Patents by Inventor Shigekazu Kato
Shigekazu Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7367135Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: August 16, 2005Date of Patent: May 6, 2008Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20060275187Abstract: The present invention provides an ultraviolet-responsive thin film photocatalyst and an application thereof. The present invention relates to a transparent thin film titanium dioxide photocatalyst wherein the crystal size of the titanium dioxide catalyst forming the thin film is 5 nm to 50 nm, the adsorption wavelength peak is in the range of 200 nm to 300 nm and the film thickness is 0.1 to 1.0 microns, to the aforementioned photocatalyst wherein the crystal form of the titanium dioxide forming the thin film is a mixed state of spindle-shaped crystals and cubic crystals, to a filter wherein inorganic paper having silicon carbide (SiC) or amorphous silica (SiO2) as a principal component or inorganic paper having activated charcoal, zeolite or sepiolite as a principal component is used as the substrate, and to an air sterile filtration device in which the aforementioned filter and a bactericidal ultraviolet lamp are combined.Type: ApplicationFiled: April 2, 2004Publication date: December 7, 2006Applicant: PHOTO-CATALYTIC MATERIALS INC.Inventors: Hiroshi Taoda, Shigekazu Kato
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Patent number: 7089680Abstract: A vacuum processing apparatus which includes a means for transferring substrates from a loader, with a transferring device, to a double lock chamber; and, then to a selected vacuum processing chamber. The substrates are returned to a substrate, by the vacuum loader, into their original position in the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.Type: GrantFiled: January 23, 2001Date of Patent: August 15, 2006Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 7052151Abstract: Light source devices for photography using LED elements as a light source known in the prior art provide insufficient quantity of light, and the inability to avoid size increases in order to generate a sufficient quantity of light has been problematic. A photography light source device 1 according to the present invention has a light source comprising a plurality of LED elements 2 generating white light or light of the three primaries and arranged in one or more rows parallel with the direction of the longer side of the photograph, a case 3 having a lens on which linear fresnel cuts 3a have been applied in a linear direction parallel to the arrangement direction is mounted on the LED element 2, and upon lighting of the LED element 2, drive is performed with a current of between 3 and 50 times the magnitude of the rated current thereof and a lighting duration of between 10 and 600 msec.Type: GrantFiled: September 16, 2003Date of Patent: May 30, 2006Assignee: Stanley Electric Co., LtdInventors: Toshiyuki Terada, Keizo Sekido, Shigekazu Kato, Kimihiro Iritono
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Publication number: 20060032073Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: ApplicationFiled: August 16, 2005Publication date: February 16, 2006Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6968630Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: March 10, 2004Date of Patent: November 29, 2005Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6904699Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: March 10, 2004Date of Patent: June 14, 2005Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6886272Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: October 14, 2003Date of Patent: May 3, 2005Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6880264Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: October 14, 2003Date of Patent: April 19, 2005Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20040196643Abstract: Light source devices for photography using LED elements as a light source known in the prior art provide insufficient quantity of light, and the inability to avoid size increases in order to generate a sufficient quantity of light has been problematic. A photography light source device 1 according to the present invention has a light source comprising a plurality of LED elements 2 generating white light or light of the three primaries and arranged in one or more rows parallel with the direction of the longer side of the photograph, a case 3 having a lens on which linear fresnel cuts 3a have been applied in a linear direction parallel to the arrangement direction is mounted on the LED element 2, and upon lighting of the LED element 2, drive is performed with a current of between 3 and 50 times the magnitude of the rated current thereof and a lighting duration of between 10 and 600 msec.Type: ApplicationFiled: September 16, 2003Publication date: October 7, 2004Inventors: Toshiyuki Terada, Keizo Sekido, Shigekazu Kato, Kimihiro Iritono
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Publication number: 20040187337Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: ApplicationFiled: March 10, 2004Publication date: September 30, 2004Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20040187338Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: ApplicationFiled: March 10, 2004Publication date: September 30, 2004Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20040074104Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed.Type: ApplicationFiled: October 14, 2003Publication date: April 22, 2004Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20040074103Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: ApplicationFiled: October 14, 2003Publication date: April 22, 2004Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6662465Abstract: A vacuum processing apparatus which includes a conveyor structure for transferring a substrate from a substrate storage device held on a substrate storage device mount table. The apparatus further includes a vacuum loader provided with an additional conveyor structure and a vacuum processing chamber for sequentially loading substrate to be processed. The conveyor structures are each provided with a robot.Type: GrantFiled: February 13, 2001Date of Patent: December 16, 2003Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: RE39756Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: February 1, 2002Date of Patent: August 7, 2007Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: RE39775Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: September 24, 2002Date of Patent: August 21, 2007Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsuenhiko Tsubone, Atsushi Itou
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Patent number: RE39776Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: February 5, 2002Date of Patent: August 21, 2007Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: RE39823Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dirty-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: February 1, 2002Date of Patent: September 11, 2007Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: RE39824Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chamber are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: September 23, 2002Date of Patent: September 11, 2007Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsuenhiko Tsubone, Atsushi Itou