Abstract: Disclosed are lithium-containing precursor material and a preparation method therefor, and lithium-ion cathode material, where the lithium-containing precursor material has a chemical formula of LixMyD, M is at least one of Ni, Co, Mn, Al, or Mg, and D is one or more of CO32?, OH?, and C2O42?; a 2? diffraction angle of the lithium-containing precursor material has characteristic peaks in an XRD pattern of a Cu target K?1, and the characteristic peaks P1 and P2 are 20°-22° and 31°-33°, respectively, and an intensity ratio of the peaks (p1/p2) is 0<(p1/p2)?10. Lithium and other metal elements in the lithium-containing precursor material achieve bulk molecular-level dispersion, such that neither batching nor mixing is required, ion migration resistance becomes small, sintering temperature is lowered, and the production costs are reduced. Moreover, lithium ion and metal salt have co-precipitation reaction, thereby reducing wastewater discharge by more than 30%.

Abstract: A light-emitting diode (LED) light bar capable of refracting and scattering LED light and a flexible neon lamp are provided. The LED light bar includes a flexible light shielding sleeve, a flexible scattering layer, and a flexible light strip. The flexible light shielding sleeve extends along the LED light bar, the flexible light strip is disposed in the flexible scattering layer. A light emitting direction of the flexible light strip is opposite to an illumination direction of the LED light bar. The flexible scattering layer extends along the flexible light shielding sleeve and is disposed between the flexible light strip and the flexible light shielding sleeve. The LED light emitted by the flexible light strip undergoes multiple reflections and refractions within the flexible scattering layer, and a light reflecting surface of the flexible light shielding sleeve is additionally provided to improve light reflection efficiency.

Abstract: A light-emitting assembly and a lighting device are provided. The light-emitting assembly includes a transparent sleeve, an elastic support component, and a light strip. An accommodating cavity is defined in the transparent sleeve. The elastic support component is located in the accommodating cavity. The light strip is located in the accommodating cavity, the light strip includes a circuit board and at least one light source, the elastic support component is disposed on a first side of the circuit board in a thickness direction of the circuit board for supporting the circuit board, and the at least one light source is disposed on a second side of the circuit board facing away from the elastic support component. The light-emitting assembly and the lighting device are not easy to be broken and damaged.

Abstract: A feed mixture comprising at least one C3 olefin and/or at least one C4 olefin may be contacted with a zeolite catalyst under oligomerization reaction conditions to form a product mixture comprising a plurality of olefin oligomers comprising C12 and/or C16 olefin oligomers having an average branching index, as measured by gas chromatography, of about 2.2 or less, such as about 1.3 to about 2.0. The olefin oligomers may be contacted with a syngas mixture comprising carbon monoxide and hydrogen in the presence of a hydroformylation catalyst to form a hydroformylation reaction product, which may be subsequently reduced to form a plurality of branched alcohols. The branched alcohols, in turn, may be converted into an amphiphilic compound, such as a plurality of branched alcohol sulfates.

Abstract: A feed mixture comprising at least one C3 olefin and/or at least one C4 olefin may be contacted with a zeolite catalyst under oligomerization reaction conditions to form a product mixture comprising a plurality of olefin oligomers. The zeolite catalyst, optionally with one or more further modifications, may be selected for operability at high WHSV values that may produce at least C12 olefins in the product mixture having an average branching index of about 2.2 or less. Under suitable conditions, C10-C13 olefins may comprise at least about 25% of the product mixture, M based on total olefin oligomers. Percentage conversion of the at least one C3 olefin and/or at least one C4 olefin may impact the average branching index of at least C12 olefin oligomers and selectivity for C10-C13 olefin oligomers. An amount of C4 olefin in the feed mixture may produce a targeted selectivity for at least C1 olefins.

Abstract: A feed mixture comprising at least one C3 olefin and/or at least one C4 olefin may be contacted with a zeolite catalyst under oligomerization reaction conditions to form a product mixture comprising a plurality of olefin oligomers comprising C12 olefin oligomers having an average branching index, as measured by gas chromatography, of about 2.2 or less, such as about 1.3 to about 2.0. The olefin oligomers may be contacted with a syngas mixture comprising carbon monoxide and hydrogen in the presence of a hydroformylation catalyst to form a hydroformylation reaction product, which may be subsequently reduced to form a plurality of branched alcohols. The branched alcohols, in turn, may be converted into an amphiphilic compound, such as a plurality of branched alcohol sulfates.

Abstract: A feed mixture comprising at least one C3 olefin and/or at least one C4 olefin may be contacted with a zeolite catalyst under oligomerization reaction conditions to form a product mixture comprising a plurality of olefin oligomers. The zeolite catalyst, optionally with one or more further modifications, may be selected for operability at high WHSV values that may produce at least C12 olefins in the product mixture having an average branching index of about 2.2 or less, such as about 1.3 to about 2.0. Under suitable conditions, C10-C13 olefins may comprise at least about 25% of the product mixture, based on total olefin oligomers. Percentage conversion of the at least one C3 olefin and/or at least one C4 olefin may impact the average branching index of C12 olefin oligomers and selectivity for C10-C13 olefin oligomers. An amount of C4 olefin in the feed mixture may produce a targeted selectivity for C12 olefins.

Abstract: A process for olefin oligomerization can include contacting a feedstock comprising Cn and C2n olefins/paraffins under oligomerization conditions in the presence of an oligomerization catalyst, wherein n is 2 to 15; and recovering an oligomeric product comprising C3n oligomers having a branching index of less than 2.1. Optionally, the feedstock can further comprise C3n olefins/paraffins.

Abstract: A process for olefin oligomerization can include: contacting a feedstock comprising at least one C3 to C20 olefin/paraffin under oligomerization conditions in the presence of a Si/Al ZSM-23 catalyst having no amine treatment and a Si/Al2 molar ratio of 20 to 60 and/or a Si/Al/Ti ZSM-23 catalyst having no amine treatment, a Si/Al2 molar ratio of 20 to 60, and a Ti/Al molar ratio of 0.1 to 3; and recovering an oligomeric product comprising dimers having a branching index of less than 2.1, trimers having a branching index of less than 2.1, and tetramers having a branching index of less than 2.1.

Abstract: A process for olefin oligomerization can include contacting a feedstock comprising Cn and C2n olefins/paraffins under oligomerization conditions in the presence of an oligomerization catalyst, wherein n is 2 to 15; and recovering an oligomeric product comprising C3n oligomers having a branching index of less than 2.1. Optionally, the feedstock can further comprise C3n olefins/paraffins.

Abstract: A process for olefin oligomerization can include: contacting a feedstock comprising at least one C3 to C20 olefin/paraffin under oligomerization conditions in the presence of a Si/Al ZSM-23 catalyst having no amine treatment and a Si/Al2 molar ratio of 20 to 60 and/or a Si/Al/Ti ZSM-23 catalyst having no amine treatment, a Si/Al2 molar ratio of 20 to 60, and a Ti/Al molar ratio of 0.1 to 3; and recovering an oligomeric product comprising dimers having a branching index of less than 2.1, trimers having a branching index of less than 2.1, and tetramers having a branching index of less than 2.1.

Abstract: Systems and methods are provided for producing naphthenic compositions corresponding to various types of products, such as naphthenic base oil, specialty industrial oils, and/or hydrocarbon fluids. The methods of producing the naphthenic compositions can include exposing a heavy fraction from a fluid catalytic cracking (FCC) process, such as a FCC bottoms fraction (i.e., a catalytic slurry oil), to hydroprocessing conditions corresponding to hydrotreating and/or aromatic saturation conditions. Naphthenic compositions formed from processing of FCC fractions are also provided.

Abstract: Charged-particle-beam (CPB) microlithography systems are disclosed that detect displacements of certain components and implement corrective countermeasures to the displacements so that pattern-exposure accuracy and precision are not compromised by the displacements. In an embodiment, displacement sensors and corrective actuators are installed at respective locations in or on the microlithography system. If the displacement sensors detect displacements at the respective locations, corresponding electrical signals produced by the sensors are fed-back or fed-forward to the corrective actuators. Alternatively, the electrical signals are routed directly to a beam-position-control system or routed indirectly to a displacement predictor. The displacement predictor calculates estimates of displacements based on data obtained previously concerning operation of certain displacement-generating components of the system.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.

Abstract: The shift in the center of gravity of a stage device and the reaction force caused when at least one of a first and second stage devices move, are canceled out by moving a moving member. The shift in the center of gravity of a stage device and the reaction force caused when the stage devices move that cannot be canceled out by moving the moving member, are completely canceled out by moving a base. That is, even if at least one of the first and second stages move, the center of gravity of the stage device does not move, and the reaction force are reliably canceled. Accordingly, by concurrently performing exposure on the two substrates mounted on the first and second stages, the exposure throughput can be improved, and an exposure with a high precision can be performed.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.