Patents by Inventor Shiaw-wen Tai

Shiaw-wen Tai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8804241
    Abstract: A method includes providing a layer having a plurality of spaced-apart lines of a first material extending along a first direction and forming a line of a second material on opposing surfaces of each line of the first material, the first and second materials being different and adjacent lines of the second material being discontinuous. After forming the lines of the second material, forming pairs of spaced-apart lines of a third material between adjacent pairs of the lines of the second material, wherein each line of the third material is spaced apart from the closest line of the second material and the first and third materials are different.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: August 12, 2014
    Assignee: Polarization Solutions, LLC
    Inventors: Qihong Wu, Kelvin Xu Zhang, Shiaw-Wen Tai
  • Publication number: 20140111849
    Abstract: A polarizer may be flexibly mounted within a frame to yield. The polarizer may then be handled, within the frame, without directly contacting the polarizer. A plurality of such frame-mounted polarizers may be combined in a tray in which they are aligned to form a mosaic polarizer that may be configured as a one-dimensional, linear, polarizer array or a two-dimensional, rectangular, polarizer array.
    Type: Application
    Filed: March 15, 2013
    Publication date: April 24, 2014
    Inventors: Deng Xuegong, Shiaw-Wen Tai, Denis Pristinski, Atsuo Kuki
  • Patent number: 8506827
    Abstract: Methods for forming a metal grating include providing a first grating including a plurality of grating lines formed from a dielectric material, each grating having a pair of sidewalls, facing sidewalls of adjacent grating lines being separated by corresponding trenches, the grating lines and trenches forming a grating surface; forming a layer of a metal on the grating surface, where the metal layer has a constant thickness and conforms to the grating surface; and removing portions of the metal layer between sidewalls of adjacent grating lines of the first grating to form a metal grating having grating lines formed from the metal, the grating lines of the metal grating corresponding to the portions of the metal layer adjacent the sidewalls of the grating lines of the first grating. The metal grating has a pitch of 200 nm or less, a depth of 50 nm or more, and the grating lines of the metal grating have an aspect ratio of 10-to-1 or more.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: August 13, 2013
    Assignee: Polarization Solutions, LLC
    Inventors: Qihong Wu, Sheng Liu, Xu Zhang, Shiaw-wen Tai, Xiaohua Du, Thomas Tombler
  • Publication number: 20110255162
    Abstract: In general, in a first aspect, the invent features a method, including providing a layer having a plurality of spaced-apart lines of a first material extending along a first direction and forming a line of a second material on opposing surfaces of each line of the first material, the first and second materials being different and adjacent lines of the second material being discontinuous. After forming the lines of the second material, forming pairs of spaced-apart lines of a third material between adjacent pairs of the lines of the second material, wherein each line of the third material is spaced apart from the closest line of the second material and the first and third materials are different.
    Type: Application
    Filed: November 15, 2010
    Publication date: October 20, 2011
    Inventors: Qihong Wu, Kelvin Xu Zhang, Shiaw-Wen Tai
  • Publication number: 20100291489
    Abstract: Methods include providing an article including a substrate, a first layer supported by the substrate, and an interface between the substrate and the first layer. The substrate is substantially transparent to radiation at a wavelength ? and the first layer is formed from a photoresist. The methods include exposing the first layer to radiation by directing radiation at ? through the substrate to impinge on the interface so that the radiation experiences total internal reflection at the interface.
    Type: Application
    Filed: May 15, 2009
    Publication date: November 18, 2010
    Applicant: API Nanofabrication and Research Corp.
    Inventors: Martin Moskovits, Linh Nguyen, Robert Koefer, Qihong Wu, Xu Zhang, Shiaw-Wen Tai
  • Publication number: 20100072170
    Abstract: Methods for forming a metal grating include providing a first grating including a plurality of grating lines formed from a dielectric material, each grating having a pair of sidewalls, facing sidewalls of adjacent grating lines being separated by corresponding trenches, the grating lines and trenches forming a grating surface; forming a layer of a metal on the grating surface, where the metal layer has a constant thickness and conforms to the grating surface; and removing portions of the metal layer between sidewalls of adjacent grating lines of the first grating to form a metal grating having grating lines formed from the metal, the grating lines of the metal grating corresponding to the portions of the metal layer adjacent the sidewalls of the grating lines of the first grating. The metal grating has a pitch of 200 nm or less, a depth of 50 nm or more, and the grating lines of the metal grating have an aspect ratio of 10-to-1 or more.
    Type: Application
    Filed: September 21, 2009
    Publication date: March 25, 2010
    Inventors: Qihong Wu, Sheng Liu, Xu Zhang, Shiaw-wen Tai, Xiaohua Du, Thomas Tombler
  • Publication number: 20090231702
    Abstract: In general, in a first aspect, the invent features a method, including providing a layer having a plurality of spaced-apart lines of a first material extending along a first direction and forming a line of a second material on opposing surfaces of each line of the first material, the first and second materials being different and adjacent lines of the second material being discontinuous. After forming the lines of the second material, forming pairs of spaced-apart lines of a third material between adjacent pairs of the lines of the second material, wherein each line of the third material is spaced apart from the closest line of the second material and the first and third materials are different.
    Type: Application
    Filed: March 17, 2008
    Publication date: September 17, 2009
    Inventors: Qihong Wu, Xu Zhang, Shiaw-Wen Tai
  • Patent number: 5865423
    Abstract: A diaphragm valve is provided with a valve housing having an inlet passage extending into a chamber and an outlet passage extending from the chamber. A diaphragm is mounted to the valve housing for covering the valve chamber. The diaphragm is provided with an aperture extending centrally therethrough. A valve stem is mounted adjacent the diaphragm externally of the valve chamber, such that movement of the valve stem deflects the diaphragm. A valving element is disposed in the valve chamber and is threadedly engaged with the valve stem through the aperture in the diaphragm. A toroidal sealing bead on the valving element is sealingly engaged with portions of the diaphragm surrounding the aperture therein.
    Type: Grant
    Filed: December 5, 1997
    Date of Patent: February 2, 1999
    Assignee: Parker Intangibles, Inc.
    Inventors: Patrick P. Barber, Shiaw-wen Tai