Patents by Inventor Shichiro Takahashi

Shichiro Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Negative photosensitive composition and method for forming patterns using the composition
    Patent number: 5529885
    Abstract: Disclosed are a negative photosensitive composition comprising an alkali-soluble resin, a photo acid generating system, and a crosslinking agent for the alkali-soluble resin which acts on the resin under acidic conditions, in which the crosslinking agent is a highly-alkylated alkoxymethylmelamine resin having a monomer content of from 5 to 40% by weight, and a method for forming a negative photo-resist pattern using the composition. The resist composition is stable during storage and gives good pattern profiles having high aspect ratios even though the resist film is made thick.
    Type: Grant
    Filed: June 3, 1994
    Date of Patent: June 25, 1996
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Tameichi Ochiai, Ryuichiro Takasaki, Yasuhiro Kameyama, Shichiro Takahashi