Patents by Inventor Shigehisa Tamura

Shigehisa Tamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10924048
    Abstract: An inverter control device including at least first and second inverters includes: a current detector that detects a current flowing through a main circuit of the first inverter; a current controller that generates a voltage command value of the first inverter on the basis of a detected current and a current command; and a voltage command predictor that generates a voltage command value of the second inverter on the basis of a variation of the voltage command value of the first inverter.
    Type: Grant
    Filed: November 22, 2016
    Date of Patent: February 16, 2021
    Assignee: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Hiroshi Tamura, Hiroshi Aoyagi, Tomishige Yatsugi, Shigehisa Aoyagi
  • Patent number: 10784075
    Abstract: An apparatus provided with a wafer processing chamber that houses a wafer supporting mechanism supporting a wafer and is used to irradiate the wafer supported by the wafer supporting mechanism with an ion beam and a transport mechanism housing chamber that houses a transport mechanism provided underneath the wafer processing chamber and used for moving the wafer supporting mechanism in a substantially horizontal direction, wherein an aperture used for moving the wafer supporting mechanism along with a coupling member coupling the wafer supporting mechanism to the transport mechanism is formed in the direction of movement of the transport mechanism in a partition wall separating the wafer processing chamber from the transport mechanism housing chamber.
    Type: Grant
    Filed: October 16, 2019
    Date of Patent: September 22, 2020
    Assignee: NISSIN ION EQUIPMENT CO., LTD.
    Inventors: Shinya Hisada, Kohei Tanaka, Shigehisa Tamura, Makoto Nakaya
  • Publication number: 20200280278
    Abstract: An inverter control device including at least first and second inverters includes: a current detector that detects a current flowing through a main circuit of the first inverter; a current controller that generates a voltage command value of the first inverter on the basis of a detected current and a current command; and a voltage command predictor that generates a voltage command value of the second inverter on the basis of a variation of the voltage command value of the first inverter.
    Type: Application
    Filed: November 22, 2016
    Publication date: September 3, 2020
    Applicant: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Hiroshi TAMURA, Hiroshi AOYAGI, Tomishige YATSUGI, Shigehisa AOYAGI
  • Publication number: 20200051776
    Abstract: An apparatus provided with a wafer processing chamber that houses a wafer supporting mechanism supporting a wafer and is used to irradiate the wafer supported by the wafer supporting mechanism with an ion beam and a transport mechanism housing chamber that houses a transport mechanism provided underneath the wafer processing chamber and used for moving the wafer supporting mechanism in a substantially horizontal direction, wherein an aperture used for moving the wafer supporting mechanism along with a coupling member coupling the wafer supporting mechanism to the transport mechanism is formed in the direction of movement of the transport mechanism in a partition wall separating the wafer processing chamber from the transport mechanism housing chamber.
    Type: Application
    Filed: October 16, 2019
    Publication date: February 13, 2020
    Inventors: Shinya HISADA, Kohei TANAKA, Shigehisa TAMURA, Makoto NAKAYA
  • Publication number: 20170236686
    Abstract: An apparatus provided with a wafer processing chamber that houses a wafer supporting mechanism supporting a wafer and is used to irradiate the wafer supported by the wafer supporting mechanism with an ion beam and a transport mechanism housing chamber that houses a transport mechanism provided underneath the wafer processing chamber and used for moving the wafer supporting mechanism in a substantially horizontal direction, wherein an aperture used for moving the wafer supporting mechanism along with a coupling member coupling the wafer supporting mechanism to the transport mechanism is formed in the direction of movement of the transport mechanism in a partition wall separating the wafer processing chamber from the transport mechanism housing chamber.
    Type: Application
    Filed: May 3, 2017
    Publication date: August 17, 2017
    Inventors: Shinya HISADA, Kohei TANAKA, Shigehisa TAMURA, Makoto NAKAYA
  • Publication number: 20140238300
    Abstract: An apparatus provided with a wafer processing chamber that houses a wafer supporting mechanism supporting a wafer and is used to irradiate the wafer supported by the wafer supporting mechanism with an ion beam and a transport mechanism housing chamber that houses a transport mechanism provided underneath the wafer processing chamber and used for moving the wafer supporting mechanism in a substantially horizontal direction, wherein an aperture used for moving the wafer supporting mechanism along with a coupling member coupling the wafer supporting mechanism to the transport mechanism is formed in the direction of movement of the transport mechanism in a partition wall separating the wafer processing chamber from the transport mechanism housing chamber.
    Type: Application
    Filed: October 30, 2013
    Publication date: August 28, 2014
    Applicant: NISSIN ION EQUIPMENT CO., LTD
    Inventors: Shinya HISADA, Kohei TANAKA, Shigehisa TAMURA, Makoto NAKAYA
  • Publication number: 20090283703
    Abstract: A beam profile monitor is disposed on an orbit of an ion beam, and measures a beam intensity distribution of the ion beam. A pair of beam blocking members are opposed to each other across the ion beam in the x direction, and forms an opening through which the ion beam passes: At least one of the beam blocking members includes a plurality of movable blocking plates disposed without forming a gap in the y direction, and in an independently reciprocable manner in the x direction. A minute opening is formed between the beam blocking members opposed to each other by adjusting the positions of the beam blocking members. From a result of the intensity distribution measurement which is performed by said beam profile monitor on the ion beam passed through the minute opening, the emittance of the ion beam is calculated.
    Type: Application
    Filed: May 19, 2009
    Publication date: November 19, 2009
    Applicant: NISSIN ION EQUIPMENT CO., LTD.
    Inventor: Shigehisa Tamura