Patents by Inventor Shigenori Nakano
Shigenori Nakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11661373Abstract: To provide a method for recycling a solar cell module glass, which enables development of other novel applications of a waste glass of a solar cell module while controlling an elution amount of Sb from the waste glass into water. Disclosed is a method for recycling a solar cell module glass, the method comprising: grinding a solar cell module glass into a glass powder; adding at least one foaming agent selected from SiC, CaCO3 and a seashell, and a particular inhibitor to the glass powder to produce a mixture; and heating the mixture to 700 to 1,100° C. to produce a foam glass.Type: GrantFiled: November 10, 2020Date of Patent: May 30, 2023Assignee: Tottori Resource Recycling Inc.Inventors: Shigenori Nakano, Hiroki Tanaka
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Publication number: 20210053868Abstract: To provide a method for recycling a solar cell module glass, which enables development of other novel applications of a waste glass of a solar cell module while controlling an elution amount of Sb from the waste glass into water. Disclosed is a method for recycling a solar cell module glass, the method comprising: grinding a solar cell module glass into a glass powder; adding at least one foaming agent selected from SiC, CaCO3 and a seashell, and a particular inhibitor to the glass powder to produce a mixture; and heating the mixture to 700 to 1,100° C. to produce a foam glass.Type: ApplicationFiled: November 10, 2020Publication date: February 25, 2021Inventors: Shigenori NAKANO, Hiroki TANAKA
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Patent number: 10865137Abstract: To provide a method for recycling a solar cell module glass, which enables development of other novel applications of a waste glass of a solar cell module while controlling an elution amount of Sb from the waste glass into water. Disclosed is a method for recycling a solar cell module glass, the method comprising: grinding a solar cell module glass into a glass powder; adding at least one foaming agent selected from SiC, CaCO3 and a seashell, and a particular inhibitor to the glass powder to produce a mixture; and heating the mixture to 700 to 1,100° C. to produce a foam glass.Type: GrantFiled: September 21, 2018Date of Patent: December 15, 2020Assignee: Tottori Resource Recycling Inc.Inventors: Shigenori Nakano, Hiroki Tanaka
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Publication number: 20200148585Abstract: To provide a method for recycling a solar cell module glass, which enables development of other novel applications of a waste glass of a solar cell module while controlling an elution amount of Sb from the waste glass into water. Disclosed is a method for recycling a solar cell module glass, the method comprising: grinding a solar cell module glass into a glass powder; adding at least one foaming agent selected from SiC, CaCO3 and a seashell, and a particular inhibitor to the glass powder to produce a mixture; and heating the mixture to 700 to 1,100° C. to produce a foam glass.Type: ApplicationFiled: September 21, 2018Publication date: May 14, 2020Inventors: Shigenori NAKANO, Hiroki TANAKA
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Patent number: 9120920Abstract: Provided is a polymer composition including (A) an ionomer containing an ethylene/?,?-unsaturated carboxylic acid copolymer and an ethylene/?,?-unsaturated carboxylic acid/?,?-unsaturated carboxylic acid ester terpolymer, and (B) a propylene-based polymer, wherein the mass of constituent units derived from the ?,?-unsaturated carboxylic acid ester is from 1 to 4.5% by mass of the entire mass of the ionomer. Through this, a high seal strength may be obtained in a high-temperature range when forming a lock seal, while a high seal strength, as compared with the related art, can be stably obtained over a wide temperature range with a temperature dependence suppressed when forming a peelable seal.Type: GrantFiled: May 27, 2009Date of Patent: September 1, 2015Assignee: Du Pont-Mitsui Polychemicals Co., Ltd.Inventors: Shigenori Nakano, Kaoru Suzuki, Toshihisa Toyoda
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Patent number: 8921488Abstract: The present invention provides a resin composition for extrusion coating, the composition including (1) at least one of a copolymer of ethylene and ?,?-unsaturated carboxylic acid or an ionomer thereof and (2) a homopolypropylene, wherein a content of the component (2) is 3 to 12% by mass based on the total mass of the component (1) and the component (2) and has a melt flow rate (at a load of 2160 g and 190° C., JIS K7210) of 4.0 g/10 min. or more.Type: GrantFiled: December 14, 2011Date of Patent: December 30, 2014Assignee: Du Pont-Mitsui Polychemicals Co., Ltd.Inventors: Shigenori Nakano, Kaoru Suzuki
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Patent number: 8716405Abstract: The present invention provides a resin composition including (1) at least one selected from the group consisting of ethylene-?,?-unsaturated carboxylic acid copolymers and ionomers thereof, which have a melt flow rate of from 0.5 g/10 min to 6 g/10 min, (2) at least one selected from the group consisting of ethylene-?,?-unsaturated carboxylic acid copolymers and ionomers thereof, which have a melt flow rate of from 10 g/10 min to 30 g/10 min, and (3) at least one selected from the group consisting of propylene homopolymers and copolymers obtained by copolymerization using propylene and one or more ?-olefins excluding propylene, in which a structural unit derived from an ?,?-unsaturated carboxylic acid ester is substantially not contained in the total amount of the ethylene-?,?-unsaturated carboxylic acid copolymers and the ionomers thereof.Type: GrantFiled: May 27, 2011Date of Patent: May 6, 2014Assignee: Du Pont-Mitsui Polychemicals Co. Ltd.Inventors: Shigenori Nakano, Kaoru Suzuki
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Publication number: 20130337279Abstract: The present invention provides a resin composition for extrusion coating, the composition including (1) at least one of a copolymer of ethylene and ?,?-unsaturated carboxylic acid or an ionomer thereof and (2) a homopolypropylene, wherein a content of the component (2) is 3 to 12% by mass based on the total mass of the component (1) and the component (2) and has a melt flow rate (at a load of 2160 g and 190° C., JIS K7210) of 4.0 g/10 min, or more.Type: ApplicationFiled: December 14, 2011Publication date: December 19, 2013Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.Inventors: Shigenori Nakano, Kaoru Suzuki
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Publication number: 20130079457Abstract: The present invention provides a resin composition including (1) at least one selected from the group consisting of ethylene-?,?-unsaturated carboxylic acid copolymers and ionomers thereof, which have a melt flow rate of from 0.5 g/10 min to 6 g/10 min, (2) at least one selected from the group consisting of ethylene-?,?-unsaturated carboxylic acid copolymers and ionomers thereof, which have a melt flow rate of from 10 g/10 min to 30 g/10 min, and (3) at least one selected from the group consisting of propylene homopolymers and copolymers obtained by copolymerization using propylene and one or more ?-olefins excluding propylene, in which a structural unit derived from an ?,?-unsaturated carboxylic acid ester is substantially not contained in the total amount of the ethylene-?,?-unsaturated carboxylic acid copolymers and the ionomers thereof.Type: ApplicationFiled: May 27, 2011Publication date: March 28, 2013Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.Inventors: Shigenori Nakano, Kaoru Suzuki
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Publication number: 20120108754Abstract: Provided is a polymer composition that contains an ionomer which includes an ethylene-?,?-unsaturated carboxylic acid copolymer and a ternary polymer of ethylene-?,?-unsaturated carboxylic acid-?,?-unsaturated carboxylic acid ester, and a propylene-based polymer, wherein a melt flow rate (MFR) value (under a load of 2160 g) of the ionomer at a process temperature in forming a film by T-die melting casting method is from 50% to 250% based on an MFR value of the propylene-based polymer under the same condition.Type: ApplicationFiled: June 30, 2010Publication date: May 3, 2012Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.Inventors: Shigenori Nakano, Kaoru Suzuki, Toshihisa Toyoda
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Publication number: 20110071259Abstract: Provided is a polymer composition including (A) an ionomer containing an ethylene/?,?-unsaturated carboxylic acid copolymer and an ethylene/?,?-unsaturated carboxylic acid/?,?-unsaturated carboxylic acid ester terpolymer, and (B) a propylene-based polymer, wherein the mass of constituent units derived from the ?,?-unsaturated carboxylic acid ester is from 1 to 4.5% by mass of the entire mass of the ionomer. Through this, a high seal strength may be obtained in a high-temperature range when forming a lock seal, while a high seal strength, as compared with the related art, can be stably obtained over a wide temperature range with a temperature dependence suppressed when forming a peelable seal.Type: ApplicationFiled: May 27, 2009Publication date: March 24, 2011Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.Inventors: Shigenori Nakano, Kaoru Suzuki, Toshihisa Toyoda
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Publication number: 20110034633Abstract: A process for manufacturing a thermoplastic resin composition including 73 to 95.5 parts by weight of (A) an ionomer wherein 20 to 90% of carboxyl group of ethylene/(meth)acrylic acid copolymer is neutralized by metal ion; 0.5 to 7 parts by weight of (B) a copolymer of ethylene or ?-olefin, containing glycidyl (meth)acrylate or unsaturated glycidyl ether, optionally further containing vinyl ester or unsaturated carboxylic acid ester; and 4 to 20 parts by weight of (C) propylene/?-olefin copolymer, the process including melt-blending the ionomer (A) with melt-blended mixture of (B) the copolymer of ethylene or ?-olefin, containing glycidyl (meth)acrylate or glycidyl unsaturated ether, or optionally further containing vinyl ester or unsaturated carboxylic acid ester and (C) the propylene/?-olefin copolymer.Type: ApplicationFiled: October 5, 2010Publication date: February 10, 2011Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.Inventors: Shigenori Nakano, Nobuyuki Maki, Chikara Ichinoseki
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Publication number: 20080176062Abstract: The present invention relates to a thermoplastic resin composition comprising (A) ionomer of ethylene/(meth)acrylic acid copolymer 60 to 96.7% by weight, (B) ethylene or alpha-olefin/glycidyl monomer copolymer 0.3 to 10% by weight and (C) propylene/alpha-olefin copolymer 3 to 30% by weight. The resin composition has excellent processability, workability, visual qualities, abrasion resistance, scratch resistance, surface hardness, stain resistance, heat resistance, etc, and is usable for building materials such as handrails, flooring materials and wall papers; car interior-exterior parts, toys, stationery, sundries, etc.Type: ApplicationFiled: December 31, 2007Publication date: July 24, 2008Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.Inventors: Shigenori Nakano, Nobuyuki Maki, Chikara Ichinoseki
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Publication number: 20060189758Abstract: The present invention relates to a thermoplastic resin composition comprising (A) ionomer of ethylene/(meth)acrylic acid copolymer 60 to 96.7% by weight, (B) ethylene or alpha-olefin/glycidyl monomer copolymer 0.3 to 10% by weight and (C) propylene/alpha-olefin copolymer 3 to 30% by weight. The resin composition has excellent processability, workability, visual qualities, abrasion resistance, scratch resistance, surface hardness, stain resistance, heat resistance, etc, and is usable for building materials such as handrails, flooring materials and wall papers; car interior-exterior parts, toys, stationery, sundries, etc.Type: ApplicationFiled: February 7, 2003Publication date: August 24, 2006Inventors: Shigenori Nakano, Nobuyuki Maki, Chikara Ichinoseki
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Publication number: 20060057318Abstract: The present invention relates to a multi-layer structure constructed of two or more layers including a potassium ionomer layer (X) having a low surface resistivity and a layer (Y) comprising a polymer material having a high surface resistivity like LLDPE as a surface layer, where the static charge decay characteristics of the layer (Y) is improved. This type of two layer or three layer structure having the layer (X) as its intermediate layer or another surface layer gives good slip characteristics, abrasion resistance, and dust-free characteristics, and hence is useful for packaging materials, such as films, sheets and containers.Type: ApplicationFiled: December 27, 2002Publication date: March 16, 2006Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.Inventors: Hitoshi Tachino, Nobuyuki Maki, Shigenori Nakano, Kensaku Takahashi, Hidenori Hashimoto