Patents by Inventor Shiezen Steven Huang
Shiezen Steven Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8925622Abstract: A cooling plate includes a casing being internally divided into an upper chamber and a lower chamber; an air inlet deposited on at least one lateral wall of the casing enclosing the upper chamber; a plurality of through holes being formed on the partition board and such arranged that the through holes closer to the air inlet are smaller in diameter and the through holes farther from the air inlet are larger in diameter, wherein the upper chamber and the lower chamber are communicated to each other via the through holes; and a plurality of air outlets provided on a lower board below the lower chamber for communicating the lower chamber to an exterior of the casing, wherein the air outlets are identical in diameter and arranged into a matrix-like pattern.Type: GrantFiled: May 2, 2012Date of Patent: January 6, 2015Assignee: ADPV Technology LimitedInventors: Shiezen Steven Huang, Jhao-Lung Zeng
-
Publication number: 20140216577Abstract: A gas release device is formed of two plates combined together. Each of the plates includes an intake groove. Each of the intake grooves is linked with a first distribution groove. Each of the first distribution grooves is linked with two second distribution grooves. Each of the second distribution grooves is linked with two third distribution grooves. Each of the third distribution grooves is linked with two fourth distribution grooves. Each of the fourth distribution grooves is linked with two fifth distribution grooves. Each of the fifth distribution grooves has a venthole. After a gas of a vapor deposition source enters the intake groove, the gas passes through the first, second, third, fourth, and fifth distribution grooves in order and then substantially equal amount of the gas is finally released out of each of the ventholes.Type: ApplicationFiled: January 28, 2014Publication date: August 7, 2014Applicant: ADPV TECHNOLOGY LIMITEDInventors: Shiezen Steven HUANG, Ke-Feng LIAO, Wen-Bo LAI, Kwan-Kin CHAN, Sheng LI, Liang MENG, Jhao-Lung ZENG, Guan-Bi CHEN
-
Publication number: 20140220878Abstract: A gas release device for a coating process includes an upper plate, a first intermediate plate, a second intermediate plate, and a lower plate, four of which are superposed on each other from top to bottom. The upper plate is linked and communicates with the first intermediate plate through a first passage. The first intermediate plate is linked and communicates with the second intermediate plate through at least two second passages. The second intermediate plate is linked with the lower plate through at least four third passages. The lower plate includes at least four ventholes. In light of this, after a gas of a vapor deposition source enters the inlet, the gas of the same amount can be released out of each venthole to make the thickness of a thin film uniform for relatively higher quality of the coating process.Type: ApplicationFiled: January 28, 2014Publication date: August 7, 2014Applicant: ADPV TECHNOLOGY LIMITEDInventors: Shiezen Steven HUANG, Ke-Feng LIAO, Wen-Bo LAI, Kwan-Kin CHAN, Sheng LI, Liang MENG, Jhao-Lung ZENG, Guan-Bi CHEN
-
Publication number: 20130240189Abstract: A cooling plate includes a casing being internally divided into an upper chamber and a lower chamber; an air inlet deposited on at least one lateral wall of the casing enclosing the upper chamber; a plurality of through holes being formed on the partition board and such arranged that the through holes closer to the air inlet are smaller in diameter and the through holes farther from the air inlet are larger in diameter, wherein the upper chamber and the lower chamber are communicated to each other via the through holes; and a plurality of air outlets provided on a lower board below the lower chamber for communicating the lower chamber to an exterior of the casing, wherein the air outlets are identical in diameter and arranged into a matrix-like pattern.Type: ApplicationFiled: May 2, 2012Publication date: September 19, 2013Applicant: ADPV TECHNOLOGY LIMITEDInventors: Shiezen Steven Huang, Jhao-Lung Zeng
-
Patent number: 8372683Abstract: An RTP heating system and an RTP heating method, which can heat a photovoltaic-device intermediate product having a glass substrate, a Mo layer, and a light absorption layer in formation. The RTP heating system is composed of a chamber; a support member located in the chamber; a heating element mounted in the chamber for emitting infrared rays for heating; and a plurality of temperature sensors and a temperature control device for sensing and controlling thermal sources from the heating element and the support member. The infrared rays can be mostly reflected off the Mo layer to apply less direct heating to the glass substrate. Accordingly, the upper and lower surfaces of the photovoltaic-device intermediate product can be heated under different temperatures separately to prevent the glass substrate below the photovoltaic-device intermediate product from softening and deformation and to allow production of the light absorption layer on the Mo layer.Type: GrantFiled: January 11, 2011Date of Patent: February 12, 2013Assignee: ADPV Technology LimitedInventor: Shiezen Steven Huang
-
Publication number: 20120003774Abstract: An RTP heating system and an RTP heating method, which can heat a photovoltaic-device intermediate product having a glass substrate, a Mo layer, and a light absorption layer in formation. The RTP heating system is composed of a chamber; a support member located in the chamber; a heating element mounted in the chamber for emitting infrared rays for heating; and a plurality of temperature sensors and a temperature control device for sensing and controlling thermal sources from the heating element and the support member. The infrared rays can be mostly reflected off the Mo layer to apply less direct heating to the glass substrate. Accordingly, the upper and lower surfaces of the photovoltaic-device intermediate product can be heated under different temperatures separately to prevent the glass substrate below the photovoltaic-device intermediate product from softening and deformation and to allow production of the light absorption layer on the Mo layer.Type: ApplicationFiled: January 11, 2011Publication date: January 5, 2012Inventor: Shiezen Steven HUANG