Abstract: A method for creating a patterned thin film of a high surface energy material on a substrate comprising the steps of creating a photomask pattern on the substrate using photolithography, providing an oppositely charged surface on the substrate and photomask, if such does not exist, from that of particles of the high surface energy material, removing the photomask and exposing the substrate to an aqueous colloidal suspension of particles composed of the high surface energy material to adsorb seed particles onto the surface of the substrate, or removing the photomask after adsorbing seed particles to the surface, and then depositing a uniform thin film of the high surface energy material by chemical vapor deposition onto the seeded substrate.