Abstract: The present invention pertains to a laminated glass for a vehicle, the laminated glass including a first glass sheet, a second glass sheet and an intermediate film sandwiched between the first glass sheet and the second glass sheet, in which: the total thickness of the first glass sheet, the second glass sheet and the intermediate film is 4.0 mm or more; the first glass sheet is formed of a borosilicate glass containing, in terms of oxide by molar percentage, 1.0% or more of B2O3; and when a radio wave (TM wave) with a frequency of 79 [GHz] is made incident at an incident angle of 60° to the first glass sheet, the transmission property S21 is -4.0 [dB] or more.

Abstract: A glass substrate contains, as a glass matrix composition as represented by mole percentage based on oxides, SiO2: 58-75%, Al2O3: 4.5-16%, B2O3: 0-6%, MgO: 0-6%, CaO: 0-6%, SrO: 5-20%, BaO: 5-20%, and MgO+CaO+SrO+BaO:15-40%. The glass substrate has an alkali metal oxide content of 0-0.1% as represented by mole percentage based on oxides. The glass substrate has an average coefficient of thermal expansion ? of 56-90 (×10?7/° C.) at 50° C.-350° C.

Abstract: A glass substrate contains, as a glass matrix composition as represented by mole percentage based on oxides, SiO2: 58-75%, Al2O3: 4.5-16%, B2O3: 0-6%, MgO: 0-6%, CaO: 0-6%, SrO: 5-20%, BaO: 5-20%, and MgO+CaO+SrO+BaO: 15-40%. The glass substrate has an alkali metal oxide content of 0-0.1% as represented by mole percentage based on oxides. The glass substrate has an average coefficient of thermal expansion ? of 56-90 (×10?7/° C.) at 50° C.-350° C.

Abstract: The present invention relates to a glass ceramic having a visible-light transmittance of 85% or more in terms of a thickness of 0.7 mm, and a haze value of 1.0% or less in terms of a thickness of 0.7 mm, and including, in mass % on an oxide basis: 45-70% of SiO2; 1-15% of Al2O3; and 10-25% of Li2O.

Abstract: The present invention provides a glass substrate in which in a step of sticking a glass substrate and a silicon-containing substrate to each other, bubbles hardly intrude therebetween. The present invention relates to a glass substrate for forming a laminated substrate by lamination with a silicon-containing substrate, having a warpage of 2 ?m to 300 ?m, and an inclination angle due to the warpage of 0.0004° to 0.12°.

Abstract: The present invention provides a glass substrate in which in a step of sticking a glass substrate and a silicon-containing substrate to each other, bubbles hardly intrude therebetween. The present invention relates to a glass substrate for forming a laminated substrate by lamination with a silicon-containing substrate, having a warpage of 2 ?m to 300 ?m, and an inclination angle due to the warpage of 0.0004° to 0.12°.

Abstract: A first aspect of the present invention relates to a glass substrate having a content of alkali metal oxides, as represented by molar percentage based on oxides, of 0 to 0.1%, a devitrification-temperature viscosity of 103.2 dPa·s or higher, and an average coefficient of thermal expansion ? at 30 to 220° C. of 7.80 to 9.00 (ppm/° C.). A second aspect of the present invention relates to a glass substrate which is to be used for a support substrate for semiconductor packages, the glass substrate having a content of alkali metal oxides, as represented by molar percentage based on oxides, of 0 to 0.1% and a photoelastic constant of 10 to 26 nm/cm/MPa.

Abstract: A glass substrate includes, as a glass matrix composition as represented by mole percentage based on oxides, SiO2: 55%-75%, Al2O3: 2%-15%, MgO: 0%-10%, CaO: 0%-10%, SrO: 0%-10%, BaO: 0%-15%, ZrO2: 0%-5%, Na2O: 0%-20%, K2O: 5%-30%, and Li2O: 0%-5.0%. The glass substrate has a total content of alkali metal oxides, as represented by mole percentage based on oxides, of 10%-30%, a value obtained by dividing the total content of alkali metal oxides by the content of SiO2 of 0.50 or smaller, a value obtained by dividing the content of Na2O by a value obtained by subtracting the content of Al2O3 from a total content of Na2O and K2O of 0.90 or smaller, and an average coefficient of thermal expansion ?1 at 50° C.-350° C. of 11 ppm/° C.-16 ppm/° C.

Abstract: The present invention provides a glass substrate in which in a step of sticking a glass substrate and a silicon-containing substrate to each other, bubbles hardly intrude therebetween. The present invention relates to a glass substrate for forming a laminated substrate by lamination with a silicon-containing substrate, having a warpage of 2 ?m to 300 ?m, and an inclination angle due to the warpage of 0.0004° to 0.12°.

Abstract: The present invention provides a glass substrate in which in a step of sticking a glass substrate and a silicon-containing substrate to each other, bubbles hardly intrude therebetween. The present invention relates to a glass substrate for forming a laminated substrate by lamination with a silicon-containing substrate, having a warpage of 2 ?m to 300 ?m, and an inclination angle due to the warpage of 0.0004° to 0.12°.

Abstract: A first aspect of the present invention relates to a glass substrate having a content of alkali metal oxides, as represented by molar percentage based on oxides, of 0 to 0.1%, a devitrification-temperature viscosity of 103.2 dPa·s or higher, and an average coefficient of thermal expansion ? at 30 to 220° C. of 7.80 to 9.00 (ppm/° C.). A second aspect of the present invention relates to a glass substrate which is to be used for a support substrate for semiconductor packages, the glass substrate having a content of alkali metal oxides, as represented by molar percentage based on oxides, of 0 to 0.1% and a photoelastic constant of 10 to 26 nm/cm/MPa.

Abstract: To provide chemically tempered glass which is less likely to break even if scratched. Chemically tempered glass, which comprises, as represented by mole percentage based on the following oxides, from 56 to 72% of SiO2, from 8 to 20% of Al2O3, from 9 to 25% of Na2O, from 0 to 2% of K2O, and from 0 to 15% of MgO, and which has a surface compressive stress of at least 900 MPa and an internal tensile stress of at most 30 MPa. Glass for chemical tempering, which comprises, as represented by mole percentage based on the following oxides, from 56 to 69% of SiO2, from 8 to 16% of Al2O3, from 9 to 22% of Na2O, from 0 to 1% of K2O, from 5.5 to 14% of MgO, from 0 to 2% of ZrO2, and from 0 to 6% of B2O3.

Abstract: A glass substrate includes, as a glass matrix composition as represented by mole percentage based on oxides, SiO2: 55%-75%, Al2O3: 2%-15%, MgO: 0%-10%, CaO: 0%-10%, SrO: 0%-10%, BaO: 0%-15%, ZrO2: 0%-5%, Na2O: 0%-20%, K2O: 5%-30%, and Li2O: 0%-5.0%. The glass substrate has a total content of alkali metal oxides, as represented by mole percentage based on oxides, of 10%-30%, a value obtained by dividing the total content of alkali metal oxides by the content of SiO2 of 0.50 or smaller, a value obtained by dividing the content of Na2O by a value obtained by subtracting the content of Al2O3 from a total content of Na2O and K2O of 0.90 or smaller, and an average coefficient of thermal expansion ?1 at 50° C.-350° C. of 11 ppm/° C.-16 ppm/° C.

Abstract: Provided is an optical glass suitable for an imaging lens or the like used for a vehicle-mounted camera exposed to harsh environment, having a high refractive index and high strength. The optical glass has a strengthened layer at a surface layer, and a depth of the strengthened layer is 1 ?m or more from a surface of the optical glass, and a refractive index (nd) of the optical glass is 1.73 to 2.10.

Abstract: Provided is an optical glass suitable for an imaging lens or the like used for a vehicle-mounted camera exposed to harsh environment, having a high refractive index and high strength, excellent crack resistance, and a sufficiently low glass transition point and devitrification temperature. In the optical glass, nd is 1.70 or more and 2.10 or less, Tg is 500° C. or more and 630° C. or less, the devitrification temperature is 1300° C. or less, a specific gravity is 4.0 g/cm3 or less, a crack initiation load (CIL) is 20 gf or more, and a fracture toughness value (Kc) is 0.60 MPa·m1/2 or more.

Abstract: A glass substrate contains, as a glass matrix composition as represented by mole percentage based on oxides, SiO2: 58-75%, Al2O3: 4.5-16%, B2O3: 0-6%, MgO: 0-6%, CaO: 0-6%, SrO: 5-20%, BaO: 5-20%, and MgO+CaO+SrO+BaO: 15-40%. The glass substrate has an alkali metal oxide content of 0-0.1% as represented by mole percentage based on oxides. The glass substrate has an average coefficient of thermal expansion ? of 56-90 (×10?7/° C.) at 50° C.-350° C.

Abstract: The present invention provides a glass substrate in which in a step of sticking a glass substrate and a silicon-containing substrate to each other, bubbles hardly intrude therebetween. The present invention relates to a glass substrate for forming a laminated substrate by lamination with a silicon-containing substrate, having a warpage of 2 ?m to 300 ?m, and an inclination angle due to the warpage of 0.0004° to 0.12°.

Abstract: To provide chemically tempered glass which is less likely to break even if scratched. Chemically tempered glass, which comprises, as represented by mole percentage based on the following oxides, from 56 to 72% of SiO2, from 8 to 20% of Al2O3, from 9 to 25% of Na2O, from 0 to 2% of K2O, and from 0 to 15% of MgO, and which has a surface compressive stress of at least 900 MPa and an internal tensile stress of at most 30 MPa. Glass for chemical tempering, which comprises, as represented by mole percentage based on the following oxides, from 56 to 69% of SiO2, from 8 to 16% of Al2O3, from 9 to 22% of Na2O, from 0 to 1% of K2O, from 5.5 to 14% of MgO, from 0 to 2% of ZrO2, and from 0 to 6% of B2O3.

Abstract: To provide chemically tempered glass which is less likely to break even if scratched. Chemically tempered glass, which comprises, as represented by mole percentage based on the following oxides, from 56 to 72% of SiO2, from 8 to 20% of Al2O3, from 9 to 25% of Na2O, from 0 to 2% of K2O, and from 0 to 15% of MgO, and which has a surface compressive stress of at least 900 MPa and an internal tensile stress of at most 30 MPa. Glass for chemical tempering, which comprises, as represented by mole percentage based on the following oxides, from 56 to 69% of SiO2, from 8 to 16% of Al2O3, from 9 to 22% of Na2O, from 0 to 1% of K2O, from 5.5 to 14% of MgO, from 0 to 2% of ZrO2, and from 0 to 6% of B2O3.

Abstract: To provide chemically tempered glass which is less likely to break even if scratched. Chemically tempered glass, which comprises, as represented by mole percentage based on the following oxides, from 56 to 72% of SiO2, from 8 to 20% of Al2O3, from 9 to 25% of Na2O, from 0 to 2% of K2O, and from 0 to 15% of MgO, and which has a surface compressive stress of at least 900 MPa and an internal tensile stress of at most 30 MPa. Glass for chemical tempering, which comprises, as represented by mole percentage based on the following oxides, from 56 to 69% of SiO2, from 8 to 16% of Al2O3, from 9 to 22% of Na2O, from 0 to 1% of K2O, from 5.5 to 14% of MgO, from 0 to 2% of ZrO2, and from 0 to 6% of B2O3.