing at least one performance specification for an optical system, defining at least one fabrication parameter of a component of the optical system, fabricating the component according to the at least one fabrication parameter, obtaining at least one fabrication error of the component during the fabrication process, predicting at least one operation performance of the optical system by simulating with the at least one fabrication error, determining whether the operation performance corresponds with the at least one performance specification, and repeating fabricating the component by using at least one new parameter if the operation performance does not correspond with the at least one performance specification.

Abstract: A method which directly incorporates patterning fidelity into the design of a patterning system is provided. A production result of a target pattern is simulated according to a set of design parameters to obtain a simulated pattern. The target pattern is compared with the simulated pattern to obtain a patterning fidelity, and the values of the set of design parameters of the patterning system are adjusted according to a target patterning fidelity to optimize the values of the set of design parameters of the patterning system.

Abstract: A method which directly incorporates patterning fidelity into the design of a patterning system is provided. A production result of a target pattern is simulated according to a set of design parameters to obtain a simulated pattern. The target pattern is compared with the simulated pattern to obtain a patterning fidelity, and the values of the set of design parameters of the patterning system are adjusted according to a target patterning fidelity to optimize the values of the set of design parameters of the patterning system.

Abstract: This invention provides a system for estimating change of status of one or a plurality of particle beams, the system comprises a plurality of particle detectors and an estimating unit, wherein one or a plurality of particle beams is being projected to a substrate. The particle detectors detect the one or the plurality particle beams reflected from the substrate to generate one or a plurality of detected signals. The estimating unit estimates change of the status of the one or the plurality of particle beams according to the one or the plurality of detected signals. By such arrangement and estimating method, the system could estimate multiple beams and achieve beam placement accuracy.

Abstract: This invention provides an apparatus for estimating change of status of a plurality of particle beams, the apparatus includes a plurality of particle detectors and an estimating unit, wherein the one or the plurality of particle beams is projected to a substrate. The particle detectors detect the one or the plurality of particle beams reflected from the substrate to generate one or a plurality of detector signals. The estimating unit estimates change of the status of the one or the plurality of particle beams by executing a mathematical programming method according to the one or the plurality of detector signals. By such arrangement and monitoring method, the apparatus could estimate the drift of beams.

Abstract: This invention provides a system capable of adjusting status of one or a plurality of particle beams, the system includes a plurality of particle detectors, an estimating unit and a controller, wherein one or a plurality of particle beams are projected to a substrate. The particle detectors detect the one or the plurality of particle beams reflected from the substrate to generate one or a plurality of detector signals in response thereto. The estimating unit estimates status information of the one or the plurality of particle beams by executing a mathematical method according to the one or the plurality of detector signals. The controller adjusts or corrects status of the one or the plurality of particle beams corresponding to the substrate according to the estimated status information of the one or the plurality of particle beams. The substrate is made pattern progressively in a sequence according to a desired pattern.

Abstract: A short-range inter-vehicle communication and warning apparatus comprises a forward radar and a backward radar. The apparatus uses the radars to generate Frequency Modulation/Continuous Wave (FMCW) signals, uses amplitude shift keying for data modulation and arranges a special packet format, to realize such a low cost and fast response device of collision avoidance for vehicles. The invention has the dual capabilities of detecting and communicating simultaneously. It can also measure the relative speed of a preceding/rear vehicles and the relative inter-vehicle distance. The invention also exchanges the real-time traffic information with the preceding/rear vehicles at the same time. It is applicable to a one-to-one or one-to-many inter-vehicle channel model.

Abstract: A short-range inter-vehicle communication and warning apparatus comprises a forward radar and a backward radar. The apparatus uses the radars to generate Frequency Modulation/Continuous Wave (FMCW) signals, uses amplitude shift keying for data modulation and arranges a special packet format, to realize such a low cost and fast response device of collision avoidance for vehicles. The invention has the dual capabilities of detecting and communicating simultaneously. It can also measure the relative speed of a preceding/rear vehicles and the relative inter-vehicle distance. The invention also exchanges the real-time traffic information with the preceding/rear vehicles at the same time. It is applicable to a one-to-one or one-to-many inter-vehicle channel model.