Patents by Inventor Shifu Xu

Shifu Xu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Measuring device having ideal wavefront generator for detecting point diffraction interferometric wavefront aberration of measured optical system and method for detecting wavefront aberration thereof
    Patent number: 9863841
    Abstract: A point diffraction interferometric wavefront aberration measuring device comprising an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. The center distance between the first output port and the second output port of the ideal wavefront generator is smaller than the diameter of the isoplanatic region of the measured optical system and is greater than the ratio of the diameter of the image point dispersion speckle of the measured optical system over the amplification factor thereof. A method for detecting wavefront aberration of the optical system is also provided by using the device.
    Type: Grant
    Filed: December 31, 2015
    Date of Patent: January 9, 2018
    Assignee: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
    Inventors: Xiangzhao Wang, Feng Tang, Guoxian Zhang, Shifu Xu
  • MEASURING DEVICE FOR POINT DIFFRACTION INTERFEROMETRIC WAVEFRONT ABERRATION AND METHOD FOR DETECTING WAVE ABERRATION
    Publication number: 20170184455
    Abstract: A point diffraction interferometric wavefront aberration measuring device comprising an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. The center distance between the first output port and the second output port of the ideal wavefront generator is smaller than the diameter of the isoplanatic region of the measured optical system and is greater than the ratio of the diameter of the image point dispersion speckle of the measured optical system over the amplification factor thereof. A method for detecting wavefront aberration of the optical system is also provided by using the device.
    Type: Application
    Filed: December 31, 2015
    Publication date: June 29, 2017
    Inventors: Xiangzhao Wang, Feng Tang, Guoxian Zhang, Shifu Xu