Patents by Inventor Shigeo Nakanishi
Shigeo Nakanishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11489170Abstract: A fuel cell separator includes a separator main body having a first surface and a second surface, and a first seal member disposed on the first surface. When a region on the first surface of the separator main body corresponding to an electrode member disposed on the second surface is defined as a power generation region, and a region on the first surface of the separator main body corresponding to an in-cell seal member is defined as a seal region, a displacement/vibration reducing member made of polymer is disposed at a part of the seal region. The displacement/vibration reducing member includes multiple protrusions and a coupling portion. When viewed in plan view, an axis line connecting the centers of the figures of the adjacent protrusions does not coincide with a center line passing through the widthwise center of the coupling portion. The coupling portion has a gate cut mark.Type: GrantFiled: December 1, 2020Date of Patent: November 1, 2022Assignees: Sumitomo Riko Company Limited, TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hideya Kadono, Shigeo Nakanishi, Shinobu Yamaguchi, Hitoshi Tamura, Shinichi Haga, Motohiro Mizuno, Kenji Sato, Takuya Kurihara, Tomohiro Mazaki
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Publication number: 20210194018Abstract: A fuel cell separator includes a separator main body having a first surface and a second surface, and a first seal member disposed on the first surface. When a region on the first surface of the separator main body corresponding to an electrode member disposed on the second surface is defined as a power generation region, and a region on the first surface of the separator main body corresponding to an in-cell seal member is defined as a seal region, a displacement/vibration reducing member made of polymer is disposed at a part of the seal region. The displacement/vibration reducing member includes multiple protrusions and a coupling portion. When viewed in plan view, an axis line connecting the centers of the figures of the adjacent protrusions does not coincide with a center line passing through the widthwise center of the coupling portion. The coupling portion has a gate cut mark.Type: ApplicationFiled: December 1, 2020Publication date: June 24, 2021Applicants: Sumitomo Riko Company Limited, TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hideya KADONO, Shigeo NAKANISHI, Shinobu YAMAGUCHI, Hitoshi TAMURA, Shinichi HAGA, Motohiro MIZUNO, Kenji SATO, Takuya KURIHARA, Tomohiro MAZAKI
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Patent number: 9005413Abstract: A film formation apparatus includes: a chamber having an inner space in which both a body to be processed and a target are disposed so that the body to be processed and the target are opposed to each other, a first magnetic field generation section generating a magnetic field in the inner space to which the target is exposed; a second magnetic field generation section generating a perpendicular magnetic field so as to allow perpendicular magnetic lines of force thereof to pass between the target the body to be processed; and a third magnetic field generation section disposed at upstream side of the target as seen from the second magnetic field generation section.Type: GrantFiled: July 15, 2010Date of Patent: April 14, 2015Assignee: ULVAC, Inc.Inventors: Shuji Kodaira, Tomoyuki Yoshihama, Koukichi Kamada, Kazumasa Horita, Junichi Hamaguchi, Shigeo Nakanishi, Satoru Toyoda
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Publication number: 20140048413Abstract: There is provided a film forming apparatus for forming a coating film on a surface of an object to be processed by using a sputtering method, the film forming apparatus including: a chamber for accommodating the object and a target serving as a base material for the coating film that are placed so as to face each other; an exhaust unit for reducing the pressure inside the chamber; a magnetic field generating unit for generating a magnetic field in front of the sputtering surface of the target; a direct current power supply for applying a negative direct current voltage to the target; a gas introducing unit for introducing a sputtering gas into the chamber; and a unit for preventing the entering of sputtered particles onto the object until the plasma generated between the target and the object reaches a stable state.Type: ApplicationFiled: October 23, 2013Publication date: February 20, 2014Applicant: ULVAC, INC.Inventors: Shuji KODAIRA, Tomoyuki YOSHIHAMA, Koukichi KAMADA, Kazumasa HORITA, Junichi HAMAGUCHI, Shigeo NAKANISHI, Satoru TOYODA
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Publication number: 20120121818Abstract: A coating surface processing method includes forming a coating on the entire surface of a base body that has fine holes or fine grooves formed on the to-be-filmed surface, including the inner wall surfaces and the inner bottom surfaces of the holes or the grooves, and flattening the coating formed on the inner wall surfaces of the holes or the grooves by carrying out a plasma processing on the surface of the coating.Type: ApplicationFiled: July 21, 2010Publication date: May 17, 2012Applicant: ULVAC, INC.Inventors: Shuji Kodaira, Tomoyuki Yoshihama, Koukichi Kamada, Kazumasa Horita, Junichi Hamaguchi, Shigeo Nakanishi, Satoru Toyoda
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Publication number: 20120118732Abstract: A film formation apparatus includes: a chamber having a side wall and an inner space in which both a body to be processed and a target are disposed a first magnetic field generation section generating a magnetic field in the inner space a second magnetic field generation section disposed at a position close to the target, the second magnetic field generation section generating a magnetic field so as to allow perpendicular magnetic lines of force thereof to pass through a position adjacent to the target; and a third magnetic field generation section disposed at a position close to the body to be processed, the third magnetic field generation section generating a magnetic field so as to induce the magnetic lines of force to the side wall of the chamber.Type: ApplicationFiled: July 15, 2010Publication date: May 17, 2012Applicant: ULVAC, INC.Inventors: Shuji Kodaira, Tomoyuki Yoshihama, Koukichi Kamada, Kazumasa Horita, Junichi Hamaguchi, Shigeo Nakanishi, Satoru Toyoda
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Publication number: 20120111722Abstract: There is provided a film forming apparatus for forming a coating film on a surface of an object to be processed by using a sputtering method, the film forming apparatus including: a chamber for accommodating the object and a target serving as a base material for the coating film that are placed so as to face each other; an exhaust unit for reducing the pressure inside the chamber; a magnetic field generating unit for generating a magnetic field in front of the sputtering surface of the target; a direct current power supply for applying a negative direct current voltage to the target; a gas introducing unit for introducing a sputtering gas into the chamber; and a unit for preventing the entering of sputtered particles onto the object until the plasma generated between the target and the object reaches a stable state.Type: ApplicationFiled: July 15, 2010Publication date: May 10, 2012Applicant: ULVAC, INC.Inventors: Shuji Kodaira, Tomoyuki Yoshihama, Koukichi Kamada, Kazumasa Horita, Junichi Hamaguchi, Shigeo Nakanishi, Satoru Toyoda
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Publication number: 20120103801Abstract: A film formation apparatus includes: a chamber having an inner space in which both a body to be processed and a target are disposed so that the body to be processed and the target are opposed to each other, a first magnetic field generation section generating a magnetic field in the inner space to which the target is exposed; a second magnetic field generation section generating a perpendicular magnetic field so as to allow perpendicular magnetic lines of force thereof to pass between the target the body to be processed; and a third magnetic field generation section disposed at upstream side of the target as seen from the second magnetic field generation section.Type: ApplicationFiled: July 15, 2010Publication date: May 3, 2012Applicant: ULVAC, INC.Inventors: Shuji Kodaira, Tomoyuki Yoshihama, Koukichi Kamada, Kazumasa Horita, Junichi Hamaguchi, Shigeo Nakanishi, Satoru Toyoda
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Publication number: 20120097527Abstract: A film formation apparatus includes: a chamber in which both a body to be processed and a target are disposed; a first magnetic field generation section generating a magnetic field; and a second magnetic field generation section including a first generation portion to which a current defined as “Iu” is applied and a second generation portion to which a current defined as “Id” is applied, the first generation portion being disposed at a position close to the target, the second generation portion being disposed at a position close to the body to be processed, the second magnetic field generation section applying the currents to the first generation portion and the second generation portion so as to satisfy the relational expression Id<Iu, the second magnetic field generation section allowing perpendicular magnetic lines to pass between the target and the body to be processed.Type: ApplicationFiled: July 15, 2010Publication date: April 26, 2012Applicant: ULVAC, INC.Inventors: Shuji Kodaira, Tomoyuki Yoshihama, Koukichi Kamada, Kazumasa Horita, Junichi Hamaguchi, Shigeo Nakanishi, Satoru Toyoda
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Patent number: 6254365Abstract: A compressor capable of reducing the number of components and simplifying a step of forming a connection hole is obtained. In this compressor, a connection hole of a casing is formed substantially flush with the outer surface of the casing without projecting from the outer surface of the casing. Thus, the connection hole is formed by only perforation with no requirement for burring or the like, whereby the step of forming the connection hole is simplified. In this compressor, a refrigerant flow pipe of an accumulator is inserted into a refrigerant suction port. Thus, no pump liner (connection pipe) is required for connecting the refrigerant flow pipe and the refrigerant suction port, and the number of components is reduced.Type: GrantFiled: July 30, 1999Date of Patent: July 3, 2001Assignee: Funai Electric Co., Ltd.Inventor: Shigeo Nakanishi
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Patent number: 5955469Abstract: A pharmaceutical emulsion composition or solution composition in an organic solvent containing a compound represented by the following chemical formula and having immunosuppressive activity is disclosed: ##STR1##Type: GrantFiled: July 25, 1994Date of Patent: September 21, 1999Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Sotoo Asakura, Michiyo Fukae, Shigeo Nakanishi, Yasuto Koyama, Youhei Kiyota
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Patent number: 5589491Abstract: An injection solution comprising a 2-[(2-pyridyl)methylsulfinyl]-benzimidazole compound or a salt thereof having antiulcer activity and an aqueous solvent added with no nonaqueous solvent is disclosed wherein the pH is not less than 9.5 and not more than 11.5.Type: GrantFiled: January 18, 1995Date of Patent: December 31, 1996Assignee: Astra AktiebolagInventors: Shigeo Nakanishi, Tetsuo Tominaga, Iwao Yamanaka, Takashi Higo, Toshiyuki Shibata
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Patent number: 5260301Abstract: A pharmaceutical solution which contains the compound of the general formula having the immusuppreseive activity is disclosed.Type: GrantFiled: December 1, 1992Date of Patent: November 9, 1993Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Shigeo Nakanishi, Iwao Yamanaka
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Patent number: 5210074Abstract: The present invention relates to a dried composition containing IGF-I which is highly soluble and has a long shelf life stability. The present invention further relates to a method of preparing a dried composition containing IGF-I by drying a solution containing IGF-I together with a strong acid which is hydrochloric acid, hydrobromic acid, nitric acid, methanesulfonic acid, sulfuric acid, phosphoric acid, or oxalic acid.Type: GrantFiled: December 26, 1990Date of Patent: May 11, 1993Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Shigeo Nakanishi, Iwao Yamanaka
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Patent number: 4642523Abstract: A coaxial probe extends into a microwave cavity through a tube. One end of the tube is retained in a spherical joint attached in the cavity wall. This allows the coaxial probe to be pivotally rotated. The coaxial probe is slideable within the tube thus allowing the probe to be extended toward or retracted from the center of the cavity.A tunable wall in the cavity is precisely positioned by a plurality of threaded rods extending through threaded bushings which are geared together. Thus, rotation of one of the bushings causes rotation of the other bushings simultaneously whereby the tuning wall is accurately positioned. Means are provided for moving the tube through which the coaxial probe extends in both a side to side and back and forth motion.Type: GrantFiled: February 11, 1985Date of Patent: February 10, 1987Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Shigeo Nakanishi, Frank S. Calco, August R. Scarpelli