Patents by Inventor Shigenobu Yoshida

Shigenobu Yoshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7910213
    Abstract: A gas-barrier laminate with a plastic substrate, an inorganic thin film formed on at least one surface of the plastic substrate, and a coating layer formed by applying a coating material on a surface of the inorganic thin film, wherein said coating layer contains a polyester-based resin having a molecular weight of 3000 to 15000 and a polyurethane-based resin having a molecular weight of 8000 to 30000 at a weight ratio of 5/95 to 95/5, and said gas-barrier laminate has an oxygen permeability of not more than 25 fmol/m2/s/Pa; and a gas-barrier laminate comprising a plastic substrate, an inorganic thin film formed on at least one surface of the plastic substrate, and a coating layer formed by applying a coating material on a surface of the inorganic thin film, wherein the gas-barrier laminate exhibits an oxygen permeability of not more than 50 fmol/m2/s/Pa as measured with respect to a gas-barrier film obtained by laminating an unstretched polypropylene film having a thickness of 60 ?m on the coating layer of t
    Type: Grant
    Filed: March 23, 2005
    Date of Patent: March 22, 2011
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Tooru Hachisuka
  • Publication number: 20110045301
    Abstract: Provided is a weather-resistant gas barrier film capable of keeping a high delamination strength and an excellent gas barrier property in a high-temperature high-humidity environment and in a UV radiation environment. The gas barrier film comprises a substrate film, a weather-resistant coating layer formed on at least one surface thereof, and an inorganic thin film layer formed on the surface of the coating layer, wherein the weather-resistant coating layer is selected from (1) a weather-resistant coating layer that contains an acrylic copolymer having at least one group selected from a UV-stabilizing group, a UV-absorbing group and a cycloalkyl group, (2) a weather-resistant coating layer formed by crosslinking a polycaprolactone-polyol and/or a polycarbonate-polyol as the essential ingredient, and (3) a weather-resistant coating layer formed by crosslinking a modified polyvinyl alcohol; and also provided is a method for producing the gas barrier film.
    Type: Application
    Filed: January 27, 2009
    Publication date: February 24, 2011
    Applicant: Mitsubishi Plastics, Inc.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka
  • Patent number: 7678448
    Abstract: The gas barrier film of the present invention is a gas barrier film comprising a base material, and an inorganic thin film composed of a silicon oxide film formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide film observed by an electron spin resonance method (ESR method) is from 1×1016 to 1×1019 spins/cm3, or a gas barrier film comprising a base material, an inorganic thin film containing silicon oxide and the other metal component formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide in the inorganic thin film observed by an ESR method is from 13×1014 to 3×1017 spins/mol, and a laminate wherein at least one paper and/or plastic film is laminated on the gas barrier film.
    Type: Grant
    Filed: January 26, 2005
    Date of Patent: March 16, 2010
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Tooru Hachisuka, Shigenobu Yoshida, Chiharu Okawara, Yoshinori Kobayashi, Kenji Ito, Hisashi Togashi, Kouichi Hirata
  • Publication number: 20100035050
    Abstract: The present invention relates to a gas-barrier laminate for hydrothermal treatment which comprises a base plastic film, a coating layer formed on at least one surface of the base plastic film, an inorganic thin film formed on a surface of the coating layer which is made of a metal compound, and a heat-sealable plastic film laminated on the inorganic thin film or the base plastic film, wherein the inorganic thin film before laminating the heat-sealable plastic film thereon has a rubbing strength of not less than 20 times as measured under a load of 70 g, and the coating layer has a hardness of 0.15 to 0.40 GPa. The laminate of the present invention is excellent in interlaminar bonding property, hardly undergoes breakage of the inorganic thin film owing to the hydrothermal treatment, and can maintain an excellent gas-barrier property even after subjected to the hydrothermal treatment.
    Type: Application
    Filed: July 12, 2006
    Publication date: February 11, 2010
    Applicant: MITSUBISHI PLASTICS, INC.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka
  • Publication number: 20100015431
    Abstract: The present invention relates to a gas-barrier film laminate capable of greatly reducing the formation of bubbles and impurities between the gas-barrier film layers and having excellent gas-barrier property interlayer adhesiveness. The gas-barrier film laminate has at least two gas-barrier film layers laminated via an adhesive layer, wherein the gas-barrier film layer has a substrate film, and at least one constitutive unit layer comprising an anchor coat layer and an inorganic thin film layer formed on at least one surface of the substrate film in that order, and wherein the number of the bubbles having a diameter of at least 0.5 mm and the impurities having a diameter of at least 0.5 mm existing between the gas-barrier film layers is at most 3 in total per 100 cm2.
    Type: Application
    Filed: November 15, 2007
    Publication date: January 21, 2010
    Applicant: MISTUBISHI PLASTICS, INC.
    Inventors: Tsutomu Matsui, Shigenobu Yoshida
  • Patent number: 7615287
    Abstract: The gas barrier film having a thermoplastic polymer film, and an inorganic thin film provided on at least one surface of the thermoplastic polymer film, which gas barrier film is formed by applying, to the inorganic thin film, a solution which contains at least one ion species selected from the group consisting of alkali metal ions, alkaline earth metal ions, and ammonium ions and originating from a low-molecular-weight electrolyte having a molecular weight of 1,000 or less and which has a total ion concentration of the ion species of 1×10?5 mol/L or more and less than 10 mol/L and a solution concentration less than a saturation concentration.
    Type: Grant
    Filed: November 29, 2004
    Date of Patent: November 10, 2009
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka
  • Publication number: 20090274894
    Abstract: There is provided a gas-barrier laminate composed of a base film and an inorganic thin film layer formed on the base film which considerably enhanced in gas-barrier property and gelbo flex resistance. The present invention relates to a gas-barrier laminate comprising a base film containing at least one compound selected from the group consisting of polyvinyl alcohol and an ethylene-vinyl alcohol copolymer, and an anchor coat layer and an inorganic thin film layer successively formed on one surface of the base film in this order, wherein the base film is in the form of a biaxially stretched film having a variation in thickness of 3.5 ?m or less and a crystallinity of 30% or more.
    Type: Application
    Filed: April 13, 2007
    Publication date: November 5, 2009
    Applicant: Mitsubishi Plastics, Inc.
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Tooru Hachisuka
  • Publication number: 20090214854
    Abstract: Provided is a film which can be industrially coated easily and exhibits excellent gas barrier performance without being subjected to a high-temperature heat treatment. The film exhibits good gas barrier performance immediately after the production, and maintains the excellent gas barrier performance while exhibiting excellent hot water resistance and printing resistance.
    Type: Application
    Filed: August 30, 2006
    Publication date: August 27, 2009
    Applicant: MITSUBISHI PLASTICS, INC.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka, Motoyoshi Takemura
  • Publication number: 20090022981
    Abstract: Provided is a laminated film which exhibits high gas barrier performance immediately after the production and has excellent adhesive strength between constitutional layers, while maintaining the excellent gas barrier performance. The laminated film has at least one constitutional unit layer on an inorganic thin film formed at least on one surface of a base film. The constitutional unit layer is composed of an anchor coat layer having a thickness of 0.1 to 10 nm and an inorganic thin film formed on the anchor coat layer. A method for producing the laminated film is also provided.
    Type: Application
    Filed: September 19, 2006
    Publication date: January 22, 2009
    Applicant: Mitsubishi Plastics, Inc.
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Motoyoshi Takemura, Tooru Hachisuka
  • Publication number: 20080254266
    Abstract: The gas barrier film of the present invention is a gas barrier film comprising a base material, and an inorganic thin film composed of a silicon oxide film formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide film observed by an electron spin resonance method (ESR method) is from 1×1016 to 1×1019 spins/cm3, or a gas barrier film comprising a base material, an inorganic thin film containing silicon oxide and the other metal component formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide in the inorganic thin film observed by an ESR method is from 13×1014 to 3×1017 spins/mol, and a laminate wherein at least one paper and/or plastic film is laminated on the gas barrier film.
    Type: Application
    Filed: January 26, 2005
    Publication date: October 16, 2008
    Applicants: Mitsubishi Plastics, INC., National Institute of Advanced Industrial Science and Technology
    Inventors: Tooru Hachisuka, Shigenobu Yoshida, Chiharu Okawara, Yoshinori Kobayashi, Kenji Ito, Hisashi Togashi, Kouichi Hirata
  • Patent number: 7288315
    Abstract: A gas-barrier laminate comprising a base film, a thin film formed on the base film and comprising a metal compound selected from the group consisting of oxides, carbides and nitrides of metals, and mixtures thereof, and a plastic film formed on the metal compound thin film in which a film obtained by forming the metal compound thin film on the base film is subjected to a heat treatment, and having an oxygen permeability of not more than 2 cc/m2/day/atm, wherein when the laminate is subjected to hydrothermal treatment at 120° C. for 30 min, a change in oxygen permeability of the laminate between before and after the hydrothermal treatment is not more than 5.
    Type: Grant
    Filed: November 28, 2006
    Date of Patent: October 30, 2007
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Soko Yamagami, Tooru Hachisuka
  • Publication number: 20070224402
    Abstract: A gas-barrier laminate with a plastic substrate, an inorganic thin film formed on at least one surface of the plastic substrate, and a coating layer formed by applying a coating material on a surface of the inorganic thin film, wherein said coating layer contains a polyester-based resin having a molecular weight of 3000 to 15000 and a polyurethane-based resin having a molecular weight of 8000 to 30000 at a weight ratio of 5/95 to 95/5, and said gas-barrier laminate has an oxygen permeability of not more than 25 fmol/m2/s/Pa; and a gas-barrier laminate comprising a plastic substrate, an inorganic thin film formed on at least one surface of the plastic substrate, and a coating layer formed by applying a coating material on a surface of the inorganic thin film, wherein the gas-barrier laminate exhibits an oxygen permeability of not more than 50 fmol/m2/s/Pa as measured with respect to a gas-barrier film obtained by laminating an unstretched polypropylene film having a thickness of 60 ?m on the coating layer of t
    Type: Application
    Filed: March 23, 2005
    Publication date: September 27, 2007
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Tooru Hachisuka
  • Publication number: 20070092717
    Abstract: A gas-barrier laminate comprising a base film, a thin film formed on the base film and comprising a metal compound selected from the group consisting of oxides, carbides and nitrides of metals, and mixtures thereof, and a plastic film formed on the metal compound thin film in which a film obtained by forming the metal compound thin film on the base film is subjected to a heat treatment, and having an oxygen permeability of not more than 2 cc/m2/day/atm, wherein when the laminate is subjected to hydrothermal treatment at 120° C. for 30 min, a change in oxygen permeability of the laminate between before and after the hydrothermal treatment is not more than 5.
    Type: Application
    Filed: November 28, 2006
    Publication date: April 26, 2007
    Applicant: Mitsubishi Plastics, Inc.
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Soko Yamagami, Tooru Hachisuka
  • Publication number: 20070071982
    Abstract: The gas barrier film having a thermoplastic polymer film, and an inorganic thin film provided on at least one surface of the thermoplastic polymer film, which gas barrier film is formed by applying, to the inorganic thin film, a solution which contains at least one ion species selected from the group consisting of alkali metal ions, alkaline earth metal ions, and ammonium ions and originating from a low-molecular-weight electrolyte having a molecular weight of 1,000 or less and which has a total ion concentration of the ion species of 1×10?5 mol/L or more and less than 10 mol/L and a solution concentration less than a saturation concentration.
    Type: Application
    Filed: November 29, 2004
    Publication date: March 29, 2007
    Applicant: MITSUBISHI PLASTICS, INC.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka
  • Publication number: 20070059541
    Abstract: A gas-barrier laminate comprises a plastic substrate (A), an inorganic thin film (B) formed on at least one surface of the plastic substrate (A), and a polyester-based resin layer (C) formed by applying a coating material containing a polyester-based resin on a surface of the inorganic thin film (B), wherein the polyester-based resin has a glass transition temperature of 50 to 70° C., a molecular weight of 1500 to 15000 and a hydroxyl value of 10 to 60 mg KOH/g, and the gas-barrier laminate has an oxygen permeability of not more than 5 cc/m2/day/atm and a water vapor permeability of not more than 5 g/m2/day.
    Type: Application
    Filed: June 28, 2004
    Publication date: March 15, 2007
    Inventors: Shigenobu Yoshida, Tooru Hachisuka, Chiharu Okawara
  • Patent number: 7166353
    Abstract: A gas-barrier laminate comprising a base film, a thin film formed on the base film and comprising a metal compound selected from the group consisting of oxides, carbides and nitrides of metals, and mixtures thereof, and a plastic film formed on the metal compound thin film in which a film obtained by forming the metal compound thin film on the base film is subjected to a heat treatment, and having an oxygen permeability of not more than 2 cc/m2/day/atm, wherein when the laminate is subjected to hydrothermal treatment at 120° C. for 30 min, a change in oxygen permeability of the laminate between before and after the hydrothermal treatment is not more than 5.
    Type: Grant
    Filed: February 26, 2003
    Date of Patent: January 23, 2007
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Soko Yamagami, Tooru Hachisuka
  • Publication number: 20050123747
    Abstract: A gas-barrier laminate comprising a base film, a thin film formed on the base film and comprising a metal compound selected from the group consisting of oxides, carbides and nitrides of metals, and mixtures thereof, and a plastic film formed on the metal compound thin film in which a film obtained by forming the metal compound thin film on the base film is subjected to a heat treatment, and having an oxygen permeability of not more than 2 cc/m2/day/atm, wherein when the laminate is subjected to hydrothermal treatment at 120° C. for 30 min, a change in oxygen permeability of the laminate between before and after the hydrothermal treatment is not more than 5.
    Type: Application
    Filed: February 26, 2003
    Publication date: June 9, 2005
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Soko Yamagami, Tooru Hachisuka
  • Patent number: 6395209
    Abstract: The present invention relates to a deposited plastic film comprising: a deposited plastic film comprising: a plastic film; a coating layer which is formed on at least one surface of said plastic film and comprises a cured resin composition obtained by curing a resin composition comprising 6 to 80% by weight of an oxazoline group-containing water-soluble polymer; and a deposit layer which comprises a metal, metal oxide or mixture thereof and is formed on a surface of said coating layer.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: May 28, 2002
    Assignees: Mitsubishi Chemical Corporation, Mitsubishi Polyester Film Corporation
    Inventors: Shigenobu Yoshida, Yuzou Otani
  • Publication number: 20010016260
    Abstract: The present invention relates to a deposited plastic film comprising:
    Type: Application
    Filed: September 24, 1998
    Publication date: August 23, 2001
    Inventors: SHIGENOBU YOSHIDA, YUZOU OTANI
  • Patent number: 5346752
    Abstract: A heat-resistant moistureproof film having a first layer (A), a second layer (B) bonded to one side of the first layer, and a third layer (C) bonded to the other side of the first layer. The first layer (A) is a single or a laminate of a transparent laminated film having a base film composed of PVA having a saponification degree of not less than 99 mol % and a transparent silicon oxide thin film (SO thin film) 2 formed on at least one side thereof. The second layer (B) is a single or a laminate of a transparent plastic film other than a PVA film, having at least one layer of the plastic film with a transparent SO thin film 4 having a thickness of 100 to 5000 .ANG. formed on at least one side thereof, and at least one layer of a transparent heat-resistant film having the sum of the absolute values of the percentages of heat-shrinkage in the machine direction and transverse direction when heated at 150.degree. C. for 30 minutes, of not more than 1% and a light transmittance of not less than 85% by ASTM D-1003.
    Type: Grant
    Filed: July 29, 1992
    Date of Patent: September 13, 1994
    Assignee: Mitsubishi Kasei Corporation
    Inventors: Tsutomu Sawada, Shinichi Ohashi, Shigenobu Yoshida