Patents by Inventor Shigenori Fujikawa

Shigenori Fujikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240060397
    Abstract: An object of the present invention is to provide an apparatus for injecting carbon dioxide into underground capable of capturing carbon dioxide from the atmosphere and injecting it into underground in a harmless state and at a low cost, the apparatus including: a capturing unit configured to concentrate carbon dioxide directly from the atmosphere and capture concentrated carbon dioxide as a mixture gas; and an injection well connected to the capturing unit for pressurizing the mixture gas and injecting the mixture gas into an underground reservoir, in which the capturing unit adjusts a proportion of carbon dioxide in the mixture gas to 25% by volume or more.
    Type: Application
    Filed: December 27, 2021
    Publication date: February 22, 2024
    Applicant: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
    Inventors: Takeshi TSUJI, Shigenori FUJIKAWA
  • Patent number: 11547968
    Abstract: The present invention provides: a gas separation method which is capable of desirably separating a slight amount of a component from a mixed gas under mild conditions such that the pressure difference between both sides of a gas separation membrane is 1 atmosphere or less; and a gas separation membrane which is suitable for use in this gas separation method. According to the present invention, in a gas separation method wherein a specific gas (A) in a mixed gas, which contains the specific gas (A) at a concentration of 1,000 ppm by mass or less, is selectively permeated with use of a gas separation membrane, an extremely thin gas separation membrane that has a film thickness of 1 ?m or less is used, so that the gas (A) is desirably separated under mild conditions such that the pressure difference between both sides of the gas separation membrane is 1 atmosphere or less.
    Type: Grant
    Filed: August 3, 2018
    Date of Patent: January 10, 2023
    Assignees: TOKYO OHKA KOGYO CO., LTD., NANOMEMBRANE TECHNOLOGIES, INC.
    Inventors: Takuya Noguchi, Takahiro Senzaki, Toshiyuki Ogata, Toyoki Kunitake, Shigenori Fujikawa, Miho Ariyoshi
  • Publication number: 20210362091
    Abstract: The present invention provides: a gas separation method which is capable of desirably separating a slight amount of a component from a mixed gas under mild conditions such that the pressure difference between both sides of a gas separation membrane is 1 atmosphere or less; and a gas separation membrane which is suitable for use in this gas separation method. According to the present invention, in a gas separation method wherein a specific gas (A) in a mixed gas, which contains the specific gas (A) at a concentration of 1,000 ppm by mass or less, is selectively permeated with use of a gas separation membrane, an extremely thin gas separation membrane that has a film thickness of 1 ?m or less is used, so that the gas (A) is desirably separated under mild conditions such that the pressure difference between both sides of the gas separation membrane is 1 atmosphere or less.
    Type: Application
    Filed: August 3, 2018
    Publication date: November 25, 2021
    Applicants: TOKYO OHKA KOGYO CO., LTD., NanoMembrane Technologies, Inc.
    Inventors: Takuya NOGUCHI, Takahiro SENZAKI, Toshiyuki OGATA, Toyoki KUNITAKE, Shigenori FUJIKAWA, Miho ARIYOSHI
  • Patent number: 10751672
    Abstract: The present invention provides a gas-permeable membrane comprising a partial structure represented by formula (I) or formula (II), (wherein R1 and R2 each independently represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyloxy group having 2 to 6 carbon atoms, an aryl group or an aryloxy group, M1, M2 and M3 each independently represents a metal atom, m1 represents an integer, n1, n2 and n3 each independently represents an integer of 1 to 3, * represents a bonding hand), a composition for forming the gas-permeable membrane and a production process of the gas-permeable membrane.
    Type: Grant
    Filed: July 11, 2017
    Date of Patent: August 25, 2020
    Assignees: NANOMEMBRANE TECHNOLOGIES, INC., TOKYO OHKA KOGYO CO., LTD.
    Inventors: Shigenori Fujikawa, Selyanchyn Roman, Takahiro Senzaki, Takuya Noguchi, Toshiyuki Ogata
  • Publication number: 20180304207
    Abstract: A membrane filter including a thin film having a nanometer order thickness as a base, which is easy to increase in size, and which has sufficient strength. The membrane filter is formed by laminating a thin film having a thickness of 1 to 1,000 nm with a support film which is a porous film having a thickness of 1 to 1,000 ?m, which is made of a photosensitive composition or a cured product of the photosensitive composition, and has a plurality of hole portions penetrating in the thickness direction.
    Type: Application
    Filed: July 2, 2018
    Publication date: October 25, 2018
    Inventors: Takuya NOGUCHI, Toshiyuki OGATA, Toyoki KUNITAKE, Shigenori FUJIKAWA
  • Publication number: 20180021738
    Abstract: The present invention provides a gas-permeable membrane comprising a partial structure represented by formula (I) or formula (II), (wherein R1 and R2 each independently represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyloxy group having 2 to 6 carbon atoms, an aryl group or an aryloxy group, M1, M2 and M3 each independently represents a metal atom, m1 represents an integer, n1, n2 and n3 each independently represents an integer of 1 to 3, * represents a bonding hand), a composition for forming the gas-permeable membrane and a production process of the gas-permeable membrane.
    Type: Application
    Filed: July 11, 2017
    Publication date: January 25, 2018
    Applicants: NanoMembrane Technologies, Inc., Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Shigenori FUJIKAWA, Selyanchyn ROMAN, Takahiro SENZAKI, Takuya NOGUCHI, Toshiyuki OGATA
  • Publication number: 20160152008
    Abstract: A composite layer material including at least two laminated layers. One of outermost layers is a support film that is removable from another layer and has a self-supporting property.
    Type: Application
    Filed: July 9, 2014
    Publication date: June 2, 2016
    Inventors: Toshiyuki Ogata, Takuya Noguchi, Satoshi Fujimura, Shigenori Fujikawa
  • Publication number: 20150375176
    Abstract: A membrane filter including a thin film having a nanometer order thickness as a base, which is easy to increase in size, and which has sufficient strength. The membrane filter is formed by laminating a thin film having a thickness of 1 to 1,000 nm with a support film which is a porous film having a thickness of 1 to 1,000 ?m, which is made of a photosensitive composition or a cured product of the photosensitive composition, and has a plurality of hole portions penetrating in the thickness direction.
    Type: Application
    Filed: June 24, 2015
    Publication date: December 31, 2015
    Inventors: Takuya Noguchi, Toshiyuki Ogata, Toyoki Kunitake, Shigenori Fujikawa
  • Patent number: 9134617
    Abstract: A solvent developing negative-tone resist composition containing a base component (A) which exhibits increased polarity and reduced solubility in an organic solvent under action of an acid and an acid generator component (B) which generates an acid upon exposure, the component (A) including a resin component (A1) containing: a structural unit (a2) derived from an acrylate ester containing a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group or a 5- to 7-membered carbonate-containing cyclic group; and a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibited increased polarity by the action of acid, and the acid generator component (B) including an acid generator (B1) containing a compound which generates a sulfonic acid upon exposure.
    Type: Grant
    Filed: June 8, 2012
    Date of Patent: September 15, 2015
    Assignees: TOKYO OHKA KOGYO CO., LTD., RIKEN
    Inventors: Takahiro Senzaki, Ken Miyagi, Shigenori Fujikawa, Mari Koizumi, Harumi Hayakawa
  • Patent number: 9060415
    Abstract: A method for producing a substrate having a surface nanostructure, including a forming, on a substrate, a layer containing a block copolymer having a plurality of blocks bonded together, and subsequently heating this layer to cause phase separation of the layer; a decomposing at least a portion of the phase including at least one block of the plurality of blocks that constitute the block copolymer of this layer; and immersing the layer in a developing solution and selectively removing the phase containing the decomposed block(s), the developing solution containing, as the main component, an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2 and a vapor pressure at 25° C. that is less than 2.1 kPa, or benzene which may be substituted with an alkyl group, an alkoxy group or a halogen atom.
    Type: Grant
    Filed: February 15, 2012
    Date of Patent: June 16, 2015
    Assignees: Riken, Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Shigenori Fujikawa, Harumi Hayakawa, Takahiro Senzaki, Ken Miyagi
  • Patent number: 9051648
    Abstract: A method of producing a substrate provided with a metal nanostructure on the surface thereof, including: forming a layer containing a block copolymer having a plurality of polymers bonded on a surface of a substrate, and subjecting the layer to phase separation, selectively removing a phase of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer to expose part of the surface of the substrate, and allowing a metal ion to come into contact with the exposed surface of the substrate to effect an electrochemical reaction between the surface of the substrate and the metal ion, thereby depositing a metal on the surface of the substrate; and a substrate provided with a metal nanostructure on the surface thereof produced by the same method.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: June 9, 2015
    Assignees: Riken, Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Shigenori Fujikawa, Mari Koizumi, Takahiro Senzaki, Takahiro Dazai, Ken Miyagi
  • Patent number: 9029262
    Abstract: A method of forming a contact hole pattern, including: a block copolymer layer forming step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate having on a surface thereof a thin film with a hole pattern formed, so as to cover the thin film; a phase separation step in which the layer containing the block copolymer is subjected to phase separation; a selective removing step in which phase of at least one block of the plurality of blocks constituting the block copolymer is removed, wherein hole diameter of the hole pattern formed on the thin film is 0.8 to 3.1 times period of the block copolymer, and in the layer forming step, thickness between upper face of the thin film and surface of the layer containing the block copolymer is 70% or less of thickness of the thin film.
    Type: Grant
    Filed: February 7, 2013
    Date of Patent: May 12, 2015
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Takahiro Senzaki, Ken Miyagi, Shigenori Fujikawa
  • Patent number: 8999631
    Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: April 7, 2015
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
  • Patent number: 8961802
    Abstract: A method of forming a fine pattern, including: a phase separation step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate, and then the layer is heated for phase separation of the layer; a decomposition step in which at least a portion of a phase of at least one block of the plurality of blocks constituting the block copolymer is decomposed; a selective removal step in which the layer is immersed in a developing solution to selectively remove a phase containing decomposed blocks to form a nano structure; and an etching step in which the substrate is subjected to etching by using the nano structure as a mask; and a main component of the developing solution is an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2, and having vapor pressure of less than 2.1 kPa at 25° C., or is benzene that may be substituted by an alkyl group, an alkoxy group, or a halogen atom, and the developing solution further contains metal alkoxide.
    Type: Grant
    Filed: June 26, 2013
    Date of Patent: February 24, 2015
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Shigenori Fujikawa, Harumi Hayakawa, Takahiro Senzaki, Ken Miyagi
  • Patent number: 8956810
    Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: February 17, 2015
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
  • Publication number: 20140127626
    Abstract: A negative tone-development resist composition for forming a guide pattern, including a base component (A) and an acid generator component (B), the base component (A) including a resin component (A1) having a structural unit (a1) derived from an acrylate ester containing an acid dissociable group, and at least one of the following structural units (a2): a structural unit derived from an acrylic acid ester containing a lactone-containing cyclic group, a structural unit derived from an acrylic acid ester containing an ether-containing cyclic group and a structural unit derived from an acrylic acid ester containing a carbonate-containing cyclic group, and a constituent unit (a1) derived from an acrylic acid ester containing an acid-labile group, the acid generator component (B) including an acid generator (B1) including at least one compound represented by general formula (b1) or (b2) shown below
    Type: Application
    Filed: October 5, 2011
    Publication date: May 8, 2014
    Applicants: RIKEN, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Mari Koizumi, Harumi Hayakawa
  • Publication number: 20140113236
    Abstract: A solvent developing negative-tone resist composition containing a base component (A) which exhibits increased polarity and reduced solubility in an organic solvent under action of an acid and an acid generator component (B) which generates an acid upon exposure, the component (A) including a resin component (A1) containing: a structural unit (a2) derived from an acrylate ester containing a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group or a 5- to 7-membered carbonate-containing cyclic group; and a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibited increased polarity by the action of acid, and the acid generator component (B) including an acid generator (B1) containing a compound which generates a sulfonic acid upon exposure.
    Type: Application
    Filed: June 8, 2012
    Publication date: April 24, 2014
    Applicants: Riken, Tokyo Ohka Kogyo Co., Ltd
    Inventors: Takahiro Senzaki, Ken Miyagi, Shigenori Fujikawa, Mari Koizumi, Harumi Hayakawa
  • Publication number: 20140054265
    Abstract: A method of forming a fine pattern, including: a phase separation step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate, and then the layer is heated for phase separation of the layer; a decomposition step in which at least a portion of a phase of at least one block of the plurality of blocks constituting the block copolymer is decomposed; a selective removal step in which the layer is immersed in a developing solution to selectively remove a phase containing decomposed blocks to form a nano structure; and an etching step in which the substrate is subjected to etching by using the nano structure as a mask; and a main component of the developing solution is an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2, and having vapor pressure of less than 2.1 kPa at 25° C., or is benzene that may be substituted by an alkyl group, an alkoxy group, or a halogen atom, and the developing solution further contains metal alkoxide.
    Type: Application
    Filed: June 26, 2013
    Publication date: February 27, 2014
    Applicants: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Shigenori Fujikawa, Harumi Hayakawa, Takahiro Senzaki, Ken Miyagi
  • Publication number: 20140030652
    Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.
    Type: Application
    Filed: September 12, 2011
    Publication date: January 30, 2014
    Applicants: Riken, Tokyo Ohka Kogyo Co.,Ltd.
    Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
  • Publication number: 20130313223
    Abstract: A method for producing a substrate having a surface nanostructure, including a forming, on a substrate, a layer containing a block copolymer having a plurality of blocks bonded together, and subsequently heating this layer to cause phase separation of the layer; a decomposing at least a portion of the phase including at least one block of the plurality of blocks that constitute the block copolymer of this layer; and immersing the layer in a developing solution and selectively removing the phase containing the decomposed block(s), the developing solution containing, as the main component, an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2 and a vapor pressure at 25° C. that is less than 2.1 kPa, or benzene which may be substituted with an alkyl group, an alkoxy group or a halogen atom.
    Type: Application
    Filed: February 15, 2012
    Publication date: November 28, 2013
    Applicants: TOKYO OHKA KOGYO CO., LTD., RIKEN
    Inventors: Shigenori Fujikawa, Harumi Hayakawa, Takahiro Senzaki, Ken Miyagi