Abstract: Interconnect apparatus and methods for their manufacture are disclosed. An example method for forming a solderable connection to a conductive surface may include forming one or more solderable metal regions on the conductive surface, for example an aluminum surface. The method may comprise applying a solder layer to the one or more solderable metal regions to form one or more soldered metal regions. The method may further comprise depositing one or more solderable metal regions on the conductive surface by plasma deposition. In other examples, the one or more solderable metal regions may be sputtered. Additionally, the method may comprise applying a flux to the one or more solderable metal regions prior to applying the solder layer to the one or more solderable metal regions. An interconnect ribbon may be soldered to at least one of the solder layer or the solderable metal regions. Associated interconnect apparatus are also provided.