Patents by Inventor Shigekazu Kato

Shigekazu Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7367135
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: August 16, 2005
    Date of Patent: May 6, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Publication number: 20060275187
    Abstract: The present invention provides an ultraviolet-responsive thin film photocatalyst and an application thereof. The present invention relates to a transparent thin film titanium dioxide photocatalyst wherein the crystal size of the titanium dioxide catalyst forming the thin film is 5 nm to 50 nm, the adsorption wavelength peak is in the range of 200 nm to 300 nm and the film thickness is 0.1 to 1.0 microns, to the aforementioned photocatalyst wherein the crystal form of the titanium dioxide forming the thin film is a mixed state of spindle-shaped crystals and cubic crystals, to a filter wherein inorganic paper having silicon carbide (SiC) or amorphous silica (SiO2) as a principal component or inorganic paper having activated charcoal, zeolite or sepiolite as a principal component is used as the substrate, and to an air sterile filtration device in which the aforementioned filter and a bactericidal ultraviolet lamp are combined.
    Type: Application
    Filed: April 2, 2004
    Publication date: December 7, 2006
    Applicant: PHOTO-CATALYTIC MATERIALS INC.
    Inventors: Hiroshi Taoda, Shigekazu Kato
  • Patent number: 7089680
    Abstract: A vacuum processing apparatus which includes a means for transferring substrates from a loader, with a transferring device, to a double lock chamber; and, then to a selected vacuum processing chamber. The substrates are returned to a substrate, by the vacuum loader, into their original position in the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.
    Type: Grant
    Filed: January 23, 2001
    Date of Patent: August 15, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: 7052151
    Abstract: Light source devices for photography using LED elements as a light source known in the prior art provide insufficient quantity of light, and the inability to avoid size increases in order to generate a sufficient quantity of light has been problematic. A photography light source device 1 according to the present invention has a light source comprising a plurality of LED elements 2 generating white light or light of the three primaries and arranged in one or more rows parallel with the direction of the longer side of the photograph, a case 3 having a lens on which linear fresnel cuts 3a have been applied in a linear direction parallel to the arrangement direction is mounted on the LED element 2, and upon lighting of the LED element 2, drive is performed with a current of between 3 and 50 times the magnitude of the rated current thereof and a lighting duration of between 10 and 600 msec.
    Type: Grant
    Filed: September 16, 2003
    Date of Patent: May 30, 2006
    Assignee: Stanley Electric Co., Ltd
    Inventors: Toshiyuki Terada, Keizo Sekido, Shigekazu Kato, Kimihiro Iritono
  • Publication number: 20060032073
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Application
    Filed: August 16, 2005
    Publication date: February 16, 2006
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: 6968630
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: March 10, 2004
    Date of Patent: November 29, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: 6904699
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: March 10, 2004
    Date of Patent: June 14, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: 6886272
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: May 3, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: 6880264
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: April 19, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Publication number: 20040196643
    Abstract: Light source devices for photography using LED elements as a light source known in the prior art provide insufficient quantity of light, and the inability to avoid size increases in order to generate a sufficient quantity of light has been problematic. A photography light source device 1 according to the present invention has a light source comprising a plurality of LED elements 2 generating white light or light of the three primaries and arranged in one or more rows parallel with the direction of the longer side of the photograph, a case 3 having a lens on which linear fresnel cuts 3a have been applied in a linear direction parallel to the arrangement direction is mounted on the LED element 2, and upon lighting of the LED element 2, drive is performed with a current of between 3 and 50 times the magnitude of the rated current thereof and a lighting duration of between 10 and 600 msec.
    Type: Application
    Filed: September 16, 2003
    Publication date: October 7, 2004
    Inventors: Toshiyuki Terada, Keizo Sekido, Shigekazu Kato, Kimihiro Iritono
  • Publication number: 20040187337
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Application
    Filed: March 10, 2004
    Publication date: September 30, 2004
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Publication number: 20040187338
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Application
    Filed: March 10, 2004
    Publication date: September 30, 2004
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Publication number: 20040074104
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed.
    Type: Application
    Filed: October 14, 2003
    Publication date: April 22, 2004
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Publication number: 20040074103
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Application
    Filed: October 14, 2003
    Publication date: April 22, 2004
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: 6662465
    Abstract: A vacuum processing apparatus which includes a conveyor structure for transferring a substrate from a substrate storage device held on a substrate storage device mount table. The apparatus further includes a vacuum loader provided with an additional conveyor structure and a vacuum processing chamber for sequentially loading substrate to be processed. The conveyor structures are each provided with a robot.
    Type: Grant
    Filed: February 13, 2001
    Date of Patent: December 16, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: RE39756
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: February 1, 2002
    Date of Patent: August 7, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: RE39775
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: September 24, 2002
    Date of Patent: August 21, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsuenhiko Tsubone, Atsushi Itou
  • Patent number: RE39776
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: February 5, 2002
    Date of Patent: August 21, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: RE39823
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dirty-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: February 1, 2002
    Date of Patent: September 11, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
  • Patent number: RE39824
    Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chamber are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.
    Type: Grant
    Filed: September 23, 2002
    Date of Patent: September 11, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Shigekazu Kato, Kouji Nishihata, Tsuenhiko Tsubone, Atsushi Itou