Patents by Inventor Shigeo Hamaguchi
Shigeo Hamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9410047Abstract: An antifouling article characterized by having a cured condensed coating film of a perfluoropolyether group-containing silane represented by general formula [1] on the surface of a substrate and by having a fluorine concentration of the cured condensed coating film of 0.2-2.0 ?g/cm2.Type: GrantFiled: January 12, 2012Date of Patent: August 9, 2016Assignee: Central Glass Company, LimitedInventors: Yohei Sato, Shigeo Hamaguchi
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Publication number: 20160215169Abstract: A water repellent liquid for forming water repellent film. The liquid is provided containing: fluoroalkylsilane compound represented by general formula 1 where “m” is an integer between 2 and 7, “n” is an integer between 1 and 5, “X” is mutually independently at least one group selected from the group consisting of alkoxy group, chloro group, isocyanate group and hydroxyl group, and “p” is an integer between 1 and 3; silicon compound represented by general formula 2 R12SiY2 ??2 where “R1” mutually independently represents a C1-C20 hydrocarbon group, “Y” mutually independently represents at least one group selected from the group consisting of alkoxy group, chloro group, isocyanate group and hydroxyl group, and “R1” may be a branched hydrocarbon group or a cyclic hydrocarbon group; organic solvent; water; and acid. In this liquid the mass ratio of the fluoroalkylsilane compound to the silicon compound is between 1:0.1 and 1:20.Type: ApplicationFiled: January 20, 2016Publication date: July 28, 2016Inventors: Hiroshi NOMURA, Shigeo HAMAGUCHI
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Patent number: 9281178Abstract: A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.Type: GrantFiled: December 20, 2013Date of Patent: March 8, 2016Assignee: Central Glass Company, LimitedInventors: Soichi Kumon, Takashi Saio, Shinobu Arata, Hidehisa Nanai, Yoshinori Akamatsu, Shigeo Hamaguchi, Kazuhiko Maeda
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Patent number: 9053924Abstract: A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.Type: GrantFiled: October 5, 2010Date of Patent: June 9, 2015Assignee: Central Glass Company, LimitedInventors: Soichi Kumon, Takashi Saio, Shinobu Arata, Hidehisa Nanai, Yoshinori Akamatsu, Shigeo Hamaguchi, Kazuhiko Maeda
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Publication number: 20140174465Abstract: A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.Type: ApplicationFiled: December 20, 2013Publication date: June 26, 2014Applicant: Central Glass Company, LimitedInventors: Soichi KUMON, Takashi SAIO, Shinobu ARATA, Hidehisa NANAI, Yoshinori AKAMATSU, Shigeo HAMAGUCHI, Kazuhiko MAEDA
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Patent number: 8623464Abstract: According to a first aspect of the present invention, a process for production of a water-absorbing article including a substrate and a coating film formed on the substrate and formed of a water-absorbing urethane resin is characterized in that: the process comprises an application step of applying a coating liquid to the substrate; the application step includes a step of supplying the coating liquid from a nozzle disposed above the substrate to a surface of the substrate conveyed horizontally; the coating liquid includes a solid matter and a solvent; the solid matter includes a mixture of a polyisocyanate, a polyol having ethylene oxide and a hydrophobic polyol; a concentration of the solid matter in the coating liquid is adjusted within a range from 5 to 30% in mass; and a viscosity of the coating liquid is adjusted within a range from 1 to 3 mPa·s.Type: GrantFiled: February 24, 2009Date of Patent: January 7, 2014Assignee: Central Glass Company, LimitedInventors: Shigeo Hamaguchi, Yukihiro Ougitani, Yoshinori Akamatsu, Shinobu Arata
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Publication number: 20130303689Abstract: An antifouling article characterized by having a cured condensed coating film of a perfluoropolyether group-containing silane represented by general formula [1] on the surface of a substrate and by having a fluorine concentration of the cured condensed coating film of 0.2-2.0 ?g/cm2.Type: ApplicationFiled: January 1, 2012Publication date: November 14, 2013Applicant: Central Glass Company, LimitedInventors: Yohei Sato, Shigeo Hamaguchi
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Patent number: 8561571Abstract: A method of applying a coating solution onto an upper surface of a glass plate that is transported in a substantially horizontal attitude, according to the first aspect of the present invention, the method including the steps of transporting the glass plate into a coating chamber, and opening the plurality of coating nozzles which are positioned in a row at constant intervals therebetween along a curved shape of the upper surface of the glass plate in a width direction of the glass plate perpendicular to the direction of transporting the glass plate by the nozzle position adjusting means and the nozzle height adjusting means, to thereby inject the coating solution when the coating nozzles are located in a region of the upper surface of the glass plate which extends from the leading edge of the glass plate to the rear edge of the glass plate.Type: GrantFiled: January 21, 2009Date of Patent: October 22, 2013Assignee: Central Glass Company, LimitedInventors: Takafumi Shioi, Tadaaki Nakano, Shigeo Hamaguchi, Yoshinori Akamatsu, Nobuyuki Itakura
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Patent number: 8299169Abstract: A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater.Type: GrantFiled: April 28, 2008Date of Patent: October 30, 2012Assignee: Central Glass Company, LimitedInventors: Masanori Saito, Shigeo Hamaguchi, Soichi Kumon, Yoshinori Akamatsu
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Patent number: 8246848Abstract: There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.Type: GrantFiled: September 21, 2006Date of Patent: August 21, 2012Assignee: Central Glass Company, LimitedInventors: Masanori Saito, Shigeo Hamaguchi, Yoshinori Akamatsu, Soichi Kumon
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Patent number: 8216670Abstract: A heat ray shielding glass for vehicle, including a glass substrate and a heat ray shielding film formed on at least one surface of the glass substrate, in which the heat ray shielding film includes: conductive oxide ultrafine particles dispersed in the film; and a silica binder for binding the ultrafine particles to each other, the silica binder including solid contents produced by hydrolysis and polycondensation of tetraalkoxysilane and trialkoxysilane.Type: GrantFiled: August 22, 2007Date of Patent: July 10, 2012Assignee: Central Glass Company, LimitedInventors: Soichi Kumon, Shigeo Hamaguchi, Masanori Saito, Yoshinori Akamatsu
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Publication number: 20110214685Abstract: A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.Type: ApplicationFiled: October 5, 2010Publication date: September 8, 2011Applicant: CENTRAL GLASS COMPANY, LIMITEDInventors: Soichi KUMON, Takashi Saio, Shinobu Arata, Hidehisa Nanai, Yoshinori Akamatsu, Shigeo Hamaguchi, Kazuhiko Maeda
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Publication number: 20100310778Abstract: A method of applying a coating solution onto an upper surface of a glass plate that is transported in a substantially horizontal attitude, according to the first aspect of the present invention, the method including the steps of transporting the glass plate into a coating chamber, and opening the plurality of coating nozzles which are positioned in a row at constant intervals therebetween along a curved shape of the upper surface of the glass plate in a width direction of the glass plate perpendicular to the direction of transporting the glass plate by the nozzle position adjusting means and the nozzle height adjusting means, to thereby inject the coating solution when the coating nozzles are located in a region of the upper surface of the glass plate which extends from the leading edge of the glass plate to the rear edge of the glass plate.Type: ApplicationFiled: January 21, 2009Publication date: December 9, 2010Applicant: Central Glass Company, LimitedInventors: Takafumi Shioi, Tadaaki Nakano, Shigeo Hamaguchi, Yoshinori Akamatsu, Nobuyuki Itakura
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Publication number: 20100310779Abstract: According to a first aspect of the present invention, a process for production of a water-absorbing article including a substrate and a coating film formed on the substrate and formed of a water-absorbing urethane resin is characterized in that: the process comprises an application step of applying a coating liquid to the substrate; the application step includes a step of supplying the coating liquid from a nozzle disposed above the substrate to a surface of the substrate conveyed horizontally; the coating liquid includes a solid matter and a solvent; the solid matter includes a mixture of a polyisocyanate, a polyol having ethylene oxide and a hydrophobic polyol; a concentration of the solid matter in the coating liquid is adjusted within a range from 5 to 30% in mass; and a viscosity of the coating liquid is adjusted within a range from 1 to 3 mPa·s.Type: ApplicationFiled: February 24, 2009Publication date: December 9, 2010Applicant: Central Glass Company , LimitedInventors: Shigeo Hamaguchi, Yukihiro Ougitani, Yoshinori Akamatsu, Shinobu Arata
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Publication number: 20100227159Abstract: [Problems] To develop a heat ray shielding glass usable as a vehicle glass having up-and-down function, the heat ray shielding glass having a film hardness and generating no abnormal noise by friction due to up-and-down movement. [Means for Solving Problems] A heat ray shielding glass for vehicle, including a glass substrate and a heat ray shielding film formed on at least one surface of the glass substrate, in which the heat ray shielding film includes: conductive oxide ultrafine particles dispersed in the film; and a silica binder for binding the ultrafine particles to each other, the silica binder including solid contents produced by hydrolysis and polycondensation of tetraalkoxysilane and trialkoxysilane.Type: ApplicationFiled: August 22, 2007Publication date: September 9, 2010Applicant: Central Glass Company Company LimitedInventors: Soichi Kumon, Shigeo Hamaguchi, Masanori Saito, Yoshinori Akamatsu
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Publication number: 20100143600Abstract: A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater.Type: ApplicationFiled: April 28, 2008Publication date: June 10, 2010Applicant: Central Glass Company, LimitedInventors: Masanori Saito, Shigeo Hamaguchi, Soichi Kumon, Yoshinori Akamatsu
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Publication number: 20090087573Abstract: There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.Type: ApplicationFiled: September 21, 2006Publication date: April 2, 2009Inventors: Masanori Saito, Shigeo Hamaguchi, Yoshinori Akamatsu, Soichi Kumon
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Patent number: 7452605Abstract: The invention relates to an article superior in slipping a waterdrop down a surface of the article. This article includes a substrate; and a functional film formed on a surface of the substrate. This functional film contains (a) a silica matrix; and (b) a component for providing the slipping. This component is dispersed in the silica matrix and contains a special, alkoxy group-terminated, dimethyl silicone.Type: GrantFiled: March 29, 2002Date of Patent: November 18, 2008Assignee: Central Glass Company, LimitedInventors: Yoshinori Akamatsu, Soichi Kumon, Hiroaki Arai, Shigeo Hamaguchi, Yukihiro Ogitani
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Publication number: 20080026163Abstract: The present invention relates to a treatment agent for obtaining a water slidable film, which is obtained by mixing a straight-chain polydimethylsiloxane having two or three of hydrolysable functional groups at at least one end and having 30-400 of dimethylsiloxane units (Si(CH3)2O), a fluoroalkylsilane having a hydrolysable functional group and having 6-12 of fluorocarbon units (CF2 or CF3), and a solution containing an organic solvent, an acid and water. This treatment agent is characterized in that, based on the total amount of the treatment agent, in terms of weight concentration, 0.2-3.0 wt % of the straight-chain polydimethylsiloxane, 0.2-2.0 wt % of the fluoroalkylsilane, and 0.5-3.5 wt % of the total amount of the straight-chain polydimethylsiloxane and the fluoroalkylsilane are mixed together.Type: ApplicationFiled: August 1, 2005Publication date: January 31, 2008Applicant: CENTRAL GLASS COMPANY, LIMITEDInventors: Shigeo Hamaguchi, Soichi Kumon, Yoshinori Akamatsu, Masanori Saito
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Patent number: 6884512Abstract: The invention relates to an article superior in making a waterdrop slip down a surface of the article. This article includes a substrate; and a functional film formed on a surface of the substrate. This functional film contains: (a) a silica forming a matrix of the functional film; (b) a silylated-terminal dimethyl silicone represented by the general formula [A], the dimethyl silicone being in an amount of from 0.1 wt % to 10 wt %, based on a total weight of the silica; and (c) a fluoroalkylsilane represented by the general formula [B] B(CF2)rCH2CH2Si(CH3)3-s(O?s??[B].Type: GrantFiled: July 29, 2003Date of Patent: April 26, 2005Assignee: Central Glass Company, LimitedInventors: Yoshinori Akamatsu, Soichi Kumon, Kaname Hatakenaka, Haruki Kuramashi, Hiroaki Arai, Shigeo Hamaguchi