Abstract: A method for growing a GaInNAs layer on a supporting base comprises the steps of supplying antimony to the surface of a supporting base, and growing a GaInNAs layer on the surface after supplying the antimony. The GaInNAs layer is grown after supplying the antimony. In the step of supplying the antimony, raw materials comprising Group V elements are simultaneously supplied in addition to the antimony. The Group V elements are at least either arsenic (As) or phosphorus (P). The GaInNAs layer is grown by any of the MOCVD method, MBE method, or epitaxial growth method.

Abstract: The semiconductor optical device is provided with an optical waveguide part and an optical amplification part respectively provided on the GaAs semiconductor substrate. The optical amplification part includes at least one semiconductor optical amplifier. The optical waveguide part includes optical elements including optical waveguides. The optical waveguides are optically connected to the semiconductor optical amplifier. The semiconductor optical amplifier is provided with an active layer including a GaxIn1−xNyAs1−y semiconductor, a first conductive type clad layer and a second conductive type clad layer respectively with the active layer between them. The optical waveguides are respectively provided with a core semiconductor layer including at least either of a GaInNAs semiconductor or a GaAs semiconductor, a first clad semiconductor layer and a second clad semiconductor layer respectively with the core semiconductor layer between them.

Abstract: A high performance epitaxial wafer which is useful, for example in a light emitting device is produced with a buffer layer. The epitaxial wafer has a substrate of a compound semiconductor selected from a group consisting of GaAs, GaP, InAs and InP. The buffer layer of GaN is grown on the substrate to a thickness within the range of 10 nm to 80 nm. An epitaxial layer of GaN is formed on the buffer layer. The buffer layer is grown at a first temperature by organic metal chloride vapor phase epitaxy, while the epitaxial layer is grown at a second temperature, which is higher than the first temperature, by the organic metal chloride vapor phase epitaxy.