Patents by Inventor Shiao-Wen Wang

Shiao-Wen Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7619726
    Abstract: A color filter with low color shift is defined by a light leakage spectrum in the dark state. The color filter is disposed between two polarizing plates so as to measure a first spectrum of dark state a(?), wherein the polarizing directions of the polarizers are orthogonal to each other. A second spectrum of dark state b(?) while the color filter is removed, and then a ratio spectrum of light leakage intensity I(?)=(a(?)/b(?)) is determined. A maximum value P1 in the ratio spectrum of light leakage intensity is determined in a wavelength region in which the ratio spectrum of light leakage intensity of green photoresist overlaps that of a blue photoresist. A maximum value P2 in the ratio spectrum of light leakage intensity is determined in a wavelength region in which the ratio spectrum of light leakage intensity of red photoresist locates.
    Type: Grant
    Filed: July 25, 2007
    Date of Patent: November 17, 2009
    Assignee: AU Optronics Corp.
    Inventors: Shiao-Wen Wang, Sheng-Wen Cheng, Chen-Hsien Liao
  • Publication number: 20080239286
    Abstract: A color filter with low color shift is defined by a light leakage spectrum in the dark state. The color filter is disposed between two polarizing plates so as to measure a first spectrum of dark state a(?), wherein the polarizing directions of the polarizers are orthogonal to each other. A second spectrum of dark state b(?) while the color filter is removed, and then a ratio spectrum of light leakage intensity I(?)=(a(?)/b(?)) is determined. A maximum value P1 in the ratio spectrum of light leakage intensity is determined in a wavelength region in which the ratio spectrum of light leakage intensity of green photoresist overlaps that of a blue photoresist. A maximum value P2 in the ratio spectrum of light leakage intensity is determined in a wavelength region in which the ratio spectrum of light leakage intensity of red photoresist locates.
    Type: Application
    Filed: July 25, 2007
    Publication date: October 2, 2008
    Inventors: Shiao-Wen Wang, Sheng-Wen Cheng, Chen-Hsien Liao