Patents by Inventor Shigehide Itou

Shigehide Itou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11071953
    Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.63??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.
    Type: Grant
    Filed: June 14, 2019
    Date of Patent: July 27, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Mochizuki, Makoto Sawada, Takeshi Narita, Shigehide Itou, Hiroyuki Noda, Atsushi Mukai
  • Patent number: 10427111
    Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.55??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.
    Type: Grant
    Filed: March 14, 2017
    Date of Patent: October 1, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Mochizuki, Makoto Sawada, Takeshi Narita, Shigehide Itou, Hiroyuki Noda, Atsushi Mukai
  • Publication number: 20190291060
    Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.63??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.
    Type: Application
    Filed: June 14, 2019
    Publication date: September 26, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Yusuke MOCHIZUKI, Makoto SAWADA, Takeshi NARITA, Shigehide ITOU, Hiroyuki NODA, Atsushi MUKAI
  • Publication number: 20170182469
    Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.55??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.
    Type: Application
    Filed: March 14, 2017
    Publication date: June 29, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Yusuke MOCHIZUKI, Makoto SAWADA, Takeshi NARITA, Shigehide ITOU, Hiroyuki NODA, Atsushi MUKAI
  • Patent number: 9498755
    Abstract: A gas separation membrane containing a support and a separating layer formed on the support, the separating layer containing a main body and a hydrophilic layer; the main body being disposed on the side of the support; the hydrophilic layer being disposed on the far side of the support and containing a hydrophilic polymer.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: November 22, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Kenichi Ishizuka, Shigehide Itou
  • Patent number: 9314736
    Abstract: A separation composite membrane including: a separating layer for separating fluid components, the separating layer being constituted of a polymer having cross-linked structure, and a porous layer for supporting the separating layer, the porous layer having a maximum pore diameter of 0.05 to 0.5 ?m, the separating layer being partly impregnated into the porous layer in the range of 0.1 to 30% in terms of the impregnation amount ratio (?a) defined by Formula (A): [impregnation amount ratio (?a){%}=impregnation depth (s)/(membrane thickness (t1) of separating layer)×100]??(A).
    Type: Grant
    Filed: August 12, 2014
    Date of Patent: April 19, 2016
    Assignee: FUJIFILM Corporation
    Inventor: Shigehide Itou
  • Patent number: 9272248
    Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin has structure in which a polyimide compound is crosslinked and linked, and the polyimide compound is a copolymer having at least an imide group-containing monomer component and a monomer component having a specific polar group; and a module, a gas separation apparatus and a gas separation method using the same.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: March 1, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Satoshi Sano, Ichirou Nagata, Tomonori Ishino, Kentaro Shiratsuchi, Shigehide Itou, Kenichi Ishizuka, Takeshi Umehara
  • Patent number: 9248413
    Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin is formed by a polyimide compound being crosslinked by a radically crosslinkable functional group thereof, and a ratio [?] of a crosslinked site to an imide group of the polyimide compound (the number of crosslinked sites/the number of imide groups) in the crosslinked polyimide resin is 0.0001 or more and 0.45 or less; a method of producing the same; and a gas separating module, a gas separation apparatus and a gas separation method using the same.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: February 2, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Satoshi Sano, Ichirou Nagata, Tomonori Ishino, Kentaro Shiratsuchi, Shigehide Itou, Kenichi Ishizuka, Takeshi Umehara
  • Patent number: 9238204
    Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin has structure in which a polyimide compound is crosslinked through a specific crosslinking chain, the specific crosslinking chain has at least one kind of linking group selected from the group consisting of —NRaC(?O)—, —NRbC(?O)O—, —CH2OCH2—, —CH2SCH2—, —OC(?O)O—, —C(?O)O?N+(Rc)3—, —SO3?N+(Rd)3— and —PO3?N+(Re)3—, and Ra, Rb, Rc, Rd and Re each independently represent a hydrogen atom or a substituent.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: January 19, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Satoshi Sano, Tomonori Ishino, Ichirou Nagata, Kentaro Shiratsuchi, Shigehide Itou, Kenichi Ishizuka, Takeshi Umehara
  • Publication number: 20140345462
    Abstract: A separation composite membrane including: a separating layer for separating fluid components, the separating layer being constituted of a polymer having cross-linked structure, and a porous layer for supporting the separating layer, the porous layer having a maximum pore diameter of 0.05 to 0.5 ?m, the separating layer being partly impregnated into the porous layer in the range of 0.1 to 30% in terms of the impregnation amount ratio (?a) defined by Formula (A): [impregnation amount ratio (?a) {% }=impregnation depth (s)/(membrane thickness (t1) of separating layer)×100]??(A).
    Type: Application
    Filed: August 12, 2014
    Publication date: November 27, 2014
    Applicant: FUJIFILM CORPORATION
    Inventor: Shigehide ITOU
  • Publication number: 20140260986
    Abstract: A gas separation membrane containing a support and a separating layer formed on the support, the separating layer containing a main body and a hydrophilic layer; the main body being disposed on the side of the support; the hydrophilic layer being disposed on the far side of the support and containing a hydrophilic polymer.
    Type: Application
    Filed: May 27, 2014
    Publication date: September 18, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Kenichi ISHIZUKA, Shigehide ITOU
  • Publication number: 20140208949
    Abstract: A gas separation membrane, containing: a support; and a separating layer formed on the support, the separating layer containing a resin; the separating layer containing, at the side thereof opposite to the support, a hydrophilic modification treatment surface, the hydrophilic modification treatment surface involved in a layer having a film thickness of 0.1 ?m or less, and the hydrophilic modification treatment surface provided with a surface contact angle measured by using water thereon in the range of 60 degrees or less.
    Type: Application
    Filed: March 27, 2014
    Publication date: July 31, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Kenichi ISHIZUKA, Shigehide ITOU
  • Publication number: 20140130668
    Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin has structure in which a polyimide compound is crosslinked through a specific crosslinking chain, the specific crosslinking chain has at least one kind of linking group selected from the group consisting of —NRaC(?O)—, —NRbC(?O)O—, —CH2OCH2—, —CH2SCH2—, —OC(?O)O—, —C(?O)O?N+(Rc)3—, —SO3?N+(Rd)3— and —PO3?N+(Re)3—, and Ra, Rb, Rc, Rd and Re each independently represent a hydrogen atom or a substituent.
    Type: Application
    Filed: January 17, 2014
    Publication date: May 15, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Satoshi SANO, Tomonori ISHINO, Ichirou NAGATA, Kentaro SHIRATSUCHI, Shigehide ITOU, Kenichi ISHIZUKA, Takeshi UMEHARA
  • Publication number: 20140130669
    Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin has structure in which a polyimide compound is crosslinked and linked, and the polyimide compound is a copolymer having at least an imide group-containing monomer component and a monomer component having a specific polar group; and a module, a gas separation apparatus and a gas separation method using the same.
    Type: Application
    Filed: January 17, 2014
    Publication date: May 15, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Satoshi SANO, Ichirou NAGATA, Tomonori ISHINO, Kentaro SHIRATSUCHI, Shigehide ITOU, Kenichi ISHIZUKA, Takeshi UMEHARA
  • Publication number: 20140130667
    Abstract: A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin is formed by a polyimide compound being crosslinked by a radically crosslinkable functional group thereof, and a ratio [?] of a crosslinked site to an imide group of the polyimide compound (the number of crosslinked sites/the number of imide groups) in the crosslinked polyimide resin is 0.0001 or more and 0.45 or less; a method of producing the same; and a gas separating module, a gas separation apparatus and a gas separation method using the same.
    Type: Application
    Filed: January 17, 2014
    Publication date: May 15, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Satoshi SANO, Ichirou NAGATA, Tomonori ISHINO, Kentaro SHIRATSUCHI, Shigehide ITOU, Kenichi ISHIZUKA, Takeshi UMEHARA
  • Publication number: 20130000724
    Abstract: Provided is a gas barrier film produced by according to a roll-to-roll process which is excellent in gas barrier performance. The gas barrier film is produced by providing, as a topmost layer on a second surface of the substrate film, a low-hardness layer having a pencil hardness lower by two or more grades than the pencil hardness of the organic layer; and providing the organic layer on the first surface of the substrate film.
    Type: Application
    Filed: March 22, 2011
    Publication date: January 3, 2013
    Applicant: FUJIFILM CORPORATION
    Inventor: Shigehide Itou
  • Patent number: 8283020
    Abstract: A laminate film having excellent barrier property is provided. The laminate film comprises a substrate film, an organic layer and an inorganic layer in that order, wherein the organic layer has a thickness of 300 nm to 2000 nm, the inorganic layer comprises silicon oxide represented by SiOx, wherein x is in a range from 0.9 to 1.5, and the organic layer has a surface satisfying Ra (100 ?m square)<50 nm, Ra (10 ?m square)<2 nm, and 75 nm<Rz (100 ?m square)<300 nm.
    Type: Grant
    Filed: August 24, 2010
    Date of Patent: October 9, 2012
    Assignee: Fujifilm Corporation
    Inventor: Shigehide Itou
  • Publication number: 20110052868
    Abstract: A laminate film having excellent barrier property is provided. The laminate film comprises a substrate film, an organic layer and an inorganic layer in that order, wherein the organic layer has a thickness of 300 nm to 2000 nm, the inorganic layer comprises silicon oxide represented by SiOx, wherein x is in a range from 0.9 to 1.5, and the organic layer has a surface satisfying Ra (100 ?m square)<50 nm, Ra (10 ?m square)<2 nm, and 75 nm<Rz (100 ?m square)<300 nm.
    Type: Application
    Filed: August 24, 2010
    Publication date: March 3, 2011
    Inventor: Shigehide Itou