Abstract: A gas homogenizing device for a process chamber includes a flow homogenizing plate, a first isolation plate and a second isolation plate. The flow homogenizing plate includes a first guide slot opened on the first surface, a second guide slot opened on a second surface opposite to the first surface; and at least one first outlet hole. The at least one first inlet end of the first guide slot is in communication with a first gas source, and the at least one second inlet end of the second inlet end is in communication with a second gas source. The at least one first outlet end of the first guide slot is in communication with the at least one second outlet end of the second guide slot through the at least one first outlet hole.

Abstract: A solar cell silicon wafer carrying device and a transmission system are provided, wherein the solar cell silicon wafer carrying device comprises a tray and an auxiliary mask member, and a side surface of the tray is provided with a spacing slot and a receiving slot. The spacing slot and the receiving slot are arranged in a stepped manner with the spacing slot located below the receiving slot. The auxiliary mask member covers over the receiving slot and is provided with a mask hole in communication with the receiving slot. The mask hole is provided along a perimeter thereof with a shielding portion for shielding an edge of the receiving slot.