Patents by Inventor Shiaw-Ruey Lin

Shiaw-Ruey Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8551571
    Abstract: A method for making a conductive polymer composite for detecting a gas includes forming a porous conductive layer of a conductive powder on a substrate, applying a polymer solution containing a solvent and a gas responsive polymer material dissolved in the solvent to the porous conductive layer such that a portion of the polymer solution penetrates into the porous conductive layer and the remainder of the polymer solution forms a thin film covering a top of the porous conductive layer, the gas responsive polymer material being capable of adsorbing and desorbing the gas, and removing the solvent from the polymer solution so as to form a polymer matrix covering the porous conductive layer.
    Type: Grant
    Filed: November 10, 2011
    Date of Patent: October 8, 2013
    Assignee: Chung-Shan Institute of Science and Technology, Armaments Bureau, Dept. of National Defense
    Inventors: Li-Chun Wang, Yuh Sung, Shiaw-Ruey Lin, Cheng-Long Ho, Chang-Ping Chang, Chen-Yu Lin
  • Publication number: 20130122191
    Abstract: A method for making a conductive polymer composite for detecting a gas includes forming a porous conductive layer of a conductive powder on a substrate, applying a polymer solution containing a solvent and a gas responsive polymer material dissolved in the solvent to the porous conductive layer such that a portion of the polymer solution penetrates into the porous conductive layer and the remainder of the polymer solution forms a thin film covering a top of the porous conductive layer, the gas responsive polymer material being capable of adsorbing and desorbing the gas, and removing the solvent from the polymer solution so as to form a polymer matrix covering the porous conductive layer.
    Type: Application
    Filed: November 10, 2011
    Publication date: May 16, 2013
    Applicant: Chung-Shan Institute of Science and Technology Armaments, Bureau, Minstry of National Defencse
    Inventors: Li-Chun Wang, Yuh Sung, Shiaw-Ruey Lin, Cheng-Long Ho, Chang-Ping Chang, Chen-Yu Lin
  • Publication number: 20110212319
    Abstract: The invention discloses a carbon nanotube device, comprising a substrate, a catalyst layer formed on the substrate, a porous capping layer formed on the catalyst layer, and a carbon nanotube formed on the porous capping layer. A wafer for growing a carbon nanotube comprises a substrate, a catalyst layer formed on the substrate, and a porous capping layer formed on the catalyst layer, with carbon nanotube growning on the porous capping layer.
    Type: Application
    Filed: April 26, 2011
    Publication date: September 1, 2011
    Inventors: LI-CHUN WANG, Han-Wen Kuo, Yuh Sung, Shiaw-Ruey Lin, Ming-Der Ger, Yih-Ming Liu, Wei-Ta Chang
  • Publication number: 20100122515
    Abstract: The poison-filter material of the invention includes a substrate and a metal oxide. The substrate includes numerous holes, and the metal oxide is adhered to a surface of the substrate and the holes. The method for producing the poison-filter material of the invention includes the following steps of sonicating and impregnating a substrate into a metallic salt aqueous solution; and calcining the substrate to form a metal oxide on a surface of the substrate and numerous holes of the substrate, such that the poison-filter material is produced. In the invention, the metallic salt aqueous solution is fully oscillated to impregnate the porous substrate, and metal oxide is formed on the surface and holes of the substrate after high-temperature calcination. Therefore, the adsorbent material of the invention can effectively adsorb noxious gas and lower penetrability of noxious gas.
    Type: Application
    Filed: November 18, 2008
    Publication date: May 20, 2010
    Inventors: Han-Wen Kuo, Jin-Feng Wang, Feng-Mei Fang, Jen-Chin Wu, Shiaw-Ruey Lin, Yuh Sung, Chen-Chia Huang, Chun-Yu Kao, Chien-Hung Chen
  • Publication number: 20100124655
    Abstract: The invention discloses a method for fabricating a carbon nanotube, and the method comprises the following steps: providing a substrate; forming a catalyst layer on the substrate; forming a porous capping layer on the catalyst layer to finish a wafer; forming the carbon nanotube on the wafer. By the porous capping layer, the well-aligned carbon nanotube can grow on the wafer through thermal CVD.
    Type: Application
    Filed: November 18, 2008
    Publication date: May 20, 2010
    Inventors: LI-CHUN WANG, Han-Wen Kuo, Yuh Sung, Shiaw-Ruey Lin, Ming-Der Ger, Yih-Ming Liu, Wei-Ta Chang