Patents by Inventor Shigehiro Nagura
Shigehiro Nagura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6274286Abstract: A chemically amplified positive resist composition comprising at least one basic compound of the following general formula (1) or (2): wherein R1, R2, R3, R7, and R8 are independently normal, branched or cyclic alkylene groups having 1 to 20 carbon atoms, R4, R5, R6, R9, and R10 are independently hydrogen, alkyl groups having 1 to 20 carbon atoms or amino groups, R4 and R5, R5 and R6, R4 and R6, or R8, R5 and R5, and R9 and R10, taken together, may form a ring, letters k, m and n are integers of 0 to 20, with the proviso that hydrogen is excluded from R4, R5, R6, R9 and R10 when k, m or n is equal to 0. The resist compositions of the present invention are effective for preventing resist films from thinning and for increasing the focus margin of an isolated pattern.Type: GrantFiled: June 26, 1998Date of Patent: August 14, 2001Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Tsunehiro Nishi, Takeshi Nagata, Shigehiro Nagura
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Patent number: 6194564Abstract: A process for saline-solution soluble xanthan gum which comprises the steps of precipitating xanthan gum by mixing, with stirring, an aqueous solution of xanthan gum with an organic solvent which is a non-solvent to xanthan gum but is hydrophilic, removing liquid from the precipitated xanthan gum to a liquid content of at most 50%, disintegrating the cake of xanthan gum after the liquid removal to an average grain size of from 0.3 to 2 cm in diameter, and drying the disintegrated xanthan gum by fluidizing the same at a temperature not exceeding 80° C.Type: GrantFiled: August 19, 1998Date of Patent: February 27, 2001Assignees: Shin-Etsu Chemical Co., Ltd., Shin-Etsu Bio, Inc.Inventors: Kanji Murofushi, Shigehiro Nagura
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Patent number: 6156477Abstract: A polymer comprising recurring units of formula (1) is provided wherein some hydrogen atoms of phenolic hydroxyl groups and/or carboxyl groups are replaced by acid labile groups. The polymer is crosslinked with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or carboxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and carboxyl group. The polymer has Mw of 1,000-500,000. R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, R.sup.3 is H, R.sup.4 is --COOR.sup.5, C.sub.1 -C.sub.5 alkyl or phenyl, or R.sup.3 and R.sup.4, taken together, may form --COOCO--, R.sup.5 is H or C.sub.1 -C.sub.8 alkyl, x and y are integers satisfying x+y.ltoreq.5, p and q are positive numbers satisfying p+q=1 and 0<q/(p+q).ltoreq.0.9.Type: GrantFiled: January 26, 1998Date of Patent: December 5, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Kiyoshi Motomi, Osamu Watanabe, Satoshi Watanabe, Shigehiro Nagura, Toshinobu Ishihara
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Patent number: 6117621Abstract: A method for patterning a chemically amplified positive resist material comprising a base polymer having acid labile groups which are eliminated by acid, a photoacid generator and an organic solvent, in which the resist material is applied onto a substrate to a uniform thickness so as to form a resist film that is subsequently exposed, baked, then developed with a developer to form a positive pattern is characterized by using as the base polymer a mixture of at least two base polymers having mutually differing acid labile groups or a base polymer having at least two mutually differing acid labile groups on the same molecule and adjusting the types of the mutually differing acid labile groups and their contents within the base polymer such that, when the chemically amplified positive resist material is applied onto a substrate to a uniform thickness so as to form a resist film that is subsequently exposed, baked, then dissolved with a developer, the exposure E1 which results in an average dissolution rate of 1Type: GrantFiled: March 26, 1998Date of Patent: September 12, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Shigehiro Nagura
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Patent number: 6114462Abstract: A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .tbd.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.Type: GrantFiled: April 30, 1999Date of Patent: September 5, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Satoshi Watanabe, Osamu Watanabe, Tomoyoshi Furihata, Yoshihumi Takeda, Shigehiro Nagura, Toshinobu Ishihara, Tsuguo Yamaoka
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Patent number: 6110731Abstract: A fermenter for the production of xanthan gum is provided with an upper helical impeller and a lower turbine impeller which are positioned therewithin, and an agitator shaft for driving these helical impeller and turbine impeller. The helical impeller consists of a pair of vertically spaced arms extending from the agitator shaft in opposite directions and arranged in twisted relationship, and at least one shearing paddle bridging these arms, and the turbine impeller consists of a rotating disc having at least one turbine blade attached thereto.Type: GrantFiled: December 7, 1998Date of Patent: August 29, 2000Assignees: Shin-Etsu Chemical Co., Ltd., Shin-Etsu Bio, Inc.Inventors: Kanji Murofushi, Shigehiro Nagura, Taira Homma
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Patent number: 6106993Abstract: A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin, (C) a photoacid generator, and optionally, (D) a dissolution rate regulator. The base resin (B) is a hydroxystyrene copolymer having different acid labile groups and Mw of 3,000-300,000. The resist composition is highly sensitive to actinic radiation such as deep-UV, electron beam and X-ray, can be developed with aqueous base to form a pattern, and is thus suitable for use in a fine patterning technique.Type: GrantFiled: July 13, 1998Date of Patent: August 22, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Satoshi Watanabe, Osamu Watanabe, Shigehiro Nagura, Toshinobu Ishihara
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Patent number: 6048661Abstract: Provided are polymeric compounds which, when used as base resins in resist materials, can yield chemical resist materials having high sensitivity, high resolution, a high exposure latitude, and good process adaptability, exhibiting excellent resistance to plasma etching, and giving resist patterns having high thermal resistance, as well as chemically amplified positive type resist materials using such polymeric compounds as base resins. These chemically amplified positive type resist materials use a base resin comprising a polymeric compound having a weight-average molecular weight of 1,000 to 500,000 and having one or more hydroxyl and/or carboxyl groups in the molecule, part or all of the hydrogen atoms of the hydroxyl and/or carboxyl groups being replaced by groups of the following general formula ##STR1## and additionally contain an acid generator, a dissolution inhibitor, a basic compound, and an aromatic compound having a group of the formula .tbd.C--COOH.Type: GrantFiled: March 2, 1998Date of Patent: April 11, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tsunehiro Nishi, Jun Hatakeyama, Shigehiro Nagura, Toshinobu Ishihara
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Patent number: 6033828Abstract: A polymer comprising recurring units of formula (1) is provided wherein some of the hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups are replaced by acid labile groups. The polymer is crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or alcoholic hydroxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and alcoholic hydroxyl group. The polymer has Mw of 1,000-500,000. ##STR1## R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, letter x is 0 or a positive integer, y is a positive integer, x+y.ltoreq.5, letters p and q are positive numbers satisfying p+q=1 and 0<q/(p+1).ltoreq.0.9.Type: GrantFiled: January 26, 1998Date of Patent: March 7, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Junji Shimada, Osamu Watanabe, Satoshi Watanabe, Shigehiro Nagura, Toshinobu Ishihara
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Patent number: 6030746Abstract: Di- or triphenyl monoterpene hydrocarbon derivatives of formula (1) are novel. ##STR1## X is a di- or trivalent monoterpene hydrocarbon group, R.sup.1 to R.sup.3 are hydrogen or an alkyl, alkoxy, alkoxyalkyl, alkenyl or aryl group, R.sup.4 is hydrogen or an acid labile group, at least one R.sup.4 being an acid labile group, letter n is an integer of 1-5, j, k and m are integers of 0-4, n+j+k+m=5, and p is 2 or 3. When used as a dissolution rate regulator, the compound of formula (1) exerts remarkably enhanced dissolution inhibitory effect and minimized light absorption in the deep-UV region. A chemically amplified positive resist composition having the compound of formula (1) blended therein is highly sensitive to actinic radiation such as deep-UV radiation, electron beam and X-ray, especially KrF excimer laser light, and has improved sensitivity, resolution and plasma etching resistance.Type: GrantFiled: April 1, 1997Date of Patent: February 29, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takeshi Nagata, Satoshi Watanabe, Tsunehiro Nishi, Jun Hatakeyama, Shigehiro Nagura, Toshinobu Ishihara
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Patent number: 6027854Abstract: A polymer comprising recurring units of formula (1) is provided wherein some hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups and/or carboxyl groups are replaced by acid labile groups. The polymer is crosslinked with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining alcoholic hydroxyl groups and/or carboxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group, alcoholic hydroxyl group and carboxyl group. The polymer has Mw of 1,000-500,000. ##STR1## R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, R.sup.3 is a divalent C.sub.1 -C.sub.18 hydrocarbon group which may have a hetero atom, R.sup.4 and R.sup.5 are H or monovalent C.sub.1 -C.sub.18 hydrocarbon groups which may have a hetero atom, x and y are integers satisfying x+y.ltoreq.Type: GrantFiled: February 27, 1998Date of Patent: February 22, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tsunehiro Nishi, Osamu Watanabe, Satoshi Watanabe, Shigehiro Nagura, Toshinobu Ishihara
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Patent number: 5994107Abstract: Xanthan gum is purified by heat-treating a xanthan gum fermented broth, and consecutively treating the broth first with alkaline protease and then with lysozyme or in reverse order, and thereafter recovering xanthan gum from the treated broth. A clear aqueous solution of xanthan gum may be obtained without complex procedures. The xanthan gum is separated and purified and 0.3% aqueous solution of the purified xanthan gum has a transmittance of at least 80%.Type: GrantFiled: December 31, 1997Date of Patent: November 30, 1999Assignees: Shin-Etsu Chemical Co., Ltd., Shin-Etsu Bio, Inc.Inventors: Kanji Murofushi, Taira Homma, Shigehiro Nagura, Richard Armentrout
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Patent number: 5985512Abstract: A chemically amplified positive resist composition is prepared by blending (A) an organic solvent, (B) a base resin, and (C) a photoacid generator with a mixture of (1) a nitrogenous organic compound having pKa.gtoreq.7 and a vapor pressure of less than 2 Torr at 100.degree. C. and (2) a nitrogenous organic compound having pKa.gtoreq.7 and a vapor pressure of 2-100 Torr at 100.degree. C. The resist composition has high sensitivity to actinic radiation and high resolution, is developable with aqueous base to form a pattern without a T-top profile by PED and footing on the substrate surface, and is suitable for fine processing.Type: GrantFiled: April 1, 1997Date of Patent: November 16, 1999Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Shigehiro Nagura, Toshinobu Ishihara
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Patent number: 5972560Abstract: The invention provides a high molecular weight silicone compound comprising recurring units of the general formula (1) and having a weight average molecular weight of 1,000-50,000. ##STR1## Z is a di- to hexavalent, monocyclic or polycyclic hydrocarbon group or bridged cyclic hydrocarbon group of 5-12 carbon atoms, R.sup.1 is a substituted or unsubstituted alkyl or alkenyl group of 1-8 carbon atoms, R.sup.2 is an acid labile group, m is 0 or an integer, n is an integer, satisfying m+n.ltoreq.5, x is an integer, p1 and p2 are positive numbers, q is 0 or a positive number, satisfying 0<p1/(p1+p2+q).ltoreq.0.9, 0<p2/(p1+p2+q).ltoreq.0.9, 0.ltoreq.q/(p1+p2+q).ltoreq.0.7, and p1+p2+q=1. A chemically amplified positive resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for fine patterning with electron beams or deep UV.Type: GrantFiled: January 30, 1998Date of Patent: October 26, 1999Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Ichiro Kaneko, Mutsuo Nakashima, Toshinobu Ishihara, Junji Tsuchiya, Jun Hatakeyama, Shigehiro Nagura
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Patent number: 5972559Abstract: A chemically amplified positive resist composition is prepared by blending (A) an organic solvent, (B) a base resin in the form of a polyhydroxystyrene having some hydroxyl groups replaced by acid labile groups and a Mw of 3,000-300,000, (C) a photoacid generator, and (D) an aromatic compound having a group: --R.sup.13 --COOH in a molecule. The resist composition is sensitive to actinic radiation, especially KrF excimer laser and X-ray, has high sensitivity, resolution, and plasma etching resistance, and is effective for improving the footing and PED on nitride substrates.Type: GrantFiled: June 27, 1997Date of Patent: October 26, 1999Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Satoshi Watanabe, Katsuya Takemura, Shigehiro Nagura
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Patent number: 5972695Abstract: A fermenter for the production of xanthan gum is provided with an upper helical impeller and a lower turbine impeller which are positioned therewithin, and an agitator shaft for driving these helical impeller and turbine impeller. The helical impeller consists of a pair of vertically spaced arms extending from the agitator shaft in opposite directions and arranged in twisted relationship, and at least one shearing paddle bridging these arms, and the turbine impeller consists of a rotating disc having at least one turbine blade attached thereto.Type: GrantFiled: October 14, 1997Date of Patent: October 26, 1999Assignees: Shin-Etsu Chemical Co., Ltd., Shin-Etsu Bio, IncInventors: Kanji Murofushi, Shigehiro Nagura, Taira Homma
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Patent number: 5942367Abstract: A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .tbd.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.Type: GrantFiled: April 23, 1997Date of Patent: August 24, 1999Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Satoshi Watanabe, Osamu Watanabe, Tomoyoshi Furihata, Yoshihumi Takeda, Shigehiro Nagura, Toshinobu Ishihara, Tsuguo Yamaoka
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Patent number: 5882844Abstract: A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polysiloxane having phenolic hydroxyl groups some of which are protected with alkoxyalkyl groups and having a weight average molecular weight of 2,000-50,000, (C) a photoacid generator, and (D) a vinyl ether group-containing compound. The composition has high sensitivity to actinic radiation, is developable with aqueous base to form a resist pattern, and lends itself to fine patterning.Type: GrantFiled: April 1, 1997Date of Patent: March 16, 1999Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Junji Tsuchiya, Toshinobu Ishihara, Shigehiro Nagura, Katsuya Takemura, Tsuguo Yamaoka
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Patent number: 5880169Abstract: The invention provides a novel sulfonium salt having at least one acid labile group attached to a phenyl group in a molecule and a normal, branched or cyclic C.sub.1 -C.sub.20 alkylsulfonate anion. The novel sulfonium salt is effective for increasing the dissolution contrast between exposed and unexposed areas. Upon exposure, it generates an alkylsulfonic acid which is a weak acid, minimizing the influence of side reaction and deactivation during PEB step. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.Type: GrantFiled: November 1, 1996Date of Patent: March 9, 1999Assignees: Shin-Etsu Chemical Co., Ltd., Nippon Telegraph and Telephone Corp.Inventors: Yoichi Osawa, Satoshi Watanabe, Katsuya Takemura, Shigehiro Nagura, Akinobu Tanaka, Yoshio Kawai
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Patent number: 5876900Abstract: A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polyhydroxystyrene having phenolic hydroxyl groups some of which are protected with alkoxyalkyl groups and having a weight-average molecular weight of 3,000-300,000 and a dispersity of 1.0 to 1.5, (C) a photoacid generator, and (D) a vinyl ether group-containing compound. The composition is sensitive to actinic radiation, especially KrF excimer laser beam, has high sensitivity and resolution, and forms a resist pattern having improved plasma etching resistance and heat resistance.Type: GrantFiled: April 1, 1997Date of Patent: March 2, 1999Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Satoshi Watanabe, Toshinobu Ishihara, Shigehiro Nagura, Tsuguo Yamaoka