Abstract: The present invention provides a branched poly(amino acid) antimicrobial agent, comprising a branched poly(amino acid); the branched poly(amino acid) is obtained by the homopolymerization of one amino acid unit, or is obtained by the copolymerization of two or more amino acid units; the amino acid unit has a structure shown by Formula I. The present invention uses the amino acid as raw material, is non-toxic, has no side effects, and is a green and environmentally friendly new antimicrobial agent, and accessible to the users. The branched structure of the poly(amino acid) results in that such material has many active functional groups, may be further modified, has good biocompatibility, and will not develop drug resistance during the long-term use of this antimicrobial agent.

Abstract: Provided herein are block copolymer thin film structures and methods of fabrication. The methods involve directing the assembly of ABA triblock copolymers such that desired features are formed by domains of the assembled ABA triblock copolymer. In some embodiments, an ABA triblock copolymer is directed to assemble by a chemical pattern. Chemical patterns with periods much different than the natural period of the ABA triblock copolymer may be used to direct assembly of the ABA triblock copolymer.

Abstract: Perpendicular nanostructures with small feature dimensions in thin films and related methods of fabrication are provided. In some embodiments, the methods include directed assembly of poly(styrene-b-glycolic acid) (PS-b-PGA), poly(styrene-b-lactic acid) (PS-b-PLA) and other block copolymers containing PGA or a derivative thereof. The block copolymer films can be directed to assemble on chemical patterns such that the nanostructures extend through the thickness of the film, without forming a wetting layer at the free surface. The nanostructures can have sub-10 nm feature dimensions.

Abstract: Provided herein are block copolymer thin film structures and methods of fabrication. The methods involve directing the assembly of ABA triblock copolymers such that desired features are formed by domains of the assembled ABA triblock copolymer. In some embodiments, an ABA triblock copolymer is directed to assemble by a chemical pattern. Chemical patterns with periods much different than the natural period of the ABA triblock copolymer may be used to direct assembly of the ABA triblock copolymer.

Abstract: Methods of creating and transferring chemical patterns and physical patterns of deposited materials or molecules using block copolymers are provided. The methods involve providing block copolymer materials blended with one or more transfer molecules or inks. The differences in chemistry of the blocks of the copolymer that result in micro-phase separation (e.g., self-assembly into nanoscale domains) also allow inks to be sequestered into specific blocks. By designing the ink molecules to react, adsorb, or otherwise interact with a second substrate, inks are transferred to the second substrate in a pattern dictated by the pattern of block copolymer domains present at the surface of the block copolymer film.

Abstract: Methods of creating and transferring chemical patterns and physical patterns of deposited materials or molecules using block copolymers are provided. The methods involve providing block copolymer materials blended with one or more transfer molecules or inks. The differences in chemistry of the blocks of the copolymer that result in micro-phase separation (e.g., self-assembly into nanoscale domains) also allow inks to be sequestered into specific blocks. By designing the ink molecules to react, adsorb, or otherwise interact with a second substrate, inks are transferred to the second substrate in a pattern dictated by the pattern of block copolymer domains present at the surface of the block copolymer film.