Abstract: An etchable plate-shaped material is used as a vacuum suction pad 31. On one surface thereof, a large number of independent protruded portions and recessed portions are formed to provide a suction part 33b. Further, a periphery of the suction part is annularly formed to provide an airtight part 33a. When the vacuum suction pad 31 comes close to a substrate to be sucked, a skirt pad 32 with a slit 32d is integrally formed in the shape of a hemmed hat using an elastic member, in order to block outside air into a peripheral space of the vacuum suction pad 31. With this arrangement, it is possible to prevent the substrate from being locally deformed when the substrate is sucked by discharging air from a suction port 36 and to widen a clearance between the vacuum suction pad and the substrate such as a liquid crystal panel, at which the suction is possible.

Abstract: An etchable plate-shaped material is used as a vacuum suction pad 31. On one surface thereof, a large number of independent protruded portions and recessed portions are formed to provide a suction part 33b. Further, a periphery of the suction part is annularly formed to provide an airtight part 33a. When the vacuum suction pad 31 comes close to a substrate to be sucked, a skirt pad 32 with a slit 32d is integrally formed in the shape of a hemmed hat using an elastic member, in order to block outside air into a peripheral space of the vacuum suction pad 31. With this arrangement, it is possible to prevent the substrate from being locally deformed when the substrate is sucked by discharging air from a suction port 36 and to widen a clearance between the vacuum suction pad and the substrate such as a liquid crystal panel, at which the suction is possible.