Patents by Inventor Shiaw-Huei Chen
Shiaw-Huei Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10709005Abstract: Plasma torch with an integrated electrode incorporating many heat pipes each heat pipe comprises an evaporating section and a condensing section set at a front end and a rear end of the electrode, respectively. The heat pipes with extremely high thermal conductivity can be used to replace the traditional water-cooled torch's electrode. The effect of reducing the elevated temperature at the torch's arc root zone through cooling by heat pipes is beneficial for prolonging the lifetime of plasma torch. Each heat pipe is filled with a small amount of working fluid. Even if one heat pipe is etched out, the cooling liquid thus ejected is limited without causing gas explosion and rock curing; the rest of heat pipes are not damage and can still function; although the heat dissipation efficiency might be reduced a little, the plasma torch still works. Thus, flexibility of the whole heat dissipation is enhanced.Type: GrantFiled: May 3, 2018Date of Patent: July 7, 2020Assignee: Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan, R.O.C.Inventors: Shiaw-Huei Chen, How-Ming Lee
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Publication number: 20190342986Abstract: Plasma torch with an integrated electrode incorporating many heat pipes each heat pipe comprises an evaporating section and a condensing section set at a front end and a rear end of the electrode, respectively. The heat pipes with extremely high thermal conductivity can be used to replace the traditional water-cooled torch's electrode. The effect of reducing the elevated temperature at the torch's arc root zone through cooling by heat pipes is beneficial for prolonging the lifetime of plasma torch. Each heat pipe is filled with a small amount of working fluid. Even if one heat pipe is etched out, the cooling liquid thus ejected is limited without causing gas explosion and rock curing; the rest of heat pipes are not damage and can still function; although the heat dissipation efficiency might be reduced a little, the plasma torch still works. Thus, flexibility of the whole heat dissipation is enhanced.Type: ApplicationFiled: May 3, 2018Publication date: November 7, 2019Inventors: Shiaw-Huei Chen, How-Ming Lee
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Publication number: 20160362355Abstract: An oil product of gasoline is fabricated. The product contains hydrocarbon compound ranged as a gasoline composition. The purification process of dimethyl ether (DME) used in the present invention greatly reduces the feed rate for obtaining a smaller reactor with cost down. Carbon dioxide (CO2) is separated to be recycled back to the gasifier to be reused, archived or used otherwise for improves global environment. At the same time, CO2 is reacted with hydrocarbons, water vapor, etc. through a novel high-temperature plasma torch to generate a synthesis gas (syngas) of carbon monoxide (CO) and hydrogen (H2) for regulating a hydrogen/carbon ratio of a biomass- or hydrocarbon-synthesized compound and helping subsequent chemical synthesis reactions. In the end, the final gasoline production has a high yield, a high octane rate, low nitrogen and sulfur pollution and a highly ‘green’ quality.Type: ApplicationFiled: June 12, 2015Publication date: December 15, 2016Inventors: Kuo-Chao Liang, How-Ming Lee, Shiaw-Huei Chen, Feng-Mei Yeh, To-Mei Wang, Meng-Han Huang, Lieh-Chih Chang, Chin-Ching Tzeng
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Patent number: 8440142Abstract: A dual-mode non-thermal plasma reactor includes an air-buffering chamber, a magnetic element provided on the air-buffering chamber, a first electrode disposed in the air-buffering chamber, a second electrode disposed in the air-buffering chamber opposite to the first electrode, a high-voltage power supply connected to the first and second electrodes and an air-swirling chamber located between the first and second electrodes. The air-swirling chamber includes a first isolating film covering on an internal side of the first electrode, a second isolating film covering on an internal side of the second electrode and an isolating tube placed between the first and second isolating films. An air passageway is defined through the first and second isolating films. An air-swirling space is defined by the first and second isolating films and the isolating tube. The isolating tube includes at least one tunnel in communication with the air-swirling space.Type: GrantFiled: March 14, 2008Date of Patent: May 14, 2013Assignee: Atomic Energy Council—Institute of Nuclear Energy ResearchInventors: Jyh-Ming Yan, Yung-Chih Chen, Shiaw-Huei Chen, Ming-Song Yang, Men-Han Huang
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Publication number: 20110020189Abstract: A dual-mode non-thermal plasma reactor includes an air-buffering chamber, a magnetic element provided on the air-buffering chamber, a first electrode disposed in the air-buffering chamber, a second electrode disposed in the air-buffering chamber opposite to the fist electrode, a high-voltage power supply connected to the first and second electrodes and an air-swirling chamber located between the first and second electrodes. The air-swirling chamber includes a first isolating film covering on an internal side of the first electrode, a second isolating film covering on an internal side of the second electrode and an isolating tube placed between the first and second isolating films. An air passageway is defined through the first and second isolating films. An air-swirling space is defined by the first and second isolating films and the isolating tube. The isolating tube includes at least one tunnel in communication with the air-swirling space.Type: ApplicationFiled: March 14, 2008Publication date: January 27, 2011Applicant: ATOMIC ENERGY COUNCIL - INSTITUTE OF NUCLEAR ENERGY RESEARCHInventors: Jyh-Ming Yan, Yung-Chih Chen, Shiaw-Huei Chen, Ming-Song Yang, Men-Han Huang
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Publication number: 20110000432Abstract: A non-thermal plasma reactor includes a reactor chamber, a first electrode unit disposed in the top portion of chamber and a second electrode unit disposed in the bottom of the chamber, so that a plasma treatment region is defined between the first and second electrode units. The first electrode unit includes at least one or arrays of dual discharging-electrode structure embedded in an isolating layer. A high-voltage power supply is connected to the first and second electrode units. An external gas introducing unit is used to allow auxiliary gas into the plasma reaction region so that arrays of dual discharging-electrode structure can enhance the gas discharge process and thus promote the plasma assisted chemical reaction for cleaning purpose.Type: ApplicationFiled: June 12, 2008Publication date: January 6, 2011Applicant: ATOMIC ENERGY COUNCIL - INSTITUTE OF NUCLEAR ENERGY RESEARCHInventors: Shiaw-Huei Chen, Jyh-Ming Yan, Yung-Chih Chen, Men-Han Huang, Ming-Song Yang
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Publication number: 20100193419Abstract: There is disclosed a normal-pressure plasma-based apparatus for processing waste water by mixing the waste water with working gas. The apparatus includes a waste water supply, a gas supply, a plasma-based processing unit connected to both of the waste water supply and the gas supply, a reservoir connected to the plasma-based processing unit and a washing tower connected to both of the reservoir and the plasma-based processing unit. The plasma-based processing unit and the washing tower are used together to mix the waste water with the working gas at least twice. The plasma-based processing unit produces active substances to decompose organic compounds and eliminate the colors of the organic compounds. Thus, performance in processing the waste water is excellent while the consumption of time and energy is low.Type: ApplicationFiled: December 21, 2009Publication date: August 5, 2010Applicant: ATOMIC ENERGY COUNCIL-INSTITUTE OF NUCLEAR ENERGY RESEARCHInventors: Jyh-Ming Yan, Yung-Chih Chen, Shiaw-Huei Chen, Ming-Song Yang, Men-Han Huang
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Patent number: 7754994Abstract: Atmospheric gas discharge plasma is generated in a gas whirlpool cavity. Then the plasma is sprayed out in a gas flow to clean an object. The whole process is simple with merits of utility and cost savings. And objects can be cleaned one after one continuously.Type: GrantFiled: December 13, 2006Date of Patent: July 13, 2010Assignee: Atomic Energy CouncilInventors: Jyh-Ming Yan, Shiaw-Huei Chen, Ming-Song Yang, Men-Han Huang, Yung-Chih Chen
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Patent number: 7594810Abstract: The present invention provides a reactor utilizing high-voltage discharge for processing exhausted hydrogen gas emitted during membrane plating, etching, or washing of semiconductors, where higher than 95% of destruction and removal efficiency (DRE) of hydrogen gas is obtained.Type: GrantFiled: October 28, 2005Date of Patent: September 29, 2009Assignee: Atomic Energy Council - Institute of Nuclear Energy ResearchInventors: Chih-Ching Tzeng, Den-Lian Lin, Shiaw-Huei Chen, Ming-Song Yang, Jyh-Ming Yan, Yuh-Jenq Yu
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Publication number: 20080142057Abstract: Atmospheric gas discharge plasma is generated in a gas whirlpool cavity. Then the plasma is sprayed out in a gas flow to clean an object. The whole process is simple with merits of utility and cost savings. And objects can be cleaned one after one continuously.Type: ApplicationFiled: December 13, 2006Publication date: June 19, 2008Applicant: ATOMIC ENERGY COUNCIL - INSTITUTE OF NUCLEAR RESEARCHInventors: Jyh-Ming Yan, Shiaw-Huei Chen, Ming-Song Yang, Men-Han Huang, Yung-Chih Chen
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Publication number: 20080131333Abstract: A lateral-flow dielectric barrier discharging reactor unit is designed to effectively process waste gas. Nonthermal plasma is obtained through high voltage gas breakdown for processing the waste gas. Reactor units can be arranged and integrated in a serial and/or parallel way with flow uniformity and smoothness for processing a great amount of waste gas with merits of simplicity and low cost.Type: ApplicationFiled: December 4, 2006Publication date: June 5, 2008Applicants: High Power-Factor AC/DC Converter with Parallel Power ProcessingInventors: Chin-Ching Tzeng, Shiaw-Huei Chen
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Publication number: 20070111147Abstract: The present invention provides a reactor utilizing high-voltage discharge for processing exhausted hydrogen gas emitted during membrane plating, etching, or washing of semiconductors, where higher than 95% of destruction and removal efficiency (DRE) of hydrogen gas is obtained.Type: ApplicationFiled: October 28, 2005Publication date: May 17, 2007Inventors: Chih-Ching Tzeng, Den-Lian Lin, Shiaw-Huei Chen, Ming-Song Yang, Jyh-Ming Yan, Yuh-Jeng Yu