Patents by Inventor Shigeo Hozumi
Shigeo Hozumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6531521Abstract: A practically excellent method for preserving a photosensitive composition Containing a photopolymerization initiator and a photopolymerizable monomer and/or oligomer, which comprises placing and preserving the photosensitive composition in a light shielding vessel, wherein the product of the void ratio (%) in the vessel and the oxygen partial pressure (hPa) in the void part is 1500 (%·hPa) or more is provided; and the method imparts remarkably improved preservation stability.Type: GrantFiled: April 17, 2001Date of Patent: March 11, 2003Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Baba, Toshiya Inoue, Shigeo Hozumi
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Patent number: 6514669Abstract: A pigment-dispersion photo-sensitive coating solution comprising a binder resin, an organic-solvent and a main pigment dispersed in the solvent, wherein the combined area of peaks detected at a relative retention ratio in the range of 0.68 to 0.72 based on a retention time of dibutyl phthalate and peaks detected at a relative retention ratio in the range of 1.06 to 1.10 based on a retention time of dibutyl phthalate is not more than 50% of the total area of all peaks when the pigment is extracted by ethyl acetate and the extracts are analyzed by high-speed liquid chromatography using dibutyl phthalate as internal standard, is provided and use of the coating solution ensures that the colored image of stable quality is formed.Type: GrantFiled: December 13, 2000Date of Patent: February 4, 2003Assignee: Sumitomo Chemical Company, LimitedInventors: Kazuo Takebe, Takao Mori, Shigeo Hozumi
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Publication number: 20020025992Abstract: A practically excellent method for preserving a photosensitive composition Containing a photopolymerization initiator and a photopolymerizable monomer and/or oligomer, which comprises placing and preserving the photosensitive composition in a light shielding vessel, wherein the product of the void ratio (%) in the vessel and the oxygen partial pressure (hPa) in the void part is 1500 (%·hPa) or more is provided; and the method imparts remarkably improved preservation stability.Type: ApplicationFiled: April 17, 2001Publication date: February 28, 2002Inventors: Koji Baba, Toshiya Inoue, Shigeo Hozumi
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Patent number: 6344300Abstract: A color filter comprising a transparent substrate, a light-shielding layer patterned on said transparent substrate, and colored pixels of plural colors patterned on a portion of said substrate where said light-shielding layer is not formed, wherein said colored pixels of at least one color are formed from a photosensitive coloring composition comprising: (A) a pigment; (B) a copolymer of (meth)acrylic acid, as one monomer, and at least one other monomer; (C) a photopolymerizable monomer; (D) a photopolymerizable initiator; and (F) a solvent; and an acid value of a nonvolatile component of said photosensitive coloring composition is 25 through 60 mg KOH/g; and after forming the colored pixels from a photosensitive coloring composition, the light-shielding layer attains reflectance at 380 through 780 nm of 95% or more of reflectance thereof before coating the photosensitive coloring composition; and the transparent portion of the substrate attains transmittance at 380 through 780 nm of 99.Type: GrantFiled: December 20, 1999Date of Patent: February 5, 2002Assignee: Sumitomo Chemical Co., Ltd.Inventors: Koji Baba, Shigeo Hozumi
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Publication number: 20010004511Abstract: A pigment-dispersion photo-sensitive coating solution comprising a binder resin, an organic-solvent and a main pigment dispersed in the solvent, wherein the combined area of peaks detected at a relative retention ratio in the range of 0.68 to 0.72 based on a retention time of dibutyl phthalate and peaks detected at a relative retention ratio in the range of 1.06 to 1.10 based on a retention time of dibutyl phthalate is not more than 50% of the total area of all peaks when the pigment is extracted by ethyl acetate and the extracts are analyzed by high-speed liquid chromatography using dibutyl phthalate as internal standard, is provided and use of the coating solution ensures that the colored image of stable quality is formed.Type: ApplicationFiled: December 13, 2000Publication date: June 21, 2001Inventors: Kazuo Takebe, Takao Mori, Shigeo Hozumi
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Patent number: 5989778Abstract: A layer for protection coating and adhesion of DVD is formed by a photo-curing resin composition which comprises a photo-curing component which is cured by polymerization reaction of a unsaturated group, a photo-polymerization initiator and a phenol-based primary antioxidant, wherein this photo-curing component comprises a bi-functional urethane acrylate, an epoxy acrylate containing a bisphenol A skeleton, and a N-vinyl lactam compound, said polymerization initiator comprising a mono or di-benzoylphosphine oxide compound in an amount of 0.1% by weight or more to less than 5.0% by weight based on the total amount of said photo-curing components, and the viscosity of this resin composition at 25.degree. C. being in the range from 350 to 700 mPa.multidot.s.Type: GrantFiled: June 30, 1998Date of Patent: November 23, 1999Assignee: Sumitomo Chemical Company, LimitedInventor: Shigeo Hozumi
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Patent number: 5851700Abstract: A filter for a liquid crystal display device, having a light diffusing plate which is obtained by forming a composition in the form of a film which contains at least two photopolymerizable oligomers or monomers having refractive indexes which differ from each other by at least 0.01 and irradiating UV light on the composition. When the filter is fitted to a light emitting side of a liquid crystal display device, an angle of view of the liquid crystal display face plane is widened, shadows due to opaque parts of the device are reduced, and a Moire fringe is hardly formed.Type: GrantFiled: February 28, 1997Date of Patent: December 22, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Masaru Honda, Shigeo Hozumi, Shinichiro Kitayama
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Patent number: 5719008Abstract: A photoresist composition is disclosed which includes:(1) a photopolymerizable monomer represented by the following formula (I) or its derivative: ##STR1## wherein n represents a number of from 0 to 20; R.sub.1 and R.sub.2 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group or a cycloalkyl group; each of Q represents --OH or --OROCH.dbd.CH.sub.2 in which R represents an alkylene group, provided that the molar ratio of (--OH)/(--OROCH.dbd.CH.sub.2) is from 10/90 to 90/10; and A represents a divalent hydrocarbon group or a divalent group having Q on it;(2) a triazine compound having a methyl group substituted with one, two or three halogen atoms; and(3) a solvent,which can be used in photolithography or for producing a color filter.Type: GrantFiled: September 8, 1995Date of Patent: February 17, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Shigeo Hozumi, Hiroya Nakagawa
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Patent number: 5672463Abstract: A polyfunctional vinyl ether compound represented by formula (I): ##STR1## wherein n, which is an average repeating number, represents a number of from 0 to 20; R.sub.1 and R.sub.2 each independently represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group, or a cycloalkyl group; Q each independently represents --OH or a group represented by the formula --OROCH.dbd.CH.sub.2, wherein R represents an alkylene group having from 1 to 12 carbon atoms, the molar ratio of (--OH)/(--OROCH.dbd.CH.sub.2) being from 10/90 to 90/10; and A each independently represents a divalent hydrocarbon group having from 1 to 30 carbon atoms.Type: GrantFiled: October 20, 1995Date of Patent: September 30, 1997Assignee: Sumitomo Chemical Company, LimitedInventors: Shigeo Hozumi, Shinichiro Kitayama, Hiroya Nakagawa
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Patent number: 5510540Abstract: A polyfunctional vinyl ether compound represented by formula (I): ##STR1## wherein n, which is an average repeating number, represents a number of from 0 to 20; R.sub.1 and R.sub.2 each independently represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group, or a cycloalkyl group; Q each independently represents --OH or a group represented by the formula --OROCH.dbd.CH.sub.2, wherein R represents an alkylene group having from 1 to 12 carbon atoms, the molar ratio of (--OH)/(--OROCH.dbd.CH.sub.2) being from 10/90 to 90/10; and A each independently represents a divalent hydrocarbon group having from 1 to 30 carbon atoms.Type: GrantFiled: February 16, 1994Date of Patent: April 23, 1996Assignee: Sumitomo Chemical Company, LimitedInventors: Shigeo Hozumi, Shinichiro Kitayama, Hiroya Nakagawa
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Patent number: 5300592Abstract: A resin composition comprising a polymeleimide compound having two or more maleimide groups in one molecule, a phenol novolac resin of which phenolic hydroxyl groups are epoxidized and allyl-etherified and, as an optional ingredient, a curing agent, or a resin composition comprising a polymaleimide compound having two or more maleimide groups in one molecule, a phenol novolac resin of which phenolic hydroxyl groups are allyl-etherified and an epoxy resin; and a heat resistant composite material comprising cured product of said resin composition as its matrix phase and containing a fiber as its reinforcing material.Type: GrantFiled: November 4, 1992Date of Patent: April 5, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Shuichi Kanagawa, Kunimasa Kamio, Shigeo Hozumi, Hiroshi Nakamura, Masao Yamagiwa
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Patent number: 5137801Abstract: A process for producing a light control plate, which comprises(1) preparing an assembly composed of a film of a photopolymerizing composition and a light pervious body having a light scattering pervious pattern arranged along the surface of the film and (2) irradiating light to the assembly from that side of the assembly on which the light pervious body exists, thereby to polymerize the photopolymerizable composition of the film and to form a light control plate having a light pervious region through which light advances straightforwardly defined by the light scattering pervious pattern.Type: GrantFiled: June 1, 1990Date of Patent: August 11, 1992Assignees: Nippon Sheet Glass Co., Ltd., Sumitomo Chemical Company, LimitedInventors: Toshifumi Tsujino, Satoshi Ishizuka, Koichi Maeda, Shinichiro Kitayama, Shigeo Hozumi
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Patent number: 5112722Abstract: A method of producing a light control plate which induces scattering of light at different angles of incidence for different places. The method comprises (1) preparing an assembly comprising a film of a photo-polymerizable composition and a light-pervious body having a light-impervious pattern arranged along the surface of the film, (2) irradiating light limitedly to the assembly from that side where the light-pervious body at a limited angle while moving the assembly continuously in the planar direction of the film thereby to polymerize at least part of the photopolymerizable film, the light being emitted from a first linear light source whose long axis is positioned in a direction crossing the moving direction of the assembly; and thereafter (3) polymerizing the photopolymerizable composition of that portion of the film-like molded article which is covered with the light-impervious pattern of the light-pervious body by light irradiation or heating.Type: GrantFiled: April 10, 1990Date of Patent: May 12, 1992Assignees: Nippon Sheet Glass Co., Ltd., Sumitomo Chemical Company, LimitedInventors: Toshifumi Tsujino, Koichi Maeda, Satoshi Ishizuka, Hiroaki Yamamoto, Shinichiro Kitayama, Shigeo Hozumi
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Patent number: 5041507Abstract: A resin composition comprising a polymeleimide compound having two or more maleimide groups in one molecule, a phenol novolac resin of which phenolic hydroxyl groups are epoxidized and allyl-etherified and, as an optional ingredient, a curing agent, or a resin composition comprising a polymaleimide compound having two or more maleimide groups in one molecule, a phenol novolac resin of which phenolic hydroxyl groups are allyl-etherified and an epoxy resin; and a heat resistant composite material comprising cured product of said resin composition as its matrix phase and containing a fiber as its reinforcing material.Type: GrantFiled: June 2, 1989Date of Patent: August 20, 1991Assignee: Sumitomo Chemical Company, LimitedInventors: Shuichi Kanagawa, Kunimasa Kamio, Shigeo Hozumi, Hiroshi Nakamura, Masao Yamagiwa
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Patent number: 4755569Abstract: A thermosetting resin composition comprising (A) a phenol novolac resin, some of the hydroxyl groups of which have been allyl-etherified and the other hydroxyl groups having added thereto a compound having one or more epoxy groups and (B) a polymaleimide compound having two or more maleimide groups in the molecule.Type: GrantFiled: March 2, 1987Date of Patent: July 5, 1988Assignee: Sumitomo Chemical Company, LimitedInventors: Shuichi Kanagawa, Shigeo Hozumi, Kunimasa Kamio