Patents by Inventor Shicheng Xu
Shicheng Xu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11973233Abstract: A catalyst structure includes: (1) a substrate; (2) a catalyst layer on the substrate; and (3) an adhesion layer disposed between the substrate and the catalyst layer. In some implementations, an average thickness of the adhesion layer is about 1 nm or less. In some implementations, a material of the catalyst layer at least partially extends into a region of the adhesion layer. In some implementations, the catalyst layer is characterized by a lattice strain imparted by the adhesion layer.Type: GrantFiled: December 11, 2020Date of Patent: April 30, 2024Assignees: The Board of Trustees of the Leland Stanford Junior University, Volkswagen AktiengesellschaftInventors: Friedrich B. Prinz, Shicheng Xu, Yongmin Kim, Thomas Jaramillo, Drew C. Higgins, Maha Yusuf, Zhaoxuan Wang, Kyung Min Lee, Marat Orazov, Dong Un Lee, Tanja Graf, Thomas Schladt, Gerold Huebner, Hanna-Lena Wittern, Jonathan Edward Mueller
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Patent number: 11955646Abstract: A supported catalyst includes: (1) a catalyst support; and (2) deposits of a catalyst covering the catalyst support, wherein the deposits have an average thickness of about 2 nm or less, and the deposits are spaced apart from one another.Type: GrantFiled: November 7, 2018Date of Patent: April 9, 2024Assignees: The Board of Trustees of the Leland Stanford Junior University, Volkswagen AktiengesellschaftInventors: Friedrich B. Prinz, Thomas Jaramillo, Drew C. Higgins, Yongmin Kim, Shicheng Xu, Thomas Schladt, Tanja Graf
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Patent number: 11936051Abstract: A catalyst structure includes: (1) a substrate; (2) a catalyst layer on the substrate; and (3) an adhesion layer disposed between the substrate and the catalyst layer. In some implementations, an average thickness of the adhesion layer is about 1 nm or less. In some implementations, a material of the catalyst layer at least partially extends into a region of the adhesion layer. In some implementations, the catalyst layer is characterized by a lattice strain imparted by the adhesion layer.Type: GrantFiled: December 13, 2019Date of Patent: March 19, 2024Assignees: The Board of Trustees of the Leland Stanford Junior University, Volkswagen AktiengesellschafInventors: Friedrich B. Prinz, Shicheng Xu, Yongmin Kim, Thomas Jaramillo, Drew C. Higgins, Maha Yusuf, Zhaoxuan Wang, Kyung Min Lee, Marat Orazov, Dong Un Lee, Tanja Graf, Thomas Schladt, Gerold Huebner, Hanna-Lena Wittern, Jonathan Edward Mueller
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Patent number: 11834741Abstract: A method includes: 1) performing an atomic layer deposition cycle including (a) introducing precursors into a deposition chamber housing a substrate to deposit a material on the substrate; and (b) introducing a passivation gas into the deposition chamber to passivate a surface of the material; and 2) repeating 1) a plurality of times to form a film of the material.Type: GrantFiled: September 7, 2017Date of Patent: December 5, 2023Assignee: The Board of Trustees of the Leland Stanford Junior UniversityInventors: Friedrich B. Prinz, Shicheng Xu, Timothy English, John Provine, Dickson Thian, Jan Torgersen
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Publication number: 20230079048Abstract: A manufacturing process includes: depositing a first catalyst on a first gas diffusion layer (GDL) to form a first catalyst-coated GDL; depositing a first ionomer on the first catalyst-coated GDL to form a first gas diffusion electrode (GDE); depositing a second catalyst on a second GDL to form a second catalyst-coated GDL; depositing a second ionomer on the second catalyst-coated GDL to form a second GDE; and laminating the first GDE with the second GDE and with an electrolyte membrane disposed between the first GDE and the second GDE to form a membrane electrode assembly (MEA). A MEA includes a first GDL; a second GDL; an electrolyte membrane disposed between the first GDL and the second GDL; a first catalyst layer disposed between the first GDL and the electrolyte membrane; and a second catalyst layer disposed between the second GDL and the electrolyte membrane, wherein a thickness of the electrolyte membrane is about 15 ?m or less.Type: ApplicationFiled: February 12, 2021Publication date: March 16, 2023Applicants: Board of Trustees of the Leland Stanford Junior University, Volkswagen AktiengesellschaftInventors: Friedrich B. Prinz, Timothy Goh, Shicheng Xu, Zhaoxuan Wang, Soonwook Hong, Yongmin Kim, Samuel Dull, Dong Un Lee, Thomas Francisco Jaramillo, Thomas Schladt, Gerold Huebner, Jonathan Müller, Glavas Vedran
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Publication number: 20230009452Abstract: A catalyst structure includes: (1) a substrate; (2) a catalyst layer on the substrate; and (3) an adhesion layer disposed between the substrate and the catalyst layer. In some implementations, an average thickness of the adhesion layer is about 1 nm or less. In some implementations, a material of the catalyst layer at least partially extends into a region of the adhesion layer. In some implementations, the catalyst layer is characterized by a lattice strain imparted by the adhesion layer.Type: ApplicationFiled: December 11, 2020Publication date: January 12, 2023Applicants: The Board of Trustees of the Leland Stanford Junior University, Volkswagen AktiengesellschaftInventors: Friedrich B. PRINZ, Shicheng XU, Yongmin KIM, Thomas JARAMILLO, Drew C. HIGGINS, Maha YUSUF, Zhaoxuan WANG, Kyung Min LEE, Marat ORAZOV, Dong Un LEE, Tanja GRAF, Thomas SCHLADT, Gerold HUEBNER, Hanna-Lena WITTERN, Jonathan Edward MUELLER
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Patent number: 11462744Abstract: A manufacturing process includes: depositing a first catalyst on a first gas diffusion layer (GDL) to form a first catalyst-coated GDL; depositing a first ionomer on the first catalyst-coated GDL to form a first gas diffusion electrode (GDE); depositing a second catalyst on a second GDL to form a second catalyst-coated GDL; depositing a second ionomer on the second catalyst-coated GDL to form a second GDE; and laminating the first GDE with the second GDE and with an electrolyte membrane disposed between the first GDE and the second GDE to form a membrane electrode assembly (MEA). A MEA includes a first GDL; a second GDL; an electrolyte membrane disposed between the first GDL and the second GDL; a first catalyst layer disposed between the first GDL and the electrolyte membrane; and a second catalyst layer disposed between the second GDL and the electrolyte membrane, wherein a thickness of the electrolyte membrane is about 15 ?m or less.Type: GrantFiled: February 14, 2020Date of Patent: October 4, 2022Assignees: The Board of Trustees of the Leland Stanford Junior University, Volkswagen AktiengesellschaftInventors: Friedrich B. Prinz, Timothy Goh, Shicheng Xu, Zhaoxuan Wang, Soonwook Hong, Yongmin Kim, Samuel Dull, Dong Un Lee, Thomas Francisco Jaramillo, Thomas Schladt, Gerold Huebner, Jonathan Müller, Glavas Vedran
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Publication number: 20220302530Abstract: Aspects of the disclosure are directed to apparatuses and methods therefor, involving electrochemical conversion. As may be implemented in accordance with one or more embodiments, an apparatus includes an enclosure, an electrochemical converter and an end plate. The electrochemical converter has a membrane between respective electrodes and is configured to convert between a chemical material and energy. The end plate is coupled to the enclosure via an interference fit and forms a chamber with the enclosure and encloses the electrochemical converter. The end plate is configured to/used to apply compressive force to the electrochemical converter, via the interference fit.Type: ApplicationFiled: March 18, 2021Publication date: September 22, 2022Inventors: Shicheng Xu, Jan Torgersen
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Publication number: 20220029171Abstract: A manufacturing process includes: depositing a catalyst support on a gas diffusion layer to form a catalyst support-coated gas diffusion layer; depositing a catalyst on the catalyst support-coated gas diffusion layer to form a catalyst-coated gas diffusion layer; and depositing an ionomer on the catalyst-coated gas diffusion layer to form an ionomer-coated gas diffusion layer. A membrane electrode assembly for a fuel cell includes: a gas diffusion layer; a polymer electrolyte membrane; and a catalyst layer disposed between the gas diffusion layer and the polymer electrolyte membrane, wherein the catalyst layer includes an ionomer, and a concentration of the ionomer varies within the catalyst layer according to a concentration profile.Type: ApplicationFiled: November 25, 2019Publication date: January 27, 2022Applicants: The Board of Trustees of the Leland Stanford Junior University, Volkswagen AktiengesellschaftInventors: Shicheng XU, Friedrich B. PRINZ, Thomas SCHLADT, Tanja GRAF, Jonathan Edward MUELLER, Sebastian KIRSCH, Gerold HUEBNER, Vedran GLAVAS
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Publication number: 20210257629Abstract: A manufacturing process includes: depositing a first catalyst on a first gas diffusion layer (GDL) to form a first catalyst-coated GDL; depositing a first ionomer on the first catalyst-coated GDL to form a first gas diffusion electrode (GDE); depositing a second catalyst on a second GDL to form a second catalyst-coated GDL; depositing a second ionomer on the second catalyst-coated GDL to form a second GDE; and laminating the first GDE with the second GDE and with an electrolyte membrane disposed between the first GDE and the second GDE to form a membrane electrode assembly (MEA). A MEA includes a first GDL; a second GDL; an electrolyte membrane disposed between the first GDL and the second GDL; a first catalyst layer disposed between the first GDL and the electrolyte membrane; and a second catalyst layer disposed between the second GDL and the electrolyte membrane, wherein a thickness of the electrolyte membrane is about 15 ?m or less.Type: ApplicationFiled: February 14, 2020Publication date: August 19, 2021Inventors: Friedrich B. Prinz, Timothy Goh, Shicheng Xu, Zhaoxuan Wang, Soonwook Hong, Yongmin Kim, Samuel Dull, Dong Un Lee, Thomas Francisco Jaramillo, Thomas Schladt, Gerold Huebner, Jonathan Muller, Glavas Vedran
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Publication number: 20200343563Abstract: A supported catalyst includes: (1) a catalyst support; and (2) deposits of a catalyst covering the catalyst support, wherein the deposits have an average thickness of about 2 nm or less, and the deposits are spaced apart from one another.Type: ApplicationFiled: November 7, 2018Publication date: October 29, 2020Applicants: The Board of Trustees of the Leland Stanford Junior University, Volkswagen AktiengesellschaftInventors: Friedrich B. Prinz, Thomas Jaramillo, Drew C. Higgins, Yongmin Kim, Shicheng Xu, Thomas Schladt, Tanja Graf
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Publication number: 20200127300Abstract: A catalyst structure includes: (1) a substrate; (2) a catalyst layer on the substrate; and (3) an adhesion layer disposed between the substrate and the catalyst layer. In some implementations, an average thickness of the adhesion layer is about 1 nm or less. In some implementations, a material of the catalyst layer at least partially extends into a region of the adhesion layer. In some implementations, the catalyst layer is characterized by a lattice strain imparted by the adhesion layer.Type: ApplicationFiled: December 13, 2019Publication date: April 23, 2020Applicants: The Board of Trustees of the Leland Stanford Junior University, Volkswagen AktiengesellschaftInventors: Friedrich B. PRINZ, Shicheng XU, Yongmin KIM, Thomas JARAMILLO, Drew C. HIGGINS, Maha YUSUF, Zhaoxuan WANG, Kate LEE, Marat ORAZOV, Dong Un LEE, Tanja GRAF, Thomas SCHLADT, Gerold HUEBNER, Hanna-Lena WITTERN, Jonathan Edward MUELLER
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Publication number: 20190264325Abstract: A method includes (1) functionalizing a substrate to yield a functionalized substrate; and (2) depositing a catalyst on the functionalized substrate by atomic layer deposition to form a thin film of the catalyst covering the functionalized substrate.Type: ApplicationFiled: September 7, 2017Publication date: August 29, 2019Inventors: Friedrich B. PRINZ, Thomas Francisco JARAMILLO, Tanja GRAF, Thomas SCHLADT, Gerold HUEBNER, Shicheng XU, Yongmin KIM, Maha YUSUF, Drew Christopher HIGGINS
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Publication number: 20190249301Abstract: A method includes: 1) performing an atomic layer deposition cycle including (a) introducing precursors into a deposition chamber housing a substrate to deposit a material on the substrate; and (b) introducing a passivation gas into the deposition chamber to passivate a surface of the material; and 2) repeating 1) a plurality of times to form a film of the material.Type: ApplicationFiled: September 7, 2017Publication date: August 15, 2019Inventors: Friedrich B. PRINZ, Shicheng XU, Timothy ENGLISH, John PROVINE, Dickson THIAN, Jan TORGERSEN
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Publication number: 20150357534Abstract: A method of encapsulating PbS quantum dots is provided that includes depositing, using atomic layer deposition (ALD), a first layer of TiO2 on a substrate, depositing, using ALD, a first layer of PbS quantum dots on the first layer of TiO2, and depositing, using ALD, an encapsulating layer of the TiO2 on the first layer of TiO2 and the first layer of PbS quantum dots, where the first layer of PbS quantum dots are encapsulated and separated by the first layer of TiO2 and the encapsulating layer of TiO2.Type: ApplicationFiled: June 9, 2014Publication date: December 10, 2015Inventors: Neil Dasgupta, Andrei T. Iancu, Hitoshi Iwadate, Michael C. Langston, Manca Logar, Friedrich B. Prinz, Orlando Trejo, Shicheng Xu
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Patent number: 9166074Abstract: A method of fabricating single-crystalline metal silicide nanowires for anti-reflective electrodes for photovoltaics is provided that includes exposing a surface of a metal foil to oxygen or hydrogen at an elevated temperature, and growing metal silicide nanowires on the metal foil surface by flowing a silane gas mixture over the metal foil surface at the elevated temperature, where spontaneous growth of the metal silicide nanowires occur on the metal foil surface, where the metal silicide nanowires are post treated for use as an electrode in a photovoltaic cell or used directly as the electrode in the photovoltaic cell.Type: GrantFiled: December 10, 2012Date of Patent: October 20, 2015Assignees: The Board of Trustees of the Leland Stanford Junior University, Honda Motor Co., LTD.Inventors: Neil Dasgupta, Hee Joon Jung, Andrei Iancu, Rainer J. Fasching, Friedrich B. Prinz, Hitoshi Iwadate, Shicheng Xu