Patents by Inventor Shi Chai Chong

Shi Chai Chong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110265821
    Abstract: Techniques and systems for maintaining a plasma processing kit consisting of protection and shielding elements without causing damage are introduced. The elements may be made of aluminium, polysilicon and quartz and may be coated with silicon. The surfaces of the elemants show a specified roughness. Precision cleaning and recovery of the contamined kit components of a plasma doping (PLAD) system is used, to extend the life and reusability of the components. The methods described cover the stages of inspection, pre-cleaning, mechanical processing and texturing, post-cleaning, clean-room class cleaning and packaging of the components consisting of quartz, aluminium and/or silicon. Techniques described employ the combination of a variety of means (primarily chemical and mechanical) to achieve the desired levels of cleanliness. The result obtained by methods that include Inductively Coupled Plasma-Mass Spectrometry (ICP-MS) and Laser Particle Count affirm the efficacy of these techniques.
    Type: Application
    Filed: August 28, 2009
    Publication date: November 3, 2011
    Inventors: Kiang Meng Tay, Eugapore Wei Khal Mah, Huay Meei Liew, Teck Kwang Tay, Chua Bong Lee, Shi Chai Chong, James Edward White, Rudolph John Caruso, Daniel Allen Simon, Elie Eid Rahme
  • Patent number: 7423375
    Abstract: An electroluminescent device having a protection layer in the cap bonding region to which the cap is bonded. The protection layer can be formed from photosensitive or non-photosensitive materials. The protection layer protects the layers below from being damage during removal of polymer materials.
    Type: Grant
    Filed: May 7, 2002
    Date of Patent: September 9, 2008
    Assignee: OSRAM GmbH
    Inventors: Ewald Guenther, Hooi Bin Lim, Shi Chai Chong, David Lacey
  • Patent number: 7148624
    Abstract: A method to ensure uniform deposition of organic layer is disclosed. Since the organic layer is very thin, any deviation from the target thickness will result in visible optical defects. A homogenous layer which exhibits good coating behaviour with organic materials is provided beneath the organic layer. By covering the metal interconnects, the adverse effect on the uniformity of the polymer layer is reduced or prevented.
    Type: Grant
    Filed: April 17, 2003
    Date of Patent: December 12, 2006
    Assignee: Osram Opto Semiconductors (Malaysia) Sdn. Bhd
    Inventors: Ewald Guenther, Hooi Bin Lim, Cheng Kooi Tan, Shi Chai Chong, Hagen Klausmann
  • Publication number: 20030214232
    Abstract: A method to ensure uniform deposition of organic layer is disclosed. Since the organic layer is very thin, any deviation from the target thickness will result in visible optical defects. A homogenous layer which exhibits good coating behaviour with organic materials is provided beneath the organic layer. By covering the metal interconnects, the adverse effect on the uniformity of the polymer layer is reduced or prevented.
    Type: Application
    Filed: April 17, 2003
    Publication date: November 20, 2003
    Inventors: Ewald Guenther, Hooi Bin Lim, Cheng Kooi Tan, Shi Chai Chong, Hagen Klausmann
  • Publication number: 20030209979
    Abstract: An electroluminescent device having a protection layer in the cap bonding region to which the cap is bonded. The protection layer can be formed from photosensitive or non-photosensitive materials. The protection layer protects the layers below from being damage during removal of polymer materials.
    Type: Application
    Filed: May 7, 2002
    Publication date: November 13, 2003
    Applicant: Osram Opto Semiconductors GmbH
    Inventors: Ewald Guenther, Hooi Bin Lim, Shi Chai Chong, David Lacey