Patents by Inventor Shigeo Tachiki

Shigeo Tachiki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5827626
    Abstract: A color filter having excellent optical properties can be produced in high yield using a photo-sensitive composition comprising (a) a resin, (b) one or more pigments, (c) one or more monomers, and (d) a photoinitiator to form a film on a substrate, followed by exposure to light and development using a specific developer containing ##STR1## wherein R.sup.1 is C.sub.1-19 alkyl; and R.sup.2 is C.sub.1-19 alkylene.
    Type: Grant
    Filed: March 8, 1996
    Date of Patent: October 27, 1998
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Yuji Kobayashi, Shigeo Tachiki, Toshihiko Akahori, Syoichi Sasaki, Kouji Yamazaki, Yoichi Kimura
  • Patent number: 5821016
    Abstract: In a colored image forming material comprising (a) a copolymer containing a carboxyl group, (b) a coloring agent, (c) a monomer containing at least one photopolymerizable unsaturated bond in the molecule, (d) a photoinitiator and, when required, (e) a specific sensitizer, the dispersion stability of pigment and the optical sensitivity can be considerably increased by using a specific copolymer of styrene derivative-maleic acid derivative as component (a) and specific benzoimidazole or benzothiazole as component (e), and a photosensitive element or a color filter with distinguished optical characteristics can be obtained therefrom.
    Type: Grant
    Filed: June 28, 1996
    Date of Patent: October 13, 1998
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Tsutomu Satoh, Shigeo Tachiki, Yuji Kobayashi, Toshihiko Akahori, Syoichi Sasaki, Kouji Yamazaki, Yoichi Kimura
  • Patent number: 5279923
    Abstract: A photosensitive resin composition comprising (a) a compound having a group unstable to acids, (b) a compound generating an acid when exposed to actinic light, and (c) a benzotriazole derivative is suitable for forming a positive type photosensitive anionic electrodeposition coating material and is usable for producing printed circuit boards.
    Type: Grant
    Filed: November 27, 1992
    Date of Patent: January 18, 1994
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Masahiko Hiro, Toshihiko Akahori, Shigeo Tachiki
  • Patent number: 5262277
    Abstract: A photosensitive resin composition comprising (A) a polymer obtained by reacting an isocyanate compound having an ethylenic unsaturated group with a polymer which is a reaction product of a tetracarboxylic acid dianhydride and a diamine, and (B) a photoinitiator, can provide a thick film excellent in heat resistant, adhesiveness, flexibility, electrical and mechanical properties, and is particularly suitable for producing a photosensitive element.
    Type: Grant
    Filed: January 22, 1992
    Date of Patent: November 16, 1993
    Assignee: Hitachi Chemical Company, Inc.
    Inventors: Kuniaki Sato, Yasunori Kojima, Shigeo Tachiki, Tohru Kikuchi, Toshiaki Ishimaru, Nobuyuki Hayashi, Mitsumasa Kojima
  • Patent number: 5230984
    Abstract: A resin composition comprising (A) a copolymer obtained by copolymerizing (a) acrylic acid and/or methacrylic acid, (b) at least one compound having an unstable group against an acid such as t-amyl acrylate, t-amyl methacrylate, etc. and (c) a copolymerizable monomer such as n-butyl acrylate and (B) a photoacid generator is effective for providing an electro-deposition bath good in water dispersion stability and an electrodeposited film having high sensitivity and high resolution.
    Type: Grant
    Filed: November 29, 1991
    Date of Patent: July 27, 1993
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Shigeo Tachiki, Masahiko Hiro, Toshihiko Akahori, Takuro Kato
  • Patent number: 4657834
    Abstract: An electrophotographic plate comprising an electroconductive layer, a charge generating layer and a charge transport layer and containing a silane coupling agent at least in the charge generating layer or in the charge transport layer, or at the interface of the charge generating layer and the charge transport layer shows small dark decay, little light fatigue and high sensitivity.
    Type: Grant
    Filed: December 18, 1985
    Date of Patent: April 14, 1987
    Assignees: Hitachi, Ltd., Hitachi Chemical Co., Ltd.
    Inventors: Shigeo Tachiki, Ikutoshi Shibuya, Makoto Fujikura, Atsushi Kakuta
  • Patent number: 4565758
    Abstract: An electrophotographic plate comprising an electroconductive layer, a charge generating layer and a charge transport layer and containing a silane coupling agent at least in the charge generating layer or in the charge transport layer, or at the interface of the charge generating layer and the charge transport layer shows small dark decay, little light fatigue and high sensitivity.
    Type: Grant
    Filed: July 5, 1984
    Date of Patent: January 21, 1986
    Assignees: Hitachi, Ltd., Hitachi Chemical Company Ltd.
    Inventors: Shigeo Tachiki, Ikutoshi Shibuya, Makoto Fujikura, Atsushi Kakuta
  • Patent number: 4302268
    Abstract: A flexible printed-circuit board is covered imagewise with a polymer film as a cover layer to improve the flexibility of the board. The cover layer is formed by laminating a photoprintable, photosensitive layer supported on a flexible support to the surface of a flexible printed-circuit board, exposing the photosensitive layer imagewise to light to form a polymer image in the layer and removing the unexposed areas of the layer to leave an imaged polymer film on the surface of the board. The formation of the cover layer can be easily conducted by a continuous operation.
    Type: Grant
    Filed: May 21, 1980
    Date of Patent: November 24, 1981
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Shigeo Tachiki, Toshiaki Ishimaru, Nobuyuki Hayashi
  • Patent number: 4186122
    Abstract: A polyester resin, polyester-imide resin or polyester-amide-imide resin dissolved in a solvent containing 60% by weight or more of at least one polyhydric alcohol derivative selected from the group consisting of R.sub.1 COO(CHR.sub.2 CH.sub.2 O).sub.n H, R.sub.1 COO(CHR.sub.2 CH.sub.2 O).sub.n COR.sub.3, R.sub.1 O(CHR.sub.2 CH.sub.2 O).sub.n COR.sub.3 and R.sub.1 O(CHR.sub.2 CH.sub.2 O).sub.n R.sub.4, wherein R.sub.1, R.sub.3 and R.sub.4 are independently lower alkyl, aryl or aralkyl; R.sub.2 is hydrogen or methyl; and n is an integer of 1 to 3, gives an electrical insulating coating having excellent storage stability and high resin concentration without causing defects of phenols when used as a solvent.
    Type: Grant
    Filed: August 29, 1977
    Date of Patent: January 29, 1980
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Yasunori Okada, Yuichi Osada, Mineo Nakano, Shozo Kasai, Shigeo Tachiki, Nobuyuki Hayashi, Masahiro Abo
  • Patent number: 4127553
    Abstract: An electrical insulating resin composition comprising a resin obtained by reacting (a) one or more tri- or higher polyhydric alcohols and/or tri- or higher polybasic acids, (b) one or more dihydric alcohols, (c) one or more dibasic acids, (d) one or more monobasic acids containing one or more aromatic rings in the molecule, and/or (e) one or more monohydric alcohols containing one or more aromatic rings in the molecule, and if desired (f) one or more compounds containing or being able to form one or more 5-membered imide rings, can give high solids varnishes without lowering the molecular weight of the resin produced. Said varnishes can give coating films excellent in heat resistance, flexibility and mechanical strengths.
    Type: Grant
    Filed: April 19, 1977
    Date of Patent: November 28, 1978
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Yuichi Osada, Yasunori Okada, Shozo Kasai, Mineo Nakano, Shigeo Tachiki, Nobuyuki Hayashi, Masahiro Abo