Abstract: A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.

Abstract: A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.

Abstract: Stage assemblies and control methods are disclosed. An exemplary assembly includes a first stage and first and second controllers. The first controller feedback-controls the first stage according to a respective parameter vector. The second controller controls the first stage by feed-forward control, according to a respective parameter vector. The controllers perform iterative feedback tuning IFT, including minimization of a cost-function of the parameter vectors from the first and second controllers. The second controller receives data including first-stage trajectory, and the first controller receives data including first-stage following-error. A suitable application of the assembly is in a microlithography system or other high-precision system.

Abstract: A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.

Abstract: A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.

Abstract: Disclosed are, inter alia, optical components that include an optical element (e.g., mirror) and at least three active-isolation mounts mounting the optical element to a frame (e.g., optical barrel or optical frame). An active-isolation mount has a non-contacting actuator connecting a respective location on the optical element to the frame and provides movability of the respective location relative to the frame in at least one direction. At least one displacement sensor is associated with each respective location on the optical element. The displacement sensors are sensitive to displacements of the respective locations in at least one respective direction and reference the displacements to an absolute reference. The actuators and sensors are connected to a servo control loop to provide feedback control.

Abstract: Stage assemblies and control methods are disclosed. An exemplary assembly includes a first stage and first and second controllers. The first controller feedback-controls the first stage according to a respective parameter vector. The second controller controls the first stage by feed-forward control, according to a respective parameter vector. The controllers perform iterative feedback tuning IFT, including minimization of a cost-function of the parameter vectors from the first and second controllers. The second controller receives data including first-stage trajectory, and the first controller receives data including first-stage following-error. A suitable application of the assembly is in a microlithography system or other high-precision system.

Abstract: Disclosed are, inter alia, optical components that include an optical element (e.g., mirror) and at least three active-isolation mounts mounting the optical element to a frame (e.g., optical barrel or optical frame). An active-isolation mount has a non-contacting actuator connecting a respective location on the optical element to the frame and provides movability of the respective location relative to the frame in at least one direction. At least one displacement sensor is associated with each respective location on the optical element. The displacement sensors are sensitive to displacements of the respective locations in at least one respective direction and reference the displacements to an absolute reference. The actuators and sensors are connected to a servo control loop to provide feedback control.