Abstract: The invention relates to the field of aluminum wheel casting molds, and more particularly relates to a closed-loop control method and system for a mold temperature in a wheel casting process. The control method includes: step 1, acquiring data, that is, acquiring a plurality of mold position temperatures, and cooling pipeline opening and closing signals in a target wheel casting process according to a fixed frequency; step 2, storing, based on acquired mold opening and closing signals of casting equipment, the acquired data in a database in the form of a unique ID according to a single wheel casting process; step 3, calculating new process parameters based on the acquired plurality of position temperatures and time; and step 4, integrating the calculated process parameters, and issuing the process parameters to a PLC of a casting equipment to perform new casting.

Abstract: A sound absorber is configured as a rectangular hexahedral box and forms a porous double-layer Helmholtz resonance sound absorbing structure, at the same time, the sound absorber in the form of a box forms a structural resonance sound absorbing device itself, and the first-order natural mode frequency of the device is identical to that of a wheel air chamber. When the box-type sound absorbing structure is assembled in a wheel, double functions of absorbing acoustic resonance of the wheel air chamber under the organic combination of Helmholtz resonance sound absorption and structural resonance sound absorption can be realized.

Abstract: This application relates to a negative electrode plate, a secondary battery and apparatus thereof. The secondary battery of the present application comprises a negative electrode plate, the negative electrode plate comprises a composite current collector and a negative electrode active material layer disposed on at least one surface of the composite current collector, the negative electrode active material layer comprises a silicon-based active material, the silicon-based active material accounts for 0.5 wt % to 50 wt % of total mass of the negative electrode active material layer, and the composite current collector comprises a polymer support layer and a metal conductive layer disposed on at least one surface of the polymer support layer. The secondary battery and the negative electrode plate achieve good coordination between the current collector and the negative electrode active material layer.

Abstract: A process for olefin oligomerization can include contacting a feedstock comprising Cn and C2n olefins/paraffins under oligomerization conditions in the presence of an oligomerization catalyst, wherein n is 2 to 15; and recovering an oligomeric product comprising C3n oligomers having a branching index of less than 2.1. Optionally, the feedstock can further comprise C3n olefins/paraffins.

Abstract: A process for olefin oligomerization can include: contacting a feedstock comprising at least one C3 to C20 olefin/paraffin under oligomerization conditions in the presence of a Si/Al ZSM-23 catalyst having no amine treatment and a Si/Al2 molar ratio of 20 to 60 and/or a Si/Al/Ti ZSM-23 catalyst having no amine treatment, a Si/Al2 molar ratio of 20 to 60, and a Ti/Al molar ratio of 0.1 to 3; and recovering an oligomeric product comprising dimers having a branching index of less than 2.1, trimers having a branching index of less than 2.1, and tetramers having a branching index of less than 2.1.

Abstract: A process for olefin oligomerization can include: contacting a feedstock comprising at least one C3 to C20 olefin/paraffin under oligomerization conditions in the presence of a Si/Al ZSM-23 catalyst having no amine treatment and a Si/Al2 molar ratio of 20 to 60 and/or a Si/Al/Ti ZSM-23 catalyst having no amine treatment, a Si/Al2 molar ratio of 20 to 60, and a Ti/Al molar ratio of 0.1 to 3; and recovering an oligomeric product comprising dimers having a branching index of less than 2.1, trimers having a branching index of less than 2.1, and tetramers having a branching index of less than 2.1.

Abstract: A process for olefin oligomerization can include contacting a feedstock comprising Cn and C2n olefins/paraffins under oligomerization conditions in the presence of an oligomerization catalyst, wherein n is 2 to 15; and recovering an oligomeric product comprising C3n oligomers having a branching index of less than 2.1. Optionally, the feedstock can further comprise C3n olefins/paraffins.

Abstract: Systems and methods are provided for producing naphthenic compositions corresponding to various types of products, such as naphthenic base oil, specialty industrial oils, and/or hydrocarbon fluids. The methods of producing the naphthenic compositions can include exposing a heavy fraction from a fluid catalytic cracking (FCC) process, such as a FCC bottoms fraction (i.e., a catalytic slurry oil), to hydroprocessing conditions corresponding to hydrotreating and/or aromatic saturation conditions. Naphthenic compositions formed from processing of FCC fractions are also provided.

Abstract: Charged-particle-beam (CPB) microlithography systems are disclosed that detect displacements of certain components and implement corrective countermeasures to the displacements so that pattern-exposure accuracy and precision are not compromised by the displacements. In an embodiment, displacement sensors and corrective actuators are installed at respective locations in or on the microlithography system. If the displacement sensors detect displacements at the respective locations, corresponding electrical signals produced by the sensors are fed-back or fed-forward to the corrective actuators. Alternatively, the electrical signals are routed directly to a beam-position-control system or routed indirectly to a displacement predictor. The displacement predictor calculates estimates of displacements based on data obtained previously concerning operation of certain displacement-generating components of the system.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.

Abstract: The shift in the center of gravity of a stage device and the reaction force caused when at least one of a first and second stage devices move, are canceled out by moving a moving member. The shift in the center of gravity of a stage device and the reaction force caused when the stage devices move that cannot be canceled out by moving the moving member, are completely canceled out by moving a base. That is, even if at least one of the first and second stages move, the center of gravity of the stage device does not move, and the reaction force are reliably canceled. Accordingly, by concurrently performing exposure on the two substrates mounted on the first and second stages, the exposure throughput can be improved, and an exposure with a high precision can be performed.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.