Patents by Inventor Shichen GU

Shichen GU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250003505
    Abstract: Systems with valves that increase cycle life and reduce particle generation. Embodiments may include a first movable member, a second movable member, and a third movable member; a first link coupled to the first movable member and the second movable member such that when the second movable member is moved laterally and the third movable member is stopped, the first link exerts a force on the first movable member that causes the first movable member to move towards a surface and press against the surface to form a vacuum seal; and a second link coupled to the first movable member and the third movable member such that when the first link causes the first movable member to move, the second link exerts a force on the first movable member that limits movement of the first movable member such that the first movable member moves towards the surface with limited offset.
    Type: Application
    Filed: October 19, 2022
    Publication date: January 2, 2025
    Applicant: ASML Netherlands B.V.
    Inventors: Shichen GU, Qingpo XI, Juying DOU
  • Patent number: 12165830
    Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system comprising a beam-limit aperture plate having a surface substantially perpendicular to an optical axis, the beam-limit aperture plate comprising a first aperture at a first distance relative to the surface of the beam-limit aperture plate, and a second aperture at a second distance relative to the surface of the beam-limit aperture plate, the second distance being different from the first distance. The first aperture may be a part of a first set of apertures of the beam-limit aperture plate at the first distance, and the second aperture may be a part of a second set of apertures of the beam-limit aperture plate at the second distance.
    Type: Grant
    Filed: March 30, 2022
    Date of Patent: December 10, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Shichen Gu, Weiming Ren, Qingpo Xi
  • Publication number: 20220319797
    Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system comprising a beam-limit aperture plate having a surface substantially perpendicular to an optical axis, the beam-limit aperture plate comprising a first aperture at a first distance relative to the surface of the beam-limit aperture plate, and a second aperture at a second distance relative to the surface of the beam-limit aperture plate, the second distance being different from the first distance. The first aperture may be a part of a first set of apertures of the beam-limit aperture plate at the first distance, and the second aperture may be a part of a second set of apertures of the beam-limit aperture plate at the second distance.
    Type: Application
    Filed: March 30, 2022
    Publication date: October 6, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Shichen GU, Weiming REN, Qingpo XI