Patents by Inventor Shibo LIANG

Shibo LIANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11944662
    Abstract: The disclosure generally describes methods of preventing or treating ophthalmic diseases or conditions in a mammalian subject, such as diabetic retinopathy, cataracts, retinitis pigmentosa, glaucoma, macular degeneration, choroidal neovascularization, retinal degeneration, and oxygen-induced retinopathy. The methods comprise administering an effective amount of an aromatic-cationic peptide to subjects in need thereof.
    Type: Grant
    Filed: August 11, 2023
    Date of Patent: April 2, 2024
    Assignee: STEALTH BIOTHERAPEUTICS INC.
    Inventors: Liping Liu, Shibo Tang, Xiaoling Liang
  • Patent number: 11522076
    Abstract: A field effect transistor (FET), a method of fabricating a field effect transistor, and an electronic device, the field effect transistor comprises: a source and a drain, the source being made of a first graphene film; a channel disposed between the source and the drain, and comprising a laminate of a second graphene film and a material layer having semiconductor properties, the second graphene film being formed of bilayer graphene; and a gate disposed on the laminate and electrically insulated from the laminate.
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: December 6, 2022
    Assignees: BEIJING HUA TAN YUAN XIN ELECTRONICS, BEIJING HUATAN TECHNOLOGY CO., LTD.
    Inventor: Shibo Liang
  • Patent number: 11437482
    Abstract: A field effect transistor (FET), a method of fabricating the field effect transistor, and an electronic device are provided. The field effect transistor comprises: a source and a drain, the source being made of a Dirac material (103); a channel disposed between the source and the drain, and doped opposite to the source; and a gate (106) disposed on the channel and electrically insulated from the channel.
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: September 6, 2022
    Assignees: BEIJING HUA TAN YUAN XIN ELECTRONICS TECHNOLOGY CO., LTD, BEIJING HUATAN TECHNOLOGY CO., LTD.
    Inventor: Shibo Liang
  • Patent number: 11309425
    Abstract: A field effect transistor, a method of manufacturing the field effect transistor, and an electronic device are provided, wherein the field effect transistor comprises: a source(105) formed of a Dirac material(103) and a drain(107); a channel(102) disposed between the source(105) and the drain(107); and a source control electrode(108) disposed on the source(105) and for controlling the doping of the Dirac material(103) such that the Dirac material(103) and the channel(102) are doped in an opposite manner; and a gate(106) disposed on the channel(102) and electrically insulated from the channel(102).
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: April 19, 2022
    Assignees: BEIJING HUA TAN YUAN XIN ELECTRONICS TECHNOLOGY CO., LTD, BEIJING HUATAN TECHNOLOGY CO., LTD
    Inventor: Shibo Liang
  • Publication number: 20200328283
    Abstract: A field effect transistor (FET), a method of fabricating the field effect transistor, and an electronic device are provided. The field effect transistor comprises: a source and a drain, the source being made of a Dirac material (103); a channel disposed between the source and the drain, and doped opposite to the source; and a gate (106) disposed on the channel and electrically insulated from the channel.
    Type: Application
    Filed: October 17, 2018
    Publication date: October 15, 2020
    Applicants: BEIJING HUA TAN YUAN XIN ELECTRONICS TECHNOLOGY CO., LTD, BEIJING HUATAN TECHNOLOGY CO., LTD.
    Inventor: Shibo LIANG
  • Publication number: 20200328294
    Abstract: A field effect transistor (FET), a method of fabricating a field effect transistor, and an electronic device, the field effect transistor comprises: a source and a drain, the source being made of a first graphene film; a channel disposed between the source and the drain, and comprising a laminate of a second graphene film and a material layer having semiconductor properties, the second graphene film being formed of bilayer graphene; and a gate disposed on the laminate and electrically insulated from the laminate.
    Type: Application
    Filed: October 17, 2018
    Publication date: October 15, 2020
    Applicants: BEIJING HUA TAN YUAN XIN ELECTRONICS TECHNOLOGY CO., LTD, BEIJING HUATAN TECHNOLOGY CO., LTD
    Inventor: Shibo LIANG
  • Publication number: 20200321471
    Abstract: A field effect transistor, a method of manufacturing the field effect transistor, and an electronic device are provided, wherein the field effect transistor comprises: a source (105) formed of a Dirac material (103) and a drain (107); a channel (102) disposed between the source (105) and the drain (107); and a source control electrode (108) disposed on the source (105) and for controlling the doping of the Dirac material (103) such that the Dirac material (103) and the channel (102) are doped in an opposite manner, and a gate (106) disposed on the channel (102) and electrically insulated from the channel (102).
    Type: Application
    Filed: October 17, 2018
    Publication date: October 8, 2020
    Applicants: BEIJING HUA TAN YUAN XIN ELECTRONICS TECHNOLOGY CO., LTD, BEIJING HUATAN TECHNOLOGY CO., LTD.
    Inventor: Shibo LIANG