Abstract: A low-temperature gas supply device is provided with a first heat exchanger, in which a mixed gas mixing a vaporization gas of a low-temperature-liquefied gas with a gas of a temperature higher than the low-temperature-liquefied gas and the low-temperature-liquefied gas are introduced and heat-exchanged with each other, and the mixed gas is discharged as a low-temperature gas refrigerant and the low-temperature-liquefied gas is discharged as the vaporization gas; a mixing unit, in which the gas and the vaporization gas discharged from the first heat exchanger are mixed and discharged as the mixed gas; and a first control unit, in which, based on the difference between a detected temperature of the low-temperature gas refrigerant and an intended temperature, respective amounts of the gas introduced to the mixing unit and the vaporization gas are adjusted to control the temperature of the low-temperature gas refrigerant to the intended temperature.

Abstract: A reaction device having improved temperature control precision and reduced usage of heat transfer medium. The device includes a heat transfer medium circulation tube in contact with an outer wall of a reaction vessel containing a reaction liquid. The device has an inlet for the liquid heat transfer medium at the lower end portion of the heat transfer medium circulation tube, and an outlet for the heat transfer medium. Gaps between the heat transfer medium circulation tube and the reaction vessel outer wall include a filler in which a liquid can flow inside the filler. The outlet is formed so that the liquid heat transfer medium is discharged toward the filler. A member presses the heat transfer medium circulation tube against the outer wall of the reaction vessel. An outer vessel hermetically covers the outer circumference of the reaction vessel.

Abstract: Provided is a reaction device having a simple structure in which a temperature control precision can be improved, and at the same time, the amount of heat medium used can be reduced, and the device is provided with a heat-medium circulation tube 15 in contact with an outer wall of a reaction vessel 13 containing a reaction liquid 12. The reaction device of the present invention is provided with an inlet for the liquid heat medium at the lower end portion of the heat-medium circulation tube 15, and an outlet for the liquid heat medium or a gas heat medium which is a vaporized liquid heat medium at the upper end portion of the heat-medium circulation tube 15, respectively. Gaps between the heat-medium circulation tube 15 and the reaction vessel 13 outer wall are filled with a filler 22. The filler 22 is formed by a material in which a liquid can flow inside the filler 22, and the outlet is formed in a direction such that the liquid heat medium is discharged toward the filler 22.