Patents by Inventor Shi-Lung Chang

Shi-Lung Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE
    Publication number: 20240085797
    Abstract: A method of controlling an extreme ultraviolet (EUV) lithography system is disclosed. The method includes irradiating a target droplet with EUV radiation, detecting EUV radiation reflected by the target droplet, determining aberration of the detected EUV radiation, determining a Zernike polynomial corresponding to the aberration, and performing a corrective action to reduce a shift in Zernike coefficients of the Zernike polynomial.
    Type: Application
    Filed: November 13, 2023
    Publication date: March 14, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ting-Ya CHENG, Han-Lung CHANG, Shi-Han SHANN, Li-Jui CHEN, Yen-Shuo SU
  • Note paper-holding pen
    Patent number: 4872775
    Abstract: A slip-holding pen includes a slip reel, having a paper roll with its two opposite ends coated and bonded by an adhesive, rotatably mounted in a penholder and a rotating knob clickingly rotating the slip reel to reel off the slip paper as originally wound on the reel through a longitudinal slit which is formed on the penholder having acute wedges formed at the slit to tear the adhesive-bonded slip paper, so that the knob can be rotated to easily unroll the paper slip directly from the pen for an immediate writing use.
    Type: Grant
    Filed: January 6, 1988
    Date of Patent: October 10, 1989
    Inventor: Shi-Lung Chang