Abstract: A slit nozzle is positioned above a surface of a substrate placed in a rotary coater, and, while the slit nozzle is translated parallel to the surface of the substrate a coating solution is ejected from the slit nozzle toward the glass substrate under conditions such that the effects of surface tension of the solution are minimized or substantially cancelled out, to uniformly coat the coating solution on substantially the entire surface of the substrate with minimum wasting of the solution.

Abstract: A slit nozzle is positioned above a surface of a substrate placed in a rotary coater, and, while the slit nozzle is translated parallel to the surface of the substrate a coating solution is ejected from the slit nozzle toward the glass substrate under conditions such that the effects of surface tension of the solution are minimized or substantially cancelled out, to uniformly coat the coating solution on substantially the entire surface of the substrate with minimum wasting of the solution.

Abstract: A slit nozzle is positioned above an end of a glass substrate placed in an inner cup, and, while a coating solution is being ejected with reduced surface tension from the slit nozzle toward the glass substrate, the slit nozzle is translated parallel to the surface of the glass substrate to roughly coat the coating solution on substantially the entire surface of the glass substrate. Thereafter, the upper opening of the inner cup and the upper opening of an outer cup around the inner cup are closed by respective lids, and then the inner cup is rotated to rotate the glass substrate for thereby spreading the coated solution uniformly over the surface of the glass substrate under centrifugal forces.

Abstract: A substrate transfer apparatus, for minimizing flexion or bending when transferring a large-sized angular substrate or plate, wherein transfer arms are constructed with holding portions extending in a direction perpendicular to a transfer direction and further holding portions extending in a direction parallel to the transfer direction, respectively. As a result of this, it is possible to suspend the glass substrate W at the four peripheral side portions from below by means of the holding portions of the transfer arms and to move or transfer it suspended in this way.

Abstract: A cleaning device for cleaning a slit-like nozzle having an opening of a predetermined breadth for discharging liquid paint, with uniformity and with a small amount of cleaning liquid, wherein under a condition that a nozzle N is mounted on receiver plates 4, 4, a substantially air-tight space is formed, and a gas supply conduit is opened at one end of a cleaning portion 2 in the direction of the breadth of the nozzle, and an exhaust conduit 7 is opened at the other end thereof, being disposed in a vicinity of the gas supply conduit, so as to supply the cleaning liquid into the air-tight space. Then, since the air inside of the air-tight space is extracted from the exhaust conduit 7, the gas supplied from the one end flows towards the exhaust conduit 7 at the other end. The cleaning liquid contacts with the surface of the nozzle so as to dissolve and wash away any liquid paint adhering thereon.

Abstract: A rotating cup type liquid supply device comprises an inner cup 3, a vacuum chuck 5 disposed in the center of a bottom surface of the inner cup 3 for holding thereon a planar material W to be treated, and a tray 7 fixed onto the bottom surface of the inner cup 3 for substantially surrounding the planar material W held by the vacuum chuck 5. The tray is of a substantially rectangular shape in plan view and includes an tapered wall portion 9 turned inwardly along a circumferential wall portion thereof for defining an upper opening 8 of the tray 7. The tray 7 further includes a plurality of drain guiding conduits 10 each extending at a predetermined angle outwardly from an outer peripheral portion thereof. Also, the tray can be provided thereon with the cover having an opening slightly larger than the planar material W.

Abstract: A vacuum chuck and an inner cup are rotated together by a spinner for spreading and coating a coating solution uniformly on a glass substrate in the inner cup under centrifugal forces. Under the centrifugal forces, gases that are present inward of a rectangular ridge in the inner cup are forced to flow outwardly through a gap between the rectangular ridge and a flow-rectifying plate 42 and also through holes defined in the rectangular ridge. Therefore, turbulent flows and pressure fluctuations are minimized in a space defined inward of the rectangular ridge, i.e., a space which accommodates the glass substrate placed on a bottom surface of the inner cup inwardly of the rectangular ridge. The coating solution applied to the upper surface of the glass substrate is allowed to form a uniform film thereon.

Abstract: A solution applying apparatus has inner and outer cups each having an upper opening, the inner cup being rotatably disposed in the outer cup. The inner cup houses a planar workpiece such as a glass substrate therein which is to be coated with a coating solution such as a resist solution. The solution applying apparatus also has a lid assembly having an outer cup lid for closing the upper opening of the outer cup and an inner cup lid for closing the upper opening of the inner cup, the inner cup lid being rotatable with respect to the outer cup lid. The inner cup has drain holes defined in an outer circumferential portion thereof for providing communication between a space within the inner cup and a space outside of the inner cup to drain an excessive coating solution from the inner cup. The outer cup has an annular collection passage defined therein along the outer circumferential portion of the inner cup, the drain holes opening into the annular collection passage.

Abstract: A glass substrate is supported on a pedestal in a rotatable cup having an upper opening. The pedestal, which is substantially similar in shape to the glass substrate, has a ridge extending along an outer peripheral edge of an upper surface thereof, for engaging an outer peripheral edge of a lower surface of the glass substrate. After a resist solution to be coated on the glass substrate is applied to an upper surface thereof, the upper opening of the rotatable cup is closed by a cover, and then the rotatable cup is rotated to spread the applied resist solution uniformly over the upper surface under centrifugal forces. In one embodiment, the apparatus comprises an inner rotatable cup and an outer rotatable cup, each with its own separate cover. In another embodiment, a pedestal is mounted on the bottom of the inner cup having a vacuum chuck movable therein.

Abstract: A cleaning device has a pair of diametrically opposite nozzles spaced across a rotatable chuck from each other for alternately applying a cleaning solution to the reverse side of a workpiece. The rotatable chuck with the workpiece held thereon is rotated by a reversible motor alternatively in opposite directions such that the cleaning solution is ejected from one of the nozzles while the rotatable chuck is being rotated in one of the opposite directions by the reversible motor, and the cleaning solution is ejected from the other of the nozzles while the rotatable chuck is being rotated in the other of the opposite directions by the reversible motor. The nozzles have respective axes along which the cleaning solution is ejected, the axes extending symmetrically with respect to a line passing through the center of the rotatable chuck perpendicularly to a line connecting the pair of nozzles.