Abstract: A chip reliability testing method includes mounting a first test chip on a test board, wherein the first test chip comprises a silicon device having a plurality of metallization layers configured to establish a plurality of test circuits, a conductive redistribution layer contacting at least one of the plurality of metallization layers, and contact pads on exposed portions of the conductive redistribution layer. The mounting includes bonding the contact pads of the first test chip to corresponding contact pads of the test board. The method further includes applying a test voltage to a first contact pad connected to a first test circuit of the plurality of test circuits and, while maintaining the test voltage, subjecting the first test circuit to a reliability test. The method further includes monitoring an output voltage at a second contact pad connected to the first test circuit during a test period during the reliability test.

Abstract: The present disclosure provides a semiconductor structure, including providing a first chip, disposing a first copper layer having a first thickness over a first side of the first chip, and disposing a first solder having a second thickness over the first copper layer, wherein a ratio of the second thickness and the first thickness is in a range of from about 2 to about 3.5.

Abstract: A chip reliability testing method includes mounting a first test chip on a test board, wherein the first test chip comprises a silicon device having a plurality of metallization layers configured to establish a plurality of test circuits, a conductive redistribution layer contacting at least one of the plurality of metallization layers, and contact pads on exposed portions of the conductive redistribution layer. The mounting includes bonding the contact pads of the first test chip to corresponding contact pads of the test board. The method further includes applying a test voltage to a first contact pad connected to a first test circuit of the plurality of test circuits and, while maintaining the test voltage, subjecting the first test circuit to a reliability test. The method further includes monitoring an output voltage at a second contact pad connected to the first test circuit during a test period during the reliability test.

Abstract: The present disclosure provides a semiconductor structure, including providing a first chip, disposing a first copper layer having a first thickness over a first side of the first chip, and disposing a first solder having a second thickness over the first copper layer, wherein a ratio of the second thickness and the first thickness is in a range of from about 2 to about 3.5.

Abstract: Disclosed is a chip reliability testing method that includes mounting a test chip on a test board whereby each test circuit of the test chip is connected to a different pair of input and output terminals. The reliability test can include applying a test voltage to a first (input) bump and measuring an output voltage on a second (output) bump connected to the same test circuit. The first and second bumps are, in turn, electrically connected to each other through a series of conductive materials to define the test circuit. The conductive materials include first and second contact pads under the first and second bumps with the contact pads, in turn, being connected to a conductive substrate or redistribution layer. The conductive substrate or redistribution layer is, in turn, connected to first and second conductive vias that each provide a connection to one or more of a series of conductive layers that are arranged under the conductive substrate or redistribution layer and over a silicon device.

Abstract: Disclosed is a chip reliability testing method that includes mounting a test chip on a test board whereby each test circuit of the test chip is connected to a different pair of input and output terminals. The reliability test can include applying a test voltage to a first (input) bump and measuring an output voltage on a second (output) bump connected to the same test circuit. The first and second bumps are, in turn, electrically connected to each other through a series of conductive materials to define the test circuit. The conductive materials include first and second contact pads under the first and second bumps with the contact pads, in turn, being connected to a conductive substrate or redistribution layer. The conductive substrate or redistribution layer is, in turn, connected to first and second conductive vias that each provide a connection to one or more of a series of conductive layers that are arranged under the conductive substrate or redistribution layer and over a silicon device.

Abstract: A test board includes a first chip mounting area, a first input area, a second input area, a first output area, and a second output area. The test board also includes a first conductive pattern, a second conductive pattern, a third conductive pattern, and a fourth conductive pattern. The first conductive pattern electrically connects a first pin of the first input area and a first pin of the first chip mounting area. The second conductive pattern electrically connects a first pin of the second input area and a second pin of the first chip mounting area. The third conductive pattern electrically connects a first pin of the first output area and a third pin of the first chip mounting area. The fourth conductive pattern electrically connects a first pin of the second output area and a fourth pin of the first chip mounting area.

Abstract: Multiple test circuits are formed in a test board for each test chip. Alternatively and/or additionally, a test circuit extends through at least two layers among metallization layers of the test chip.