Patents by Inventor Shiwen Huang
Shiwen Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12222331Abstract: Provided are a system and a method for impact testing and monitoring of a high-energy flexible net. The system includes a vertical impact testing unit, a slope impact testing unit, an impact simulation unit, and an impact monitoring unit. The vertical impact testing unit includes a vertically positioned gravity wall. The slope impact testing unit includes a wall slope positioned perpendicularly to a second side of the gravity wall. A first side of the gravity wall and a slope surface of the wall slope are securely provided with a flexible net, respectively. The impact simulation unit includes an impact assembly and a lifting assembly. The impact monitoring unit is configured to monitor a deformation result and an internal force change result of the flexible net.Type: GrantFiled: September 26, 2024Date of Patent: February 11, 2025Assignees: RAILWAY ENGINEERING RESEARCH INSTITUTE, CHINA ACADEMY OF RAILWAY SCIENCES CO., LTD., CHINA ACADEMY OF RAILWAY SCIENCES CO., LTD.Inventors: Yufang Zhang, Kun Yuan, Xiaobing Li, Yong Yao, Tao Jia, Lining Du, Tao Wei, Wenchao Zhang, Jian Cui, Bo Liu, Jian Li, Yu Cheng, Shengyong Zeng, Shuangquan Lei, Shiwen Huang, Wenxin Tan, Junjie Zeng, Hao Lan, Jiawei Fan, Ning Xuan, Peng Zhang, Gongming Chen, Pan Chen, Fei Xian, Zehua Dong
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Publication number: 20210120749Abstract: Provided is an artificial inoculation method for bacterial panicle blight of rice. The method includes the steps of S1. preparing an inoculum using a bacteria solution of Burkholderia glumae; S2. inoculating at the booting stage of rice; S3. adopting an inoculation method of injection, and injecting the inoculum prepared in the step S1 into the hollow booting part of a rice stalk from bottom to top by an injector; and S4. calculating the incidence rate and disease index after inoculation according to the number of diseased panicles and the number of diseased grains.Type: ApplicationFiled: September 8, 2020Publication date: April 29, 2021Applicant: China National Rice Research InsitituteInventors: Yuxuan HOU, Shiwen HUANG, Lianmeng LIU, Ling WANG
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Patent number: 9230576Abstract: Embodiments disclosed herein generally relate to a magnetic head having a sensor stack and a bias material that is aligned in a direction perpendicular to a media facing surface. The sensor stack and a first portion of the bias material are laterally bookended by synthetic antiferromagnetic (SAF) structures, and a second portion of the bias material is laterally bookended by a dielectric material. In this configuration, the SAF structures are decoupled from the bias material, which minimizes the disturbance to the bias material.Type: GrantFiled: September 8, 2014Date of Patent: January 5, 2016Assignee: HGST NETHERLANDS B.V.Inventors: Hardayal Singh Gill, Shiwen Huang, Quang Le, Guangli Liu, Xiaoyong Liu, Suping Song
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Publication number: 20140268420Abstract: A magnetic write head having a write pole with a novel configuration improving write field strength and field gradient while also reducing adjacent track interference and far track interference. The write pole is configured with a pole tip portion that has a narrow track width, preferably 15-30 degrees and a main yoke portion with a larger flare angle of about 45 degrees. The write pole also has an intermediate portion located between the pole tip and main pole portions. The intermediate portion includes a first portion adjacent to the pole tip that has a flare angle greater than the flare angle of the main yoke and has a second portion with a flare angle less than the flare angle of the yoke.Type: ApplicationFiled: March 14, 2013Publication date: September 18, 2014Applicant: HGST NETHERLANDS B.V.Inventors: Yingjian Chen, Shiwen Huang, Terence T. L. Lam, Mun H. Park, Kyusik Shin, Yi Zheng, Yuming Zhou
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Patent number: 8801943Abstract: The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.Type: GrantFiled: July 28, 2011Date of Patent: August 12, 2014Assignee: HGST Netherlands B.V.Inventors: Shiwen Huang, Fenglin Liu, Qiping Zhong, Kyusik Shin, Yingjian Chen
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Patent number: 8730617Abstract: In one embodiment, a magnetic head includes a main pole having a trapezoidal cross-section at a media-facing surface thereof and a flared shape with a greater width in a cross-track direction at positions away from the media-facing surface, a leading shield positioned near a leading side of the main pole, wherein a leading gap is provided between the main pole and the leading shield, side shields positioned on both sides of the main pole in the cross-track direction adjacent the media-facing surface of the main pole, with side gaps provided between the main pole and both of the side shields, and a trailing gap provided on a trailing side of the main pole at the media-facing surface thereof, with a throat height of the side shields being less than the throat height of the side shields at a position closer to the trailing gap than the leading gap.Type: GrantFiled: February 20, 2013Date of Patent: May 20, 2014Assignee: HGST Netherlands B.V.Inventors: Wen-Chien D. Hsiao, Shiwen Huang, Edward H. P. Lee, Valeri Synogatch, Sue S. Zhang, Yi Zheng, Yuming Zhou
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Patent number: 8508886Abstract: A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.Type: GrantFiled: September 28, 2011Date of Patent: August 13, 2013Assignee: HGST Netherlands B.V.Inventors: Yingjian Chen, Shiwen Huang, Edward Hin Pong Lee, Mun Hyoun Park, Kyusik Shin, Yuming Zhou
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Patent number: 8470186Abstract: A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.Type: GrantFiled: November 24, 2010Date of Patent: June 25, 2013Assignee: HGST Netherlands B.V.Inventors: Yingjian Chen, Shiwen Huang, Fenglin Liu, Kyusik Shin
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Publication number: 20130078483Abstract: A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.Type: ApplicationFiled: September 28, 2011Publication date: March 28, 2013Inventors: Yingjian CHEN, Shiwen HUANG, Edward Hin Pong LEE, Mun Hyoun PARK, Kyusik SHIN, Yuming ZHOU
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Publication number: 20130026131Abstract: The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.Type: ApplicationFiled: July 28, 2011Publication date: January 31, 2013Applicant: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Shiwen Huang, Fenglin Liu, Qiping Zhong, Kyusik Shin, Yingjian Chen
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Patent number: 8345383Abstract: A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.Type: GrantFiled: September 22, 2011Date of Patent: January 1, 2013Assignee: Headway Technologies, Inc.Inventors: Cherng-Chyi Yan, Feiyue Li, Shiwen Huang, Jiun-Ting Lee, Yoshitaka Sasaki
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Publication number: 20120125885Abstract: A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.Type: ApplicationFiled: November 24, 2010Publication date: May 24, 2012Inventors: YINGJIAN CHEN, Shiwen Huang, Fenglin Liu, Kyusik Shin
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Publication number: 20120012555Abstract: A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.Type: ApplicationFiled: September 22, 2011Publication date: January 19, 2012Inventors: Cherng-Chyi Yan, Feiyue Li, Shiwen Huang, Jiun-Ting Lee, Yoshitaka Sasaki
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Publication number: 20120008236Abstract: Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors.Type: ApplicationFiled: September 15, 2011Publication date: January 12, 2012Inventors: Jiun-Ting Lee, Shiwen Huang, Moris Dovek
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Patent number: 8031433Abstract: A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.Type: GrantFiled: September 5, 2008Date of Patent: October 4, 2011Assignee: Headway Technologies, Inc.Inventors: Cherng-Chyi Yan, Feiyue Li, Shiwen Huang, Jiun-Ting Lee, Yoshitaka Sasaki
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Patent number: 8027125Abstract: Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors.Type: GrantFiled: June 21, 2007Date of Patent: September 27, 2011Assignee: Headway Technologies, Inc.Inventors: Jiun-Ting Lee, Shiwen Huang, Moris Dovek
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Publication number: 20100061016Abstract: A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.Type: ApplicationFiled: September 5, 2008Publication date: March 11, 2010Inventors: Cherng-Chyi Han, Feiyue Li, Shiwen Huang, Jiun-Ting Lee, Yoshitaka Sasaki
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Publication number: 20080316644Abstract: Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors.Type: ApplicationFiled: June 21, 2007Publication date: December 25, 2008Inventors: Jiun-Ting Lee, Shiwen Huang, Moris Dovek