Patents by Inventor Shigeki Amadatsu
Shigeki Amadatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10755898Abstract: A plasma generating device is an inductively coupled plasma generating device comprising an antenna coil that generates plasma in a vacuum chamber, a high-frequency power source that is connected to a reference potential to be referred for plasma potential and that applies high-frequency voltage to the antenna coil, and a resonance circuit provided between the antenna coil and the high-frequency power source. The resonance circuit comprises a first series reactance element that is connected in series to one end portion of the antenna coil and has at least a capacitance component and a second series reactance element that is connected in series to the other end portion of the antenna coil and has at least a capacitance component. The circuit configuration at one side and the circuit configuration at the other side are electrically symmetrical.Type: GrantFiled: September 18, 2019Date of Patent: August 25, 2020Assignee: DAIHEN CorporationInventors: Hayato Notomi, Shigeki Amadatsu, Eiji Tatebe
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Publication number: 20200105503Abstract: A plasma generating device is an inductively coupled plasma generating device comprising an antenna coil that generates plasma in a vacuum chamber, a high-frequency power source that is connected to a reference potential to be referred for plasma potential and that applies high-frequency voltage to the antenna coil, and a resonance circuit provided between the antenna coil and the high-frequency power source. The resonance circuit comprises a first series reactance element that is connected in series to one end portion of the antenna coil and has at least a capacitance component and a second series reactance element that is connected in series to the other end portion of the antenna coil and has at least a capacitance component. The circuit configuration at one side and the circuit configuration at the other side are electrically symmetrical.Type: ApplicationFiled: September 18, 2019Publication date: April 2, 2020Inventors: Hayato Notomi, Shigeki Amadatsu, Eiji Tatebe
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Patent number: 10306744Abstract: A plasma generation apparatus includes a chamber, a high-frequency power source, a magnetic field generator and a parallel capacitor. The chamber has an inner, toroidal-shaped electric discharge space. The high-frequency power source outputs a high-frequency current to the magnetic field generator, which generates a high-frequency magnetic field upon flowing of the high-frequency current therethrough. The parallel capacitor is connected in parallel to the magnetic field generator.Type: GrantFiled: September 20, 2017Date of Patent: May 28, 2019Assignee: DAIHEN CorporationInventors: Hayato Notomi, Shigeki Amadatsu, Eiji Tatebe, Michio Taniguchi
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Patent number: 10014162Abstract: An inductive-coupling plasma generation apparatus in which coupling can be made stronger and power can be used more effectively than in a conventional technique. The inductive-coupling plasma generation apparatus includes an electroconductive chamber with a toroidal-shaped electrical discharge space formed inside. The plasma generation apparatus also includes a high-frequency power source connected to the chamber. The power source is configured to cause a high-frequency current to flow through electroconductive material forming the chamber along a toroidal direction.Type: GrantFiled: August 25, 2016Date of Patent: July 3, 2018Assignee: DAIHEN CorporationInventors: Michio Taniguchi, Shigeki Amadatsu
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Publication number: 20180092196Abstract: A plasma generation apparatus includes a chamber, a high-frequency power source, a magnetic field generator and a parallel capacitor. The chamber has an inner, toroidal-shaped electric discharge space. The high-frequency power source outputs a high-frequency current to the magnetic field generator, which generates a high-frequency magnetic field upon flowing of the high-frequency current therethrough. The parallel capacitor is connected in parallel to the magnetic field generator.Type: ApplicationFiled: September 20, 2017Publication date: March 29, 2018Inventors: Hayato NOTOMI, Shigeki AMADATSU, Eiji TATEBE, Michio TANIGUCHI
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Publication number: 20170062183Abstract: An inductive-coupling plasma generator includes an electroconductive chamber with a toroidal-shaped electrical discharge space formed inside. The plasma generator also includes a high-frequency power source connected to the chamber. The power source is configured to cause a high-frequency current to flow through the chamber along a toroidal direction.Type: ApplicationFiled: August 25, 2016Publication date: March 2, 2017Inventors: Michio TANIGUCHI, Shigeki AMADATSU
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Patent number: 8710824Abstract: A voltage detector having a voltage detection printed board including a board having a penetration hole that penetrates the board, a first pattern wire formed at a periphery of the penetration hole, a second pattern wire formed at the periphery of the penetration hole, and a plurality of through holes that penetrate the board between the first and second pattern wires. Also provided is a conductive casing in which the voltage detection printed board is fixed, wherein, when a conductor, in which AC voltage is generated, is disposed to pass through the penetration hole, the pattern wires act with the conductor to function as electrodes of a capacitor.Type: GrantFiled: August 2, 2011Date of Patent: April 29, 2014Assignee: Daihen CorporationInventors: Yoshifumi Ibuki, Shigeki Amadatsu, Tomohiko Kitano, Shuji Omae
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Publication number: 20110285412Abstract: A current detection printed board includes: a board having a penetration hole that penetrates the board; and at least one wire that is formed in a coiled shape having both ends by penetrating the board along the periphery of the penetration hole and alternately connecting a front surface layer and a rear surface layer of the board, wherein, when a conductor, in which an AC current flows, is disposed to pass through the inside of the penetration hole, a current flowing in the wire is output through electromagnetic induction.Type: ApplicationFiled: August 2, 2011Publication date: November 24, 2011Applicant: DAIHEN CORPORATIONInventors: Yoshifumi IBUKI, Shigeki AMADATSU, Tomohiko KITANO, Shuji OMAE
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Publication number: 20100176904Abstract: A current detection printed board includes: a board having a penetration hole that penetrates the board; and at least one wire that is formed in a coiled shape having both ends by penetrating the board along the periphery of the penetration hole and alternately connecting a front surface layer and a rear surface layer of the board, wherein, when a conductor, in which an AC current flows, is disposed to pass through the inside of the penetration hole, a current flowing in the wire is output through electromagnetic induction.Type: ApplicationFiled: March 26, 2010Publication date: July 15, 2010Applicant: DAIHEN CORPORATIONInventors: Yoshifumi IBUKI, Shigeki Amadatsu, Tomohiko Kitano, Shuji Omae
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Patent number: 7714594Abstract: A current detection printed board includes: a board having a penetration hole that penetrates the board; and at least one wire that is formed in a coiled shape having both ends by penetrating the board along the periphery of the penetration hole and alternately connecting a front surface layer and a rear surface layer of the board, wherein, when a conductor, in which an AC current flows, is disposed to pass through the inside of the penetration hole, a current flowing in the wire is output through electromagnetic induction.Type: GrantFiled: January 26, 2007Date of Patent: May 11, 2010Assignee: Daihen CorporationInventors: Yoshifumi Ibuki, Shigeki Amadatsu, Tomohiko Kitano, Shuji Omae
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Patent number: 7489145Abstract: A high-frequency measurement unit includes a signal detector for detecting a high-frequency signal, and a calibration coefficient storage for storing calibration coefficients Cmin and Cmax used to calibrate a value Amin detected at the lowest limit frequency fmin and a value Amax detected at the uppermost limit frequency fmax to a proper measurement value Asmin and to a proper measurement value Asmax, respectively. The high-frequency measurement unit further includes a frequency detection unit for detecting a frequency fm of the high-frequency signal, a calibration coefficient calculation unit for calculating a calibration coefficient Cm for the frequency fm, and a calibration unit for calibrating the value Am detected by the signal detector to a proper measurement value Asm by using the calibration coefficient Cm calculated by the calibration coefficient calculation unit.Type: GrantFiled: December 8, 2006Date of Patent: February 10, 2009Assignee: Daihen CorporationInventors: Hiroshi Matoba, Ryohei Tanaka, Shuji Omae, Shigeki Amadatsu
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Publication number: 20070194797Abstract: A current detection printed board includes: a board having a penetration hole that penetrates the board; and at least one wire that is formed in a coiled shape having both ends by penetrating the board along the periphery of the penetration hole and alternately connecting a front surface layer and a rear surface layer of the board, wherein, when a conductor, in which an AC current flows, is disposed to pass through the inside of the penetration hole, a current flowing in the wire is output through electromagnetic induction.Type: ApplicationFiled: January 26, 2007Publication date: August 23, 2007Applicant: DAIHEN CORPORATIONInventors: Yoshifumi IBUKI, Shigeki AMADATSU, Tomohiko KITANO, Shuji OMAE
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Publication number: 20070152678Abstract: A high-frequency measurement unit includes a signal detector for detecting a high-frequency signal, and a calibration coefficient storage for storing calibration coefficients Cmin and Cmax used to calibrate a value Amin detected at the lowest limit frequency fmin and a value Amax detected at the uppermost limit frequency fmax to a proper measurement value Asmin and to a proper measurement value Asmax, respectively. The high-frequency measurement unit further includes a frequency detection unit for detecting a frequency fm of the high-frequency signal, a calibration coefficient calculation unit for calculating a calibration coefficient Cm for the frequency fm, and a calibration unit for calibrating the value Am detected by the signal detector to a proper measurement value Asm by using the calibration coefficient Cm calculated by the calibration coefficient calculation unit.Type: ApplicationFiled: December 8, 2006Publication date: July 5, 2007Applicant: DAIHEN CORPORATIONInventors: Hiroshi Matoba, Ryohei Tanaka, Shuji Omae, Shigeki Amadatsu
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Patent number: 6726803Abstract: A discharge tube is assembled from three sections formed of metal. A first discharge tube element and a second discharge tube element are connected with an insulator for forming a discharging gap and vacuum-sealing interposed between connecting flanges of both discharge tube elements along with an O-ring. The first discharge tube element and a third discharge tube element and a third discharge tube element are connected in a similar manner, and a discharge gap is formed between adjacent discharge tube elements. A high-frequency power supply is connected to each discharge tube element. Respective discharge tube elements are provided with cooling medium flow paths separately each other.Type: GrantFiled: July 10, 2001Date of Patent: April 27, 2004Assignee: Daihen CorporationInventors: Kazuki Kondo, Michio Taniguchi, Shoichiro Minomo, Shigeki Amadatsu
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Patent number: 6401653Abstract: A plasma generator according to the invention includes a rectangular waveguide into which a microwave is introduced, a coaxial tube connected in a T shape to the rectangular waveguide through their respective openings, a vacuum sealing window for blocking the openings with an insulator to thereby vacuum seal the interior of the coaxial tube against the rectangular waveguide, and an insulator arranged in the coaxial tube as linked to the vacuum sealing window, thus facilitating microwave matching.Type: GrantFiled: April 9, 2001Date of Patent: June 11, 2002Assignee: Daihen CorporationInventors: Michio Taniguchi, Shoichiro Minomo, Shigeki Amadatsu, Kazuki Kondo
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Publication number: 20020043342Abstract: A plasma generator according to the invention includes a rectangular waveguide into which a microwave is introduced, a coaxial tube connected in a T shape to the rectangular waveguide through their respective openings, a vacuum sealing window for blocking the openings with an insulator to thereby vacuum seal the interior of the coaxial tube against the rectangular waveguide, and an insulator arranged in the coaxial tube as linked to the vacuum sealing window, thus facilitating microwave matching.Type: ApplicationFiled: April 9, 2001Publication date: April 18, 2002Applicant: Daihen CorporationInventors: Michio Taniguchi, Shoichiro Minomo, Shigeki Amadatsu, Kazuki Kondo
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Publication number: 20020023589Abstract: One discharge tube assembled from divided three sections is constructed by connecting between a first discharge tube element of metal material and a second discharge tube element of metal material with an insulator for forming a discharging gap and vacuum-sealing interposed between connecting flanges of both discharge tube elements in a state of sealing hermetically with an O-ring and also by connecting between a first discharge tube element of metal material and a third discharge tube element of metal material in a similar manner, and a discharge gap is formed between adjacent discharge tube elements. A high-frequency power supply is connected to each discharge tube element. Respective discharge tube elements are provided with cooling medium flow paths separately each other.Type: ApplicationFiled: July 10, 2001Publication date: February 28, 2002Inventors: Kazuki Kondo, Michio Taniguchi, Shoichiro Minomo, Shigeki Amadatsu
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Patent number: 5843236Abstract: In a plasma processing apparatus including a plasma chamber having a narrow window, and a rectangular waveguide for coupling with the plasma chamber, the rectangular waveguide has a long slot disposed in an E-plane thereof so as to oppose the narrow window of the plasma chamber and to extend along a waveguide-axis direction of the rectangular waveguide. There is further provided at least two long slots disposed in at least one rectangular waveguide, and the longitudinal length of each long slot is set to 1/2 or more of a free-space wavelength of the microwave. Further, the long slots are disposed so as to be parallel to each other such that adjacent long slots are shifted from each other by (2n-1)/4 of the free-space wavelength of the microwave in the waveguide-axis direction of the rectangular waveguide, where n is a natural number.Type: GrantFiled: September 15, 1995Date of Patent: December 1, 1998Assignee: Daihen CorporationInventors: Hiroyuki Yoshiki, Kazuki Kondo, Akira Ishii, Shigeki Amadatsu, Tatsuya Saijo, Koji Itadani, Takahiro Aoyama