Patents by Inventor Shifei Shen

Shifei Shen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240242656
    Abstract: A power supply circuit, a driving method thereof, a printed circuit board, a display module and a display apparatus are disclosed, which relates to a technical field of displaying. The power supply circuit includes a first power management chip and a second power management chip configured to be respectively connected with a display panel and provide different driving signals to the display panel, and the driving signals are configured for driving the display panel to display.
    Type: Application
    Filed: May 20, 2022
    Publication date: July 18, 2024
    Applicants: CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE Technology Group Co., Ltd.
    Inventors: Ying Zhang, Jin Sha, Can Shen, Xiang Fang, Bo Ran, Chao Gao, Yao Chen, Yiming Cheng, Jinxiang Li, Shifei Huang, Shengjie Yin, Pan Chen, Jun Tao, Wendi Zhang, Zhou Zhang, Qiuju Xie, Jun Wei, Hongchao Su
  • Patent number: 10714513
    Abstract: An array substrate and a manufacturing method thereof are disclosed. The manufacturing method includes forming, on a substrate, a first metal pattern layer, a first insulating layer, a second metal pattern layer, and a second insulating layer, successively; coating a photoresist on the second insulating layer; forming a photoresist pattern and an etching protection layer, in a first region of the array substrate, the photoresist pattern exposing a part of the top surface of the second insulating layer, and being coupled to the second insulating layer through the etching protection layer; and performing etching in the first region by using the photoresist pattern as a mask to remove the etching protection layer and at least part of the second insulating layer, without etching the first insulating layer, so as to expose a part of the second metal pattern layer and form a liquid crystal diversion groove.
    Type: Grant
    Filed: April 12, 2018
    Date of Patent: July 14, 2020
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Maomao Fang, Youngjin Song, Ziheng Yang, Shifei Shen, Dengtao Li, Shengrong Li, Yishen Wang
  • Publication number: 20190064583
    Abstract: An array substrate and a manufacturing method thereof are disclosed. The manufacturing method includes forming, on a substrate, a first metal pattern layer, a first insulating layer, a second metal pattern layer, and a second insulating layer, successively; coating a photoresist on the second insulating layer; forming a photoresist pattern and an etching protection layer, in a first region of the array substrate, the photoresist pattern exposing a part of the top surface of the second insulating layer, and being coupled to the second insulating layer through the etching protection layer; and performing etching in the first region by using the photoresist pattern as a mask to remove the etching protection layer and at least part of the second insulating layer, without etching the first insulating layer, so as to expose a part of the second metal pattern layer and form a liquid crystal is diversion groove.
    Type: Application
    Filed: April 12, 2018
    Publication date: February 28, 2019
    Inventors: Maomao FANG, Youngjin SONG, Ziheng YANG, Shifei SHEN, Dengtao LI, Shengrong LI, Yishen WANG
  • Patent number: 10090338
    Abstract: Disclosed is a method for manufacturing an array substrate, the array substrate and a display device which can reduce manufacturing steps of a color filter process and further reduce manufacturing steps of the display device, thereby saving manufacturing cost and time. The method for manufacturing the array substrate includes: forming a thin film transistor on a base substrate; forming a passivation layer having a via hole on a front side of the thin film transistor and forming a photo spacer on a front side of the passivation layer through a halftone mask patterning process. With this method for manufacturing the array substrate, there is no need to prepare the photo spacer on a back side of the color filter substrate. Therefore, it is possible to reduce manufacturing steps of a color filter process, which in turn further reduces manufacturing steps of the display device, thereby saving manufacturing cost and time.
    Type: Grant
    Filed: August 4, 2016
    Date of Patent: October 2, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Shifei Shen, Jeong Hun Rhee, Youngjin Song, Maomao Fang, Jianxin Hou
  • Publication number: 20170263655
    Abstract: Disclosed is a method for manufacturing an array substrate, the array substrate and a display device which can reduce manufacturing steps of a color filter process and further reduce manufacturing steps of the display device, thereby saving manufacturing cost and time. The method for manufacturing the array substrate includes: forming a thin film transistor on a base substrate; forming a passivation layer having a via hole on a front side of the thin film transistor and forming a photo spacer on a front side of the passivation layer through a halftone mask patterning process. With this method for manufacturing the array substrate, there is no need to prepare the photo spacer on a back side of the color filter substrate. Therefore, it is possible to reduce manufacturing steps of a color filter process, which in turn further reduces manufacturing steps of the display device, thereby saving manufacturing cost and time.
    Type: Application
    Filed: August 4, 2016
    Publication date: September 14, 2017
    Inventors: Shifei Shen, Jeong Hun Rhee, Youngjin Song, Maomao Fang, Jianxin Hou