Patents by Inventor Shigeki Miura

Shigeki Miura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11058075
    Abstract: Prior art technology has a problem in that when a plant is cultivated for a long period of time on a PVA film having its lower surface positioned in contact with a nutrient fluid, plant roots that have formed penetrate through the film. A plant cultivation system wherein the PVA film has an equilibrium degree of swelling in the range of from 125 to 250% as measured in water at 30° C. and has a loss tangent (tan ?) in the range of from 0.005 to 0.2 as measured in an equilibrium swollen state in water at 30° C., and a method for cultivating a plant by using this plant cultivation system. Plant cultivation can be performed for a long period of time while avoiding infection by bacteria and the like causative of plant diseases. Therefore, the present invention is useful in, e.g., agriculture and the manufacture of pharmaceuticals.
    Type: Grant
    Filed: April 17, 2020
    Date of Patent: July 13, 2021
    Assignee: MEBIOL INC.
    Inventors: Hiroshi Yoshioka, Yuichi Mori, Akihiro Okamoto, Shigeki Miura, Tomoyoshi Mizutani
  • Publication number: 20200260671
    Abstract: Prior art technology has a problem in that when a plant is cultivated for a long period of time on a PVA film having its lower surface positioned in contact with a nutrient fluid, plant roots that have formed penetrate through the film. A plant cultivation system wherein the PVA film has an equilibrium degree of swelling in the range of from 125 to 250% as measured in water at 30° C. and has a loss tangent (tan ?) in the range of from 0.005 to 0.2 as measured in an equilibrium swollen state in water at 30° C., and a method for cultivating a plant by using this plant cultivation system. Plant cultivation can be performed for a long period of time while avoiding infection by bacteria and the like causative of plant diseases. Therefore, the present invention is useful in, e.g., agriculture and the manufacture of pharmaceuticals.
    Type: Application
    Filed: April 17, 2020
    Publication date: August 20, 2020
    Applicant: MEBIOL INC.
    Inventors: Hiroshi YOSHIOKA, Yuichi MORI, Akihiro OKAMOTO, Shigeki MIURA, Tomoyoshi MIZUTANI
  • Patent number: 10660280
    Abstract: Prior art technology has a problem in that when a plant is cultivated for a long period of time on a PVA film having its lower surface positioned in contact with a nutrient fluid, plant roots that have formed penetrate through the film. A plant cultivation system wherein the PVA film has an equilibrium degree of swelling in the range of from 125 to 250% as measured in water at 30° C. and has a loss tangent (tan ?) in the range of from 0.005 to 0.2 as measured in an equilibrium swollen state in water at 30° C., and a method for cultivating a plant by using this plant cultivation system. Plant cultivation can be performed for a long period of time while avoiding infection by bacteria and the like causative of plant diseases. Therefore, the present invention is useful in, e.g., agriculture and the manufacture of pharmaceuticals.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: May 26, 2020
    Assignee: MEBIOL INC.
    Inventors: Hiroshi Yoshioka, Yuichi Mori, Akihiro Okamoto, Shigeki Miura, Tomoyoshi Mizutani
  • Publication number: 20160205880
    Abstract: [Problems] Prior art technology has a problem in that when a plant is cultivated for a long period of time on a polyvinyl alcohol (PVA) film having its lower surface positioned in contact with a nutrient fluid, plant roots that have formed penetrate through the film. [Means to solve the problems] A plant cultivation system wherein the PVA film has an equilibrium degree of swelling in the range of from 125 to 250% as measured in water at 30° C. and has a loss tangent (tan ?) in the range of from 0.005 to 0.2 as measured in an equilibrium swollen state in water at 30° C., and a method for cultivating a plant by using this plant cultivation system. [Industrial applicability] Plant cultivation can be performed for a long period of time while avoiding infection by bacteria and the like causative of plant diseases. Therefore, the present invention is useful in, e.g., agriculture and the manufacture of pharmaceuticals.
    Type: Application
    Filed: August 11, 2014
    Publication date: July 21, 2016
    Applicant: MEBIOL INC.
    Inventors: Hiroshi Yoshioka, Yuichi Mori, Akihiro Okamoto, Shigeki Miura, Tomoyoshi Mizutani
  • Publication number: 20090188700
    Abstract: An electrode substrate of the present invention includes a first conductive layer made of a first conductive material and a second conductive layer made of a second conductive material formed on a transparent base material, wherein the first conductive layer is formed on the transparent base material, the second conductive layer is formed on the transparent base material to cover the first conductive layer, both the first conductive layer and the second conductive layer form a fine wiring pattern, the second conductive layer has a width not less than 1.5 times and not more than 300 times that of the first conductive layer, and the second conductive material has a light transmissivity higher than that of the first conductive material, and a conductivity lower than that of the first conductive material.
    Type: Application
    Filed: January 27, 2009
    Publication date: July 30, 2009
    Inventor: Shigeki Miura
  • Patent number: 7563353
    Abstract: A method of forming an Sn—Ag—Cu ternary alloy thin-film of the present invention forms the ternary alloy thin-film by electroplating. A plating bath contains an Sn compound, an Ag compound, a Cu compound, an inorganic chelating agent and an organic chelating agent. The inorganic chelating agent is one of a polymerized phosphate-based chelating agent and a chelating agent represented by a chemical formula (I): MFX(X—Y)— . . . (I) where M is an arbitrary metal, X is an arbitrary natural number and Y is an oxidation number of M. The organic chelating agent is one of porphyrins, dipivaloylmethane, phthalocyanines and a compound represented by a chemical formula (II): R—(CH2CH2O)n-A . . . (II) where R is an alkyl group having a carbon number of 8 to 30, A is CH2COONa or CH2SO4Na and n is a natural number.
    Type: Grant
    Filed: October 19, 2005
    Date of Patent: July 21, 2009
    Assignee: FCM Co., Ltd.
    Inventor: Shigeki Miura
  • Publication number: 20070297937
    Abstract: A method of forming an Sn—Ag—Cu ternary alloy thin-film of the present invention forms the ternary alloy thin-film by electroplating. A plating bath contains an Sn compound, an Ag compound, a Cu compound, an inorganic chelating agent and an organic chelating agent. The inorganic chelating agent is one of a polymerized phosphate-based chelating agent and a chelating agent represented by a chemical formula (I): MFX(X—Y)— . . . (I) where M is an arbitrary metal, X is an arbitrary natural number and Y is an oxidation number of M. The organic chelating agent is one of porphyrins, dipivaloylmethane, phthalocyanines and a compound represented by a chemical formula (II): R—(CH2CH2O)n-A . . . (II) where R is an alkyl group having a carbon number of 8 to 30, A is CH2COONa or CH2SO4Na and n is a natural number.
    Type: Application
    Filed: October 19, 2005
    Publication date: December 27, 2007
    Inventor: Shigeki Miura
  • Publication number: 20060254052
    Abstract: A conductive sheet according to the present invention includes: an insulating substrate having at least one via hole, a ground conductive layer; and a top conductive layer, and characterized in that the via hole is a fine pore penetrating through the insulating substrate, the ground conductive layer is formed by a sputtering method or a vapor deposition method on all of a surface of the insulating substrate, the top conductive layer is formed on all of or part of a surface of the ground conductive layer, and the via hole is filled with the top conductive layer.
    Type: Application
    Filed: July 10, 2006
    Publication date: November 16, 2006
    Inventor: Shigeki Miura
  • Publication number: 20060240272
    Abstract: An aluminum stabilization stacked body formed by stacking a stabilization layer formed with a metal and having a thickness of 0.001-1 ?m with any of a sputtering method, a deposition method and an ion plating method on a whole surface of a thin film having a surface formed with aluminum.
    Type: Application
    Filed: October 7, 2003
    Publication date: October 26, 2006
    Applicant: FCM CO., LTD.
    Inventor: Shigeki Miura
  • Publication number: 20050123784
    Abstract: A terminal obtained by forming a surface layer formed of an Sn—Ag—Cu ternary alloy with electroplating on a whole surface or a portion of a conductive base, wherein the Sn—Ag—Cu ternary alloy is constructed with a ratio of 70-99.8 mass % of Sn, 0.1-15 mass % of Ag and 0.1-15 mass % of Cu, has a melting point of 210-230° C., and is formed in a state of a crystal of a minute particle as compared with the surface layer formed of Sn alone.
    Type: Application
    Filed: December 1, 2004
    Publication date: June 9, 2005
    Inventor: Shigeki Miura
  • Publication number: 20050073047
    Abstract: The present invention relates to a conductive sheet having a metal layer formed on at least a portion of a surface of an insulating substrate, wherein the insulating substrate has a long size of 1-10000 m in length, at least a portion of the surface thereof is irradiated with cations to set a surface roughness value Ra of an irradiated portion to 0.2-200 nm, and the metal layer is formed on the portion irradiated with cations by a sputtering method or a deposition method.
    Type: Application
    Filed: October 5, 2004
    Publication date: April 7, 2005
    Inventor: Shigeki Miura
  • Publication number: 20050029014
    Abstract: A conductive sheet according to the present invention includes: an insulating substrate having at least one via hole, a ground conductive layer; and a top conductive layer, and characterized in that the via hole is a fine pore penetrating through the insulating substrate, the ground conductive layer is formed by a sputtering method or a vapor deposition method on all of a surface of the insulating substrate, the top conductive layer is formed on all of or part of a surface of the ground conductive layer, and the via hole is filled with the top conductive layer.
    Type: Application
    Filed: September 7, 2004
    Publication date: February 10, 2005
    Inventor: Shigeki Miura
  • Publication number: 20040038072
    Abstract: A terminal of the present invention includes a ruthenium layer formed on conductive substrate entirely or partially, and a surface metal layer made of at least one of the metals selected from the group consisting of Au, Pt, Ag, Pd, Rh, Co, Ni, In and Sn, or made of an alloy containing at least one of the metals selected from the group, which is formed on the ruthenium layer entirely or partially.
    Type: Application
    Filed: August 14, 2003
    Publication date: February 26, 2004
    Inventor: Shigeki Miura
  • Patent number: 6695598
    Abstract: A scroll compressor comprises a fixed scroll member and a revolving scroll member that engage with each other with their centrifugal walls, wherein the revolving scroll member is supported to revolve with respect to the fixed scroll member, but to avoid self-rotation thereof. The spiral-starting portion of the centrifugal wall comprises non-stepped portions formed along curves of &bgr;1-&bgr;1′ and &bgr;2-&bgr;2′ respectively, and a stepped portion formed along a curve &bgr;1′-&bgr;2′ that provides a thickness increase area encompassed by its upper-side curved surface and its lower-side curved surface. The discharge port is located on the end board of the fixed scroll member to partly overlap with the thickness increase area by partly hollowing the lower side of the stepped portion with the prescribed height.
    Type: Grant
    Filed: January 9, 2002
    Date of Patent: February 24, 2004
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Katsuhiro Fujita, Takahide Itoh, Makoto Takeuchi, Tetsuzou Ukai, Hiroshi Ogawa, Shigeki Miura, Yasuhiro Wada, Yasuharu Maruiwa, Kou Tanaka
  • Patent number: 6603205
    Abstract: A material for an electronic component having a plating layer A formed of metals X and Y mixed with each other on a base metal material and a coating layer B formed of the metal X provided on the plating layer A is provided, whereby wettability of soldering is satisfactory ensured, degradation of solderability and appearance is prevented and generation of whiskers can also be prevented.
    Type: Grant
    Filed: December 6, 2000
    Date of Patent: August 5, 2003
    Assignee: FCM Co., Ltd.
    Inventor: Shigeki Miura
  • Patent number: 6565340
    Abstract: A compressor assembled under desirable working conditions at a low cost is disclosed. In the compressor, the first rolling bearing for permitting axial movement of the shaft is inserted into the first housing from the side where the compression mechanism is to be provided, and the second rolling bearing for restricting axial movement of the shaft is inserted into the first housing from the other side where the driving source is to be provided. The shaft is inserted into the first housing from the side where the compression mechanism is to be provided. A seal member is further provided between the rolling bearings for sealing an area between the insertion hole and the shaft, wherein the seal member is inserted into the insertion hole of the first housing from the side where the compression mechanism is to be provided before the shaft is inserted into the insertion hole.
    Type: Grant
    Filed: October 29, 2001
    Date of Patent: May 20, 2003
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Katsuhiro Fujita, Yasuhiro Wada, Shigeki Miura, Tetsuzou Ukai
  • Patent number: 6514059
    Abstract: An object of the present invention is to provide a scroll compressor that improves assembly precision and the engagement projections are not easily damaged even when a strong force is applied to the Oldham ring during operation; in order to attain this object, a scroll compressor is provided wherein a fixed scroll member comprising an end plate and an involute wrap provided on one face of the end plate, and an orbiting scroll member comprising an end plate and an involute wrap provided on one face of this end plate, and which form a plurality of compression chambers in combination with the involute wrap of the fixed scroll member, wherein a mechanism that prevents autorotation of this orbiting scroll memberand permits rotation of the orbiting scroll member with respect to fixed scroll member is provided between the orbiting scroll member and fixed scroll member.
    Type: Grant
    Filed: June 7, 2000
    Date of Patent: February 4, 2003
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Makoto Takeuchi, Shigeki Miura
  • Publication number: 20020094292
    Abstract: A scroll compressor comprises a fixed scroll member and a revolving scroll member that engage with each other with their centrifugal walls, wherein the revolving scroll member is supported to revolve with respect to the fixed scroll member, but to avoid self-rotation thereof. The spiral-starting portion of the centrifugal wall comprises non-stepped portions formed along curves of &bgr;1-&bgr;1′ and &bgr;2-&bgr;2′ respectively, and a stepped portion formed along a curve &bgr;1′-&bgr;2′ that provides a thickness increase area encompassed by its upper-side curved surface and its lower-side curved surface. The discharge port is located on the end board of the fixed scroll member to partly overlap with the thickness increase area by partly hollowing the lower side of the stepped portion with the prescribed height.
    Type: Application
    Filed: January 9, 2002
    Publication date: July 18, 2002
    Applicant: MITSUBISHI HEAVY INDUSTRIES LTD.
    Inventors: Katsuhiro Fujita, Takahide Itoh, Makoto Takeuchi, Tetsuzou Ukai, Hiroshi Ogawa, Shigeki Miura, Yasuhiro Wada, Yasuharu Maruiwa, Kou Tanaka
  • Publication number: 20020071961
    Abstract: A material for an electronic component having a plating layer A formed of metals X and Y mixed with each other on a base metal material and a coating layer B formed of the metal X provided on the plating layer A is provided, whereby wettability of soldering is satisfactory ensured, degradation of solderability and appearance is prevented and generation of whiskers can also be prevented.
    Type: Application
    Filed: December 6, 2000
    Publication date: June 13, 2002
    Inventor: Shigeki Miura
  • Publication number: 20020057977
    Abstract: A compressor assembled under desirable working conditions at a low cost is disclosed. In the compressor, the first rolling bearing for permitting axial movement of the shaft is inserted into the first housing from the side where the compression mechanism is to be provided, and the second rolling bearing for restricting axial movement of the shaft is inserted into the first housing from the other side where the driving source is to be provided. The shaft is inserted into the first housing from the side where the compression mechanism is to be provided. A seal member is further provided between the rolling bearings for sealing an area between the insertion hole and the shaft, wherein the seal member is inserted into the insertion hole of the first housing from the side where the compression mechanism is to be provided before the shaft is inserted into the insertion hole.
    Type: Application
    Filed: October 29, 2001
    Publication date: May 16, 2002
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Katsuhiro Fujita, Yasuhiro Wada, Shigeki Miura, Tetsuzou Ukai