Patents by Inventor Shicheng Xu

Shicheng Xu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11973233
    Abstract: A catalyst structure includes: (1) a substrate; (2) a catalyst layer on the substrate; and (3) an adhesion layer disposed between the substrate and the catalyst layer. In some implementations, an average thickness of the adhesion layer is about 1 nm or less. In some implementations, a material of the catalyst layer at least partially extends into a region of the adhesion layer. In some implementations, the catalyst layer is characterized by a lattice strain imparted by the adhesion layer.
    Type: Grant
    Filed: December 11, 2020
    Date of Patent: April 30, 2024
    Assignees: The Board of Trustees of the Leland Stanford Junior University, Volkswagen Aktiengesellschaft
    Inventors: Friedrich B. Prinz, Shicheng Xu, Yongmin Kim, Thomas Jaramillo, Drew C. Higgins, Maha Yusuf, Zhaoxuan Wang, Kyung Min Lee, Marat Orazov, Dong Un Lee, Tanja Graf, Thomas Schladt, Gerold Huebner, Hanna-Lena Wittern, Jonathan Edward Mueller
  • Patent number: 11955646
    Abstract: A supported catalyst includes: (1) a catalyst support; and (2) deposits of a catalyst covering the catalyst support, wherein the deposits have an average thickness of about 2 nm or less, and the deposits are spaced apart from one another.
    Type: Grant
    Filed: November 7, 2018
    Date of Patent: April 9, 2024
    Assignees: The Board of Trustees of the Leland Stanford Junior University, Volkswagen Aktiengesellschaft
    Inventors: Friedrich B. Prinz, Thomas Jaramillo, Drew C. Higgins, Yongmin Kim, Shicheng Xu, Thomas Schladt, Tanja Graf
  • Patent number: 11936051
    Abstract: A catalyst structure includes: (1) a substrate; (2) a catalyst layer on the substrate; and (3) an adhesion layer disposed between the substrate and the catalyst layer. In some implementations, an average thickness of the adhesion layer is about 1 nm or less. In some implementations, a material of the catalyst layer at least partially extends into a region of the adhesion layer. In some implementations, the catalyst layer is characterized by a lattice strain imparted by the adhesion layer.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: March 19, 2024
    Assignees: The Board of Trustees of the Leland Stanford Junior University, Volkswagen Aktiengesellschaf
    Inventors: Friedrich B. Prinz, Shicheng Xu, Yongmin Kim, Thomas Jaramillo, Drew C. Higgins, Maha Yusuf, Zhaoxuan Wang, Kyung Min Lee, Marat Orazov, Dong Un Lee, Tanja Graf, Thomas Schladt, Gerold Huebner, Hanna-Lena Wittern, Jonathan Edward Mueller
  • Patent number: 11834741
    Abstract: A method includes: 1) performing an atomic layer deposition cycle including (a) introducing precursors into a deposition chamber housing a substrate to deposit a material on the substrate; and (b) introducing a passivation gas into the deposition chamber to passivate a surface of the material; and 2) repeating 1) a plurality of times to form a film of the material.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: December 5, 2023
    Assignee: The Board of Trustees of the Leland Stanford Junior University
    Inventors: Friedrich B. Prinz, Shicheng Xu, Timothy English, John Provine, Dickson Thian, Jan Torgersen
  • Publication number: 20230079048
    Abstract: A manufacturing process includes: depositing a first catalyst on a first gas diffusion layer (GDL) to form a first catalyst-coated GDL; depositing a first ionomer on the first catalyst-coated GDL to form a first gas diffusion electrode (GDE); depositing a second catalyst on a second GDL to form a second catalyst-coated GDL; depositing a second ionomer on the second catalyst-coated GDL to form a second GDE; and laminating the first GDE with the second GDE and with an electrolyte membrane disposed between the first GDE and the second GDE to form a membrane electrode assembly (MEA). A MEA includes a first GDL; a second GDL; an electrolyte membrane disposed between the first GDL and the second GDL; a first catalyst layer disposed between the first GDL and the electrolyte membrane; and a second catalyst layer disposed between the second GDL and the electrolyte membrane, wherein a thickness of the electrolyte membrane is about 15 ?m or less.
    Type: Application
    Filed: February 12, 2021
    Publication date: March 16, 2023
    Applicants: Board of Trustees of the Leland Stanford Junior University, Volkswagen Aktiengesellschaft
    Inventors: Friedrich B. Prinz, Timothy Goh, Shicheng Xu, Zhaoxuan Wang, Soonwook Hong, Yongmin Kim, Samuel Dull, Dong Un Lee, Thomas Francisco Jaramillo, Thomas Schladt, Gerold Huebner, Jonathan Müller, Glavas Vedran
  • Publication number: 20230009452
    Abstract: A catalyst structure includes: (1) a substrate; (2) a catalyst layer on the substrate; and (3) an adhesion layer disposed between the substrate and the catalyst layer. In some implementations, an average thickness of the adhesion layer is about 1 nm or less. In some implementations, a material of the catalyst layer at least partially extends into a region of the adhesion layer. In some implementations, the catalyst layer is characterized by a lattice strain imparted by the adhesion layer.
    Type: Application
    Filed: December 11, 2020
    Publication date: January 12, 2023
    Applicants: The Board of Trustees of the Leland Stanford Junior University, Volkswagen Aktiengesellschaft
    Inventors: Friedrich B. PRINZ, Shicheng XU, Yongmin KIM, Thomas JARAMILLO, Drew C. HIGGINS, Maha YUSUF, Zhaoxuan WANG, Kyung Min LEE, Marat ORAZOV, Dong Un LEE, Tanja GRAF, Thomas SCHLADT, Gerold HUEBNER, Hanna-Lena WITTERN, Jonathan Edward MUELLER
  • Patent number: 11462744
    Abstract: A manufacturing process includes: depositing a first catalyst on a first gas diffusion layer (GDL) to form a first catalyst-coated GDL; depositing a first ionomer on the first catalyst-coated GDL to form a first gas diffusion electrode (GDE); depositing a second catalyst on a second GDL to form a second catalyst-coated GDL; depositing a second ionomer on the second catalyst-coated GDL to form a second GDE; and laminating the first GDE with the second GDE and with an electrolyte membrane disposed between the first GDE and the second GDE to form a membrane electrode assembly (MEA). A MEA includes a first GDL; a second GDL; an electrolyte membrane disposed between the first GDL and the second GDL; a first catalyst layer disposed between the first GDL and the electrolyte membrane; and a second catalyst layer disposed between the second GDL and the electrolyte membrane, wherein a thickness of the electrolyte membrane is about 15 ?m or less.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: October 4, 2022
    Assignees: The Board of Trustees of the Leland Stanford Junior University, Volkswagen Aktiengesellschaft
    Inventors: Friedrich B. Prinz, Timothy Goh, Shicheng Xu, Zhaoxuan Wang, Soonwook Hong, Yongmin Kim, Samuel Dull, Dong Un Lee, Thomas Francisco Jaramillo, Thomas Schladt, Gerold Huebner, Jonathan Müller, Glavas Vedran
  • Publication number: 20220302530
    Abstract: Aspects of the disclosure are directed to apparatuses and methods therefor, involving electrochemical conversion. As may be implemented in accordance with one or more embodiments, an apparatus includes an enclosure, an electrochemical converter and an end plate. The electrochemical converter has a membrane between respective electrodes and is configured to convert between a chemical material and energy. The end plate is coupled to the enclosure via an interference fit and forms a chamber with the enclosure and encloses the electrochemical converter. The end plate is configured to/used to apply compressive force to the electrochemical converter, via the interference fit.
    Type: Application
    Filed: March 18, 2021
    Publication date: September 22, 2022
    Inventors: Shicheng Xu, Jan Torgersen
  • Publication number: 20220029171
    Abstract: A manufacturing process includes: depositing a catalyst support on a gas diffusion layer to form a catalyst support-coated gas diffusion layer; depositing a catalyst on the catalyst support-coated gas diffusion layer to form a catalyst-coated gas diffusion layer; and depositing an ionomer on the catalyst-coated gas diffusion layer to form an ionomer-coated gas diffusion layer. A membrane electrode assembly for a fuel cell includes: a gas diffusion layer; a polymer electrolyte membrane; and a catalyst layer disposed between the gas diffusion layer and the polymer electrolyte membrane, wherein the catalyst layer includes an ionomer, and a concentration of the ionomer varies within the catalyst layer according to a concentration profile.
    Type: Application
    Filed: November 25, 2019
    Publication date: January 27, 2022
    Applicants: The Board of Trustees of the Leland Stanford Junior University, Volkswagen Aktiengesellschaft
    Inventors: Shicheng XU, Friedrich B. PRINZ, Thomas SCHLADT, Tanja GRAF, Jonathan Edward MUELLER, Sebastian KIRSCH, Gerold HUEBNER, Vedran GLAVAS
  • Publication number: 20210257629
    Abstract: A manufacturing process includes: depositing a first catalyst on a first gas diffusion layer (GDL) to form a first catalyst-coated GDL; depositing a first ionomer on the first catalyst-coated GDL to form a first gas diffusion electrode (GDE); depositing a second catalyst on a second GDL to form a second catalyst-coated GDL; depositing a second ionomer on the second catalyst-coated GDL to form a second GDE; and laminating the first GDE with the second GDE and with an electrolyte membrane disposed between the first GDE and the second GDE to form a membrane electrode assembly (MEA). A MEA includes a first GDL; a second GDL; an electrolyte membrane disposed between the first GDL and the second GDL; a first catalyst layer disposed between the first GDL and the electrolyte membrane; and a second catalyst layer disposed between the second GDL and the electrolyte membrane, wherein a thickness of the electrolyte membrane is about 15 ?m or less.
    Type: Application
    Filed: February 14, 2020
    Publication date: August 19, 2021
    Inventors: Friedrich B. Prinz, Timothy Goh, Shicheng Xu, Zhaoxuan Wang, Soonwook Hong, Yongmin Kim, Samuel Dull, Dong Un Lee, Thomas Francisco Jaramillo, Thomas Schladt, Gerold Huebner, Jonathan Muller, Glavas Vedran
  • Publication number: 20200343563
    Abstract: A supported catalyst includes: (1) a catalyst support; and (2) deposits of a catalyst covering the catalyst support, wherein the deposits have an average thickness of about 2 nm or less, and the deposits are spaced apart from one another.
    Type: Application
    Filed: November 7, 2018
    Publication date: October 29, 2020
    Applicants: The Board of Trustees of the Leland Stanford Junior University, Volkswagen Aktiengesellschaft
    Inventors: Friedrich B. Prinz, Thomas Jaramillo, Drew C. Higgins, Yongmin Kim, Shicheng Xu, Thomas Schladt, Tanja Graf
  • Publication number: 20200127300
    Abstract: A catalyst structure includes: (1) a substrate; (2) a catalyst layer on the substrate; and (3) an adhesion layer disposed between the substrate and the catalyst layer. In some implementations, an average thickness of the adhesion layer is about 1 nm or less. In some implementations, a material of the catalyst layer at least partially extends into a region of the adhesion layer. In some implementations, the catalyst layer is characterized by a lattice strain imparted by the adhesion layer.
    Type: Application
    Filed: December 13, 2019
    Publication date: April 23, 2020
    Applicants: The Board of Trustees of the Leland Stanford Junior University, Volkswagen Aktiengesellschaft
    Inventors: Friedrich B. PRINZ, Shicheng XU, Yongmin KIM, Thomas JARAMILLO, Drew C. HIGGINS, Maha YUSUF, Zhaoxuan WANG, Kate LEE, Marat ORAZOV, Dong Un LEE, Tanja GRAF, Thomas SCHLADT, Gerold HUEBNER, Hanna-Lena WITTERN, Jonathan Edward MUELLER
  • Publication number: 20190264325
    Abstract: A method includes (1) functionalizing a substrate to yield a functionalized substrate; and (2) depositing a catalyst on the functionalized substrate by atomic layer deposition to form a thin film of the catalyst covering the functionalized substrate.
    Type: Application
    Filed: September 7, 2017
    Publication date: August 29, 2019
    Inventors: Friedrich B. PRINZ, Thomas Francisco JARAMILLO, Tanja GRAF, Thomas SCHLADT, Gerold HUEBNER, Shicheng XU, Yongmin KIM, Maha YUSUF, Drew Christopher HIGGINS
  • Publication number: 20190249301
    Abstract: A method includes: 1) performing an atomic layer deposition cycle including (a) introducing precursors into a deposition chamber housing a substrate to deposit a material on the substrate; and (b) introducing a passivation gas into the deposition chamber to passivate a surface of the material; and 2) repeating 1) a plurality of times to form a film of the material.
    Type: Application
    Filed: September 7, 2017
    Publication date: August 15, 2019
    Inventors: Friedrich B. PRINZ, Shicheng XU, Timothy ENGLISH, John PROVINE, Dickson THIAN, Jan TORGERSEN
  • Publication number: 20150357534
    Abstract: A method of encapsulating PbS quantum dots is provided that includes depositing, using atomic layer deposition (ALD), a first layer of TiO2 on a substrate, depositing, using ALD, a first layer of PbS quantum dots on the first layer of TiO2, and depositing, using ALD, an encapsulating layer of the TiO2 on the first layer of TiO2 and the first layer of PbS quantum dots, where the first layer of PbS quantum dots are encapsulated and separated by the first layer of TiO2 and the encapsulating layer of TiO2.
    Type: Application
    Filed: June 9, 2014
    Publication date: December 10, 2015
    Inventors: Neil Dasgupta, Andrei T. Iancu, Hitoshi Iwadate, Michael C. Langston, Manca Logar, Friedrich B. Prinz, Orlando Trejo, Shicheng Xu
  • Patent number: 9166074
    Abstract: A method of fabricating single-crystalline metal silicide nanowires for anti-reflective electrodes for photovoltaics is provided that includes exposing a surface of a metal foil to oxygen or hydrogen at an elevated temperature, and growing metal silicide nanowires on the metal foil surface by flowing a silane gas mixture over the metal foil surface at the elevated temperature, where spontaneous growth of the metal silicide nanowires occur on the metal foil surface, where the metal silicide nanowires are post treated for use as an electrode in a photovoltaic cell or used directly as the electrode in the photovoltaic cell.
    Type: Grant
    Filed: December 10, 2012
    Date of Patent: October 20, 2015
    Assignees: The Board of Trustees of the Leland Stanford Junior University, Honda Motor Co., LTD.
    Inventors: Neil Dasgupta, Hee Joon Jung, Andrei Iancu, Rainer J. Fasching, Friedrich B. Prinz, Hitoshi Iwadate, Shicheng Xu