Patents by Inventor Shigehisa Nozawa

Shigehisa Nozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8625089
    Abstract: A foreign-matter inspection apparatus is implemented which allows the stable detection sensitivity to be maintained. A laser beam emitted from a laser apparatus is applied to a beam irradiation sample via an irradiation unit and a mirror. Then, the laser beam is captured into a beam-capturing camera via an image-forming lens and a beam-direction switching mirror. Based on the captured beam image, an image computational processing unit judges inclination of the laser beam, then adjusting the irradiation unit thereby to correct the inclination of the laser beam. Also, the beam is captured into the beam-capturing camera in specified number-of-times while focus of the laser beam is being changed by an arbitrary amount by the irradiation unit. Based on the captured beam, the focus of the laser beam is corrected by adjusting the irradiation unit.
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: January 7, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshio Bamba, Masayuki Ochi, Shigehisa Nozawa
  • Patent number: 8314930
    Abstract: An inspection device for inspecting defects of an inspection object including a light source for irradiating a luminous flux to the inspection object; an optical system for guiding reflected light from the inspection object; a photoelectric image sensor having a plurality of photoelectric cells arranged, for converting the light guided to detection signals; a detection signal transfer unit having channels each constituted by a signal correction unit, a converter and an image formation unit, and corresponding to each of a plurality of regions formed by dividing the photoelectric image sensor, respectively; and an image synthesis unit for forming an image of the surface of the object by synthesizing partial images outputted; the inspection device inspecting defects of the object by processing the synthesized image; whereby it becomes possible to correct a detection signal from said photoelectric cell close to a predetermined reference target value.
    Type: Grant
    Filed: November 8, 2010
    Date of Patent: November 20, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Koichi Taniguchi, Masayuki Ochi, Shuichi Chikamatsu, Shigehisa Nozawa
  • Publication number: 20110075136
    Abstract: A foreign-matter inspection apparatus is implemented which allows the stable detection sensitivity to be maintained. A laser beam emitted from a laser apparatus is applied to a beam irradiation sample via an irradiation unit and a mirror. Then, the laser beam is captured into a beam-capturing camera via an image-forming lens and a beam-direction switching mirror. Based on the captured beam image, an image computational processing unit judges inclination of the laser beam, then adjusting the irradiation unit thereby to correct the inclination of the laser beam. Also, the beam is captured into the beam-capturing camera in specified number-of-times while focus of the laser beam is being changed by an arbitrary amount by the irradiation unit. Based on the captured beam, the focus of the laser beam is corrected by adjusting the irradiation unit.
    Type: Application
    Filed: December 10, 2010
    Publication date: March 31, 2011
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yoshio Bamba, Masayuki Ochi, Shigehisa Nozawa
  • Publication number: 20110051131
    Abstract: An inspection device for inspecting defects of an inspection object including a light source for irradiating a luminous flux to the inspection object; an optical system for guiding reflected light from the inspection object; a photoelectric image sensor having a plurality of photoelectric cells arranged, for converting the light guided to detection signals; a detection signal transfer unit having channels each constituted by a signal correction unit, a converter and an image formation unit, and corresponding to each of a plurality of regions formed by dividing the photoelectric image sensor, respectively; and an image synthesis unit for forming an image of the surface of the object by synthesizing partial images outputted; the inspection device inspecting defects of the object by processing the synthesized image; whereby it becomes possible to correct a detection signal from said photoelectric cell close to a predetermined reference target value.
    Type: Application
    Filed: November 8, 2010
    Publication date: March 3, 2011
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Koichi TANIGUCHI, Masayuki Ochi, Shuichi Chikamatsu, Shigehisa Nozawa
  • Patent number: 7876431
    Abstract: A foreign-matter inspection apparatus is implemented which allows the stable detection sensitivity to be maintained. A laser beam emitted from a laser apparatus is applied to a beam irradiation sample via an irradiation unit and a mirror. Then, the laser beam is captured into a beam-capturing camera via an image-forming lens and a beam-direction switching mirror. Based on the captured beam image, an image computational processing unit judges inclination of the laser beam, then adjusting the irradiation unit thereby to correct the inclination of the laser beam. Also, the beam is captured into the beam-capturing camera in specified number-of-times while focus of the laser beam is being changed by an arbitrary amount by the irradiation unit. Based on the captured beam, the focus of the laser beam is corrected by adjusting the irradiation unit.
    Type: Grant
    Filed: August 19, 2009
    Date of Patent: January 25, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshio Bamba, Masayuki Ochi, Shigehisa Nozawa
  • Patent number: 7847928
    Abstract: An inspection device for inspecting defects of an inspection object including a light source for irradiating a luminous flux to the inspection object; an optical system for guiding reflected light from the inspection object; a photoelectric image sensor having a plurality of photoelectric cells arranged, for converting the light guided to detection signals; a detection signal transfer unit having channels each constituted by a signal correction unit, a converter and an image formation unit, and corresponding to each of a plurality of regions formed by dividing the photoelectric image sensor, respectively; and an image synthesis unit for forming an image of the surface of the object by synthesizing partial images outputted; the inspection device inspecting defects of the object by processing the synthesized image; whereby it becomes possible to correct a detection signal from said photoelectric cell close to a predetermined reference target value.
    Type: Grant
    Filed: May 30, 2008
    Date of Patent: December 7, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Koichi Taniguchi, Masayuki Ochi, Shuichi Chikamatsu, Shigehisa Nozawa
  • Publication number: 20090303470
    Abstract: A foreign-matter inspection apparatus is implemented which allows the stable detection sensitivity to be maintained. A laser beam emitted from a laser apparatus is applied to a beam irradiation sample via an irradiation unit and a mirror. Then, the laser beam is captured into a beam-capturing camera via an image-forming lens and a beam-direction switching mirror. Based on the captured beam image, an image computational processing unit judges inclination of the laser beam, then adjusting the irradiation unit thereby to correct the inclination of the laser beam. Also, the beam is captured into the beam-capturing camera in specified number-of-times while focus of the laser beam is being changed by an arbitrary amount by the irradiation unit. Based on the captured beam, the focus of the laser beam is corrected by adjusting the irradiation unit.
    Type: Application
    Filed: August 19, 2009
    Publication date: December 10, 2009
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Yoshio BAMBA, Masayuki Ochi, Shigehisa Nozawa
  • Patent number: 7589833
    Abstract: A foreign-matter inspection apparatus is implemented which allows the stable detection sensitivity to be maintained. A laser beam emitted from a laser apparatus is applied to a beam irradiation sample via an irradiation unit and a mirror. Then, the laser beam is captured into a beam-capturing camera via an image-forming lens and a beam-direction switching mirror. Based on the captured beam image, an image computational processing unit judges inclination of the laser beam, then adjusting the irradiation unit thereby to correct the inclination of the laser beam. Also, the beam is captured into the beam-capturing camera in specified number-of-times while focus of the laser beam is being changed by an arbitrary amount by the irradiation unit. Based on the captured beam, the focus of the laser beam is corrected by adjusting the irradiation unit.
    Type: Grant
    Filed: October 12, 2007
    Date of Patent: September 15, 2009
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshio Bamba, Masayuki Ochi, Shigehisa Nozawa
  • Publication number: 20080297779
    Abstract: An inspection device for inspecting defects of an inspection object including a light source for irradiating a luminous flux to the inspection object; an optical system for guiding reflected light from the inspection object; a photoelectric image sensor having a plurality of photoelectric cells arranged, for converting the light guided to detection signals; a detection signal transfer unit having channels each constituted by a signal correction unit, a converter and an image formation unit, and corresponding to each of a plurality of regions formed by dividing the photoelectric image sensor, respectively; and an image synthesis unit for forming an image of the surface of the object by synthesizing partial images outputted; the inspection device inspecting defects of the object by processing the synthesized image; whereby it becomes possible to correct a detection signal from said photoelectric cell close to a predetermined reference target value.
    Type: Application
    Filed: May 30, 2008
    Publication date: December 4, 2008
    Inventors: Koichi TANIGUCHI, Masayuki OCHI, Shuichi CHIKAMATSU, Shigehisa NOZAWA
  • Publication number: 20080088848
    Abstract: A foreign-matter inspection apparatus is implemented which allows the stable detection sensitivity to be maintained. A laser beam emitted from a laser apparatus is applied to a beam irradiation sample via an irradiation unit and a mirror. Then, the laser beam is captured into a beam-capturing camera via an image-forming lens and a beam-direction switching mirror. Based on the captured beam image, an image computational processing unit judges inclination of the laser beam, then adjusting the irradiation unit thereby to correct the inclination of the laser beam. Also, the beam is captured into the beam-capturing camera in specified number-of-times while focus of the laser beam is being changed by an arbitrary amount by the irradiation unit. Based on the captured beam, the focus of the laser beam is corrected by adjusting the irradiation unit.
    Type: Application
    Filed: October 12, 2007
    Publication date: April 17, 2008
    Inventors: Yoshio BAMBA, Masayuki OCHI, Shigehisa NOZAWA