Patents by Inventor Shigeo Hamaguchi

Shigeo Hamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9410047
    Abstract: An antifouling article characterized by having a cured condensed coating film of a perfluoropolyether group-containing silane represented by general formula [1] on the surface of a substrate and by having a fluorine concentration of the cured condensed coating film of 0.2-2.0 ?g/cm2.
    Type: Grant
    Filed: January 12, 2012
    Date of Patent: August 9, 2016
    Assignee: Central Glass Company, Limited
    Inventors: Yohei Sato, Shigeo Hamaguchi
  • Publication number: 20160215169
    Abstract: A water repellent liquid for forming water repellent film. The liquid is provided containing: fluoroalkylsilane compound represented by general formula 1 where “m” is an integer between 2 and 7, “n” is an integer between 1 and 5, “X” is mutually independently at least one group selected from the group consisting of alkoxy group, chloro group, isocyanate group and hydroxyl group, and “p” is an integer between 1 and 3; silicon compound represented by general formula 2 R12SiY2 ??2 where “R1” mutually independently represents a C1-C20 hydrocarbon group, “Y” mutually independently represents at least one group selected from the group consisting of alkoxy group, chloro group, isocyanate group and hydroxyl group, and “R1” may be a branched hydrocarbon group or a cyclic hydrocarbon group; organic solvent; water; and acid. In this liquid the mass ratio of the fluoroalkylsilane compound to the silicon compound is between 1:0.1 and 1:20.
    Type: Application
    Filed: January 20, 2016
    Publication date: July 28, 2016
    Inventors: Hiroshi NOMURA, Shigeo HAMAGUCHI
  • Patent number: 9281178
    Abstract: A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: March 8, 2016
    Assignee: Central Glass Company, Limited
    Inventors: Soichi Kumon, Takashi Saio, Shinobu Arata, Hidehisa Nanai, Yoshinori Akamatsu, Shigeo Hamaguchi, Kazuhiko Maeda
  • Patent number: 9053924
    Abstract: A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
    Type: Grant
    Filed: October 5, 2010
    Date of Patent: June 9, 2015
    Assignee: Central Glass Company, Limited
    Inventors: Soichi Kumon, Takashi Saio, Shinobu Arata, Hidehisa Nanai, Yoshinori Akamatsu, Shigeo Hamaguchi, Kazuhiko Maeda
  • Publication number: 20140174465
    Abstract: A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
    Type: Application
    Filed: December 20, 2013
    Publication date: June 26, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Soichi KUMON, Takashi SAIO, Shinobu ARATA, Hidehisa NANAI, Yoshinori AKAMATSU, Shigeo HAMAGUCHI, Kazuhiko MAEDA
  • Patent number: 8623464
    Abstract: According to a first aspect of the present invention, a process for production of a water-absorbing article including a substrate and a coating film formed on the substrate and formed of a water-absorbing urethane resin is characterized in that: the process comprises an application step of applying a coating liquid to the substrate; the application step includes a step of supplying the coating liquid from a nozzle disposed above the substrate to a surface of the substrate conveyed horizontally; the coating liquid includes a solid matter and a solvent; the solid matter includes a mixture of a polyisocyanate, a polyol having ethylene oxide and a hydrophobic polyol; a concentration of the solid matter in the coating liquid is adjusted within a range from 5 to 30% in mass; and a viscosity of the coating liquid is adjusted within a range from 1 to 3 mPa·s.
    Type: Grant
    Filed: February 24, 2009
    Date of Patent: January 7, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Shigeo Hamaguchi, Yukihiro Ougitani, Yoshinori Akamatsu, Shinobu Arata
  • Publication number: 20130303689
    Abstract: An antifouling article characterized by having a cured condensed coating film of a perfluoropolyether group-containing silane represented by general formula [1] on the surface of a substrate and by having a fluorine concentration of the cured condensed coating film of 0.2-2.0 ?g/cm2.
    Type: Application
    Filed: January 1, 2012
    Publication date: November 14, 2013
    Applicant: Central Glass Company, Limited
    Inventors: Yohei Sato, Shigeo Hamaguchi
  • Patent number: 8561571
    Abstract: A method of applying a coating solution onto an upper surface of a glass plate that is transported in a substantially horizontal attitude, according to the first aspect of the present invention, the method including the steps of transporting the glass plate into a coating chamber, and opening the plurality of coating nozzles which are positioned in a row at constant intervals therebetween along a curved shape of the upper surface of the glass plate in a width direction of the glass plate perpendicular to the direction of transporting the glass plate by the nozzle position adjusting means and the nozzle height adjusting means, to thereby inject the coating solution when the coating nozzles are located in a region of the upper surface of the glass plate which extends from the leading edge of the glass plate to the rear edge of the glass plate.
    Type: Grant
    Filed: January 21, 2009
    Date of Patent: October 22, 2013
    Assignee: Central Glass Company, Limited
    Inventors: Takafumi Shioi, Tadaaki Nakano, Shigeo Hamaguchi, Yoshinori Akamatsu, Nobuyuki Itakura
  • Patent number: 8299169
    Abstract: A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: October 30, 2012
    Assignee: Central Glass Company, Limited
    Inventors: Masanori Saito, Shigeo Hamaguchi, Soichi Kumon, Yoshinori Akamatsu
  • Patent number: 8246848
    Abstract: There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: August 21, 2012
    Assignee: Central Glass Company, Limited
    Inventors: Masanori Saito, Shigeo Hamaguchi, Yoshinori Akamatsu, Soichi Kumon
  • Patent number: 8216670
    Abstract: A heat ray shielding glass for vehicle, including a glass substrate and a heat ray shielding film formed on at least one surface of the glass substrate, in which the heat ray shielding film includes: conductive oxide ultrafine particles dispersed in the film; and a silica binder for binding the ultrafine particles to each other, the silica binder including solid contents produced by hydrolysis and polycondensation of tetraalkoxysilane and trialkoxysilane.
    Type: Grant
    Filed: August 22, 2007
    Date of Patent: July 10, 2012
    Assignee: Central Glass Company, Limited
    Inventors: Soichi Kumon, Shigeo Hamaguchi, Masanori Saito, Yoshinori Akamatsu
  • Publication number: 20110214685
    Abstract: A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
    Type: Application
    Filed: October 5, 2010
    Publication date: September 8, 2011
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Soichi KUMON, Takashi Saio, Shinobu Arata, Hidehisa Nanai, Yoshinori Akamatsu, Shigeo Hamaguchi, Kazuhiko Maeda
  • Publication number: 20100310778
    Abstract: A method of applying a coating solution onto an upper surface of a glass plate that is transported in a substantially horizontal attitude, according to the first aspect of the present invention, the method including the steps of transporting the glass plate into a coating chamber, and opening the plurality of coating nozzles which are positioned in a row at constant intervals therebetween along a curved shape of the upper surface of the glass plate in a width direction of the glass plate perpendicular to the direction of transporting the glass plate by the nozzle position adjusting means and the nozzle height adjusting means, to thereby inject the coating solution when the coating nozzles are located in a region of the upper surface of the glass plate which extends from the leading edge of the glass plate to the rear edge of the glass plate.
    Type: Application
    Filed: January 21, 2009
    Publication date: December 9, 2010
    Applicant: Central Glass Company, Limited
    Inventors: Takafumi Shioi, Tadaaki Nakano, Shigeo Hamaguchi, Yoshinori Akamatsu, Nobuyuki Itakura
  • Publication number: 20100310779
    Abstract: According to a first aspect of the present invention, a process for production of a water-absorbing article including a substrate and a coating film formed on the substrate and formed of a water-absorbing urethane resin is characterized in that: the process comprises an application step of applying a coating liquid to the substrate; the application step includes a step of supplying the coating liquid from a nozzle disposed above the substrate to a surface of the substrate conveyed horizontally; the coating liquid includes a solid matter and a solvent; the solid matter includes a mixture of a polyisocyanate, a polyol having ethylene oxide and a hydrophobic polyol; a concentration of the solid matter in the coating liquid is adjusted within a range from 5 to 30% in mass; and a viscosity of the coating liquid is adjusted within a range from 1 to 3 mPa·s.
    Type: Application
    Filed: February 24, 2009
    Publication date: December 9, 2010
    Applicant: Central Glass Company , Limited
    Inventors: Shigeo Hamaguchi, Yukihiro Ougitani, Yoshinori Akamatsu, Shinobu Arata
  • Publication number: 20100227159
    Abstract: [Problems] To develop a heat ray shielding glass usable as a vehicle glass having up-and-down function, the heat ray shielding glass having a film hardness and generating no abnormal noise by friction due to up-and-down movement. [Means for Solving Problems] A heat ray shielding glass for vehicle, including a glass substrate and a heat ray shielding film formed on at least one surface of the glass substrate, in which the heat ray shielding film includes: conductive oxide ultrafine particles dispersed in the film; and a silica binder for binding the ultrafine particles to each other, the silica binder including solid contents produced by hydrolysis and polycondensation of tetraalkoxysilane and trialkoxysilane.
    Type: Application
    Filed: August 22, 2007
    Publication date: September 9, 2010
    Applicant: Central Glass Company Company Limited
    Inventors: Soichi Kumon, Shigeo Hamaguchi, Masanori Saito, Yoshinori Akamatsu
  • Publication number: 20100143600
    Abstract: A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater.
    Type: Application
    Filed: April 28, 2008
    Publication date: June 10, 2010
    Applicant: Central Glass Company, Limited
    Inventors: Masanori Saito, Shigeo Hamaguchi, Soichi Kumon, Yoshinori Akamatsu
  • Publication number: 20090087573
    Abstract: There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.
    Type: Application
    Filed: September 21, 2006
    Publication date: April 2, 2009
    Inventors: Masanori Saito, Shigeo Hamaguchi, Yoshinori Akamatsu, Soichi Kumon
  • Patent number: 7452605
    Abstract: The invention relates to an article superior in slipping a waterdrop down a surface of the article. This article includes a substrate; and a functional film formed on a surface of the substrate. This functional film contains (a) a silica matrix; and (b) a component for providing the slipping. This component is dispersed in the silica matrix and contains a special, alkoxy group-terminated, dimethyl silicone.
    Type: Grant
    Filed: March 29, 2002
    Date of Patent: November 18, 2008
    Assignee: Central Glass Company, Limited
    Inventors: Yoshinori Akamatsu, Soichi Kumon, Hiroaki Arai, Shigeo Hamaguchi, Yukihiro Ogitani
  • Publication number: 20080026163
    Abstract: The present invention relates to a treatment agent for obtaining a water slidable film, which is obtained by mixing a straight-chain polydimethylsiloxane having two or three of hydrolysable functional groups at at least one end and having 30-400 of dimethylsiloxane units (Si(CH3)2O), a fluoroalkylsilane having a hydrolysable functional group and having 6-12 of fluorocarbon units (CF2 or CF3), and a solution containing an organic solvent, an acid and water. This treatment agent is characterized in that, based on the total amount of the treatment agent, in terms of weight concentration, 0.2-3.0 wt % of the straight-chain polydimethylsiloxane, 0.2-2.0 wt % of the fluoroalkylsilane, and 0.5-3.5 wt % of the total amount of the straight-chain polydimethylsiloxane and the fluoroalkylsilane are mixed together.
    Type: Application
    Filed: August 1, 2005
    Publication date: January 31, 2008
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Shigeo Hamaguchi, Soichi Kumon, Yoshinori Akamatsu, Masanori Saito
  • Patent number: 6884512
    Abstract: The invention relates to an article superior in making a waterdrop slip down a surface of the article. This article includes a substrate; and a functional film formed on a surface of the substrate. This functional film contains: (a) a silica forming a matrix of the functional film; (b) a silylated-terminal dimethyl silicone represented by the general formula [A], the dimethyl silicone being in an amount of from 0.1 wt % to 10 wt %, based on a total weight of the silica; and (c) a fluoroalkylsilane represented by the general formula [B] B(CF2)rCH2CH2Si(CH3)3-s(O?s??[B].
    Type: Grant
    Filed: July 29, 2003
    Date of Patent: April 26, 2005
    Assignee: Central Glass Company, Limited
    Inventors: Yoshinori Akamatsu, Soichi Kumon, Kaname Hatakenaka, Haruki Kuramashi, Hiroaki Arai, Shigeo Hamaguchi