Patents by Inventor Shigehide Itou
Shigehide Itou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11071953Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.63??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: GrantFiled: June 14, 2019Date of Patent: July 27, 2021Assignee: FUJIFILM CorporationInventors: Yusuke Mochizuki, Makoto Sawada, Takeshi Narita, Shigehide Itou, Hiroyuki Noda, Atsushi Mukai
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Patent number: 10427111Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.55??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: GrantFiled: March 14, 2017Date of Patent: October 1, 2019Assignee: FUJIFILM CorporationInventors: Yusuke Mochizuki, Makoto Sawada, Takeshi Narita, Shigehide Itou, Hiroyuki Noda, Atsushi Mukai
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Publication number: 20190291060Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.63??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: ApplicationFiled: June 14, 2019Publication date: September 26, 2019Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Makoto SAWADA, Takeshi NARITA, Shigehide ITOU, Hiroyuki NODA, Atsushi MUKAI
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Publication number: 20170182469Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.55??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: ApplicationFiled: March 14, 2017Publication date: June 29, 2017Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Makoto SAWADA, Takeshi NARITA, Shigehide ITOU, Hiroyuki NODA, Atsushi MUKAI
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Patent number: 9498755Abstract: A gas separation membrane containing a support and a separating layer formed on the support, the separating layer containing a main body and a hydrophilic layer; the main body being disposed on the side of the support; the hydrophilic layer being disposed on the far side of the support and containing a hydrophilic polymer.Type: GrantFiled: May 27, 2014Date of Patent: November 22, 2016Assignee: FUJIFILM CorporationInventors: Kenichi Ishizuka, Shigehide Itou
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Patent number: 9314736Abstract: A separation composite membrane including: a separating layer for separating fluid components, the separating layer being constituted of a polymer having cross-linked structure, and a porous layer for supporting the separating layer, the porous layer having a maximum pore diameter of 0.05 to 0.5 ?m, the separating layer being partly impregnated into the porous layer in the range of 0.1 to 30% in terms of the impregnation amount ratio (?a) defined by Formula (A): [impregnation amount ratio (?a){%}=impregnation depth (s)/(membrane thickness (t1) of separating layer)×100]??(A).Type: GrantFiled: August 12, 2014Date of Patent: April 19, 2016Assignee: FUJIFILM CorporationInventor: Shigehide Itou
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Patent number: 9272248Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin has structure in which a polyimide compound is crosslinked and linked, and the polyimide compound is a copolymer having at least an imide group-containing monomer component and a monomer component having a specific polar group; and a module, a gas separation apparatus and a gas separation method using the same.Type: GrantFiled: January 17, 2014Date of Patent: March 1, 2016Assignee: FUJIFILM CorporationInventors: Satoshi Sano, Ichirou Nagata, Tomonori Ishino, Kentaro Shiratsuchi, Shigehide Itou, Kenichi Ishizuka, Takeshi Umehara
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Patent number: 9248413Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin is formed by a polyimide compound being crosslinked by a radically crosslinkable functional group thereof, and a ratio [?] of a crosslinked site to an imide group of the polyimide compound (the number of crosslinked sites/the number of imide groups) in the crosslinked polyimide resin is 0.0001 or more and 0.45 or less; a method of producing the same; and a gas separating module, a gas separation apparatus and a gas separation method using the same.Type: GrantFiled: January 17, 2014Date of Patent: February 2, 2016Assignee: FUJIFILM CorporationInventors: Satoshi Sano, Ichirou Nagata, Tomonori Ishino, Kentaro Shiratsuchi, Shigehide Itou, Kenichi Ishizuka, Takeshi Umehara
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Patent number: 9238204Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin has structure in which a polyimide compound is crosslinked through a specific crosslinking chain, the specific crosslinking chain has at least one kind of linking group selected from the group consisting of —NRaC(?O)—, —NRbC(?O)O—, —CH2OCH2—, —CH2SCH2—, —OC(?O)O—, —C(?O)O?N+(Rc)3—, —SO3?N+(Rd)3— and —PO3?N+(Re)3—, and Ra, Rb, Rc, Rd and Re each independently represent a hydrogen atom or a substituent.Type: GrantFiled: January 17, 2014Date of Patent: January 19, 2016Assignee: FUJIFILM CorporationInventors: Satoshi Sano, Tomonori Ishino, Ichirou Nagata, Kentaro Shiratsuchi, Shigehide Itou, Kenichi Ishizuka, Takeshi Umehara
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Publication number: 20140345462Abstract: A separation composite membrane including: a separating layer for separating fluid components, the separating layer being constituted of a polymer having cross-linked structure, and a porous layer for supporting the separating layer, the porous layer having a maximum pore diameter of 0.05 to 0.5 ?m, the separating layer being partly impregnated into the porous layer in the range of 0.1 to 30% in terms of the impregnation amount ratio (?a) defined by Formula (A): [impregnation amount ratio (?a) {% }=impregnation depth (s)/(membrane thickness (t1) of separating layer)×100]??(A).Type: ApplicationFiled: August 12, 2014Publication date: November 27, 2014Applicant: FUJIFILM CORPORATIONInventor: Shigehide ITOU
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Publication number: 20140260986Abstract: A gas separation membrane containing a support and a separating layer formed on the support, the separating layer containing a main body and a hydrophilic layer; the main body being disposed on the side of the support; the hydrophilic layer being disposed on the far side of the support and containing a hydrophilic polymer.Type: ApplicationFiled: May 27, 2014Publication date: September 18, 2014Applicant: FUJIFILM CORPORATIONInventors: Kenichi ISHIZUKA, Shigehide ITOU
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Publication number: 20140208949Abstract: A gas separation membrane, containing: a support; and a separating layer formed on the support, the separating layer containing a resin; the separating layer containing, at the side thereof opposite to the support, a hydrophilic modification treatment surface, the hydrophilic modification treatment surface involved in a layer having a film thickness of 0.1 ?m or less, and the hydrophilic modification treatment surface provided with a surface contact angle measured by using water thereon in the range of 60 degrees or less.Type: ApplicationFiled: March 27, 2014Publication date: July 31, 2014Applicant: FUJIFILM CORPORATIONInventors: Kenichi ISHIZUKA, Shigehide ITOU
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Publication number: 20140130668Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin has structure in which a polyimide compound is crosslinked through a specific crosslinking chain, the specific crosslinking chain has at least one kind of linking group selected from the group consisting of —NRaC(?O)—, —NRbC(?O)O—, —CH2OCH2—, —CH2SCH2—, —OC(?O)O—, —C(?O)O?N+(Rc)3—, —SO3?N+(Rd)3— and —PO3?N+(Re)3—, and Ra, Rb, Rc, Rd and Re each independently represent a hydrogen atom or a substituent.Type: ApplicationFiled: January 17, 2014Publication date: May 15, 2014Applicant: FUJIFILM CorporationInventors: Satoshi SANO, Tomonori ISHINO, Ichirou NAGATA, Kentaro SHIRATSUCHI, Shigehide ITOU, Kenichi ISHIZUKA, Takeshi UMEHARA
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Publication number: 20140130669Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin has structure in which a polyimide compound is crosslinked and linked, and the polyimide compound is a copolymer having at least an imide group-containing monomer component and a monomer component having a specific polar group; and a module, a gas separation apparatus and a gas separation method using the same.Type: ApplicationFiled: January 17, 2014Publication date: May 15, 2014Applicant: FUJIFILM CorporationInventors: Satoshi SANO, Ichirou NAGATA, Tomonori ISHINO, Kentaro SHIRATSUCHI, Shigehide ITOU, Kenichi ISHIZUKA, Takeshi UMEHARA
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Publication number: 20140130667Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin is formed by a polyimide compound being crosslinked by a radically crosslinkable functional group thereof, and a ratio [?] of a crosslinked site to an imide group of the polyimide compound (the number of crosslinked sites/the number of imide groups) in the crosslinked polyimide resin is 0.0001 or more and 0.45 or less; a method of producing the same; and a gas separating module, a gas separation apparatus and a gas separation method using the same.Type: ApplicationFiled: January 17, 2014Publication date: May 15, 2014Applicant: FUJIFILM CorporationInventors: Satoshi SANO, Ichirou NAGATA, Tomonori ISHINO, Kentaro SHIRATSUCHI, Shigehide ITOU, Kenichi ISHIZUKA, Takeshi UMEHARA
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Publication number: 20130000724Abstract: Provided is a gas barrier film produced by according to a roll-to-roll process which is excellent in gas barrier performance. The gas barrier film is produced by providing, as a topmost layer on a second surface of the substrate film, a low-hardness layer having a pencil hardness lower by two or more grades than the pencil hardness of the organic layer; and providing the organic layer on the first surface of the substrate film.Type: ApplicationFiled: March 22, 2011Publication date: January 3, 2013Applicant: FUJIFILM CORPORATIONInventor: Shigehide Itou
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Patent number: 8283020Abstract: A laminate film having excellent barrier property is provided. The laminate film comprises a substrate film, an organic layer and an inorganic layer in that order, wherein the organic layer has a thickness of 300 nm to 2000 nm, the inorganic layer comprises silicon oxide represented by SiOx, wherein x is in a range from 0.9 to 1.5, and the organic layer has a surface satisfying Ra (100 ?m square)<50 nm, Ra (10 ?m square)<2 nm, and 75 nm<Rz (100 ?m square)<300 nm.Type: GrantFiled: August 24, 2010Date of Patent: October 9, 2012Assignee: Fujifilm CorporationInventor: Shigehide Itou
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Publication number: 20110052868Abstract: A laminate film having excellent barrier property is provided. The laminate film comprises a substrate film, an organic layer and an inorganic layer in that order, wherein the organic layer has a thickness of 300 nm to 2000 nm, the inorganic layer comprises silicon oxide represented by SiOx, wherein x is in a range from 0.9 to 1.5, and the organic layer has a surface satisfying Ra (100 ?m square)<50 nm, Ra (10 ?m square)<2 nm, and 75 nm<Rz (100 ?m square)<300 nm.Type: ApplicationFiled: August 24, 2010Publication date: March 3, 2011Inventor: Shigehide Itou