Patents by Inventor Shigeru Kubota
Shigeru Kubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240089385Abstract: An image processing apparatus includes a processor configured to: extract position coordinates of each document image from an entire image resulting from photographing multiple documents; perform a first operation that extracts, from the document images included in the entire image, a first document image having two sides parallel with a direction of arrangement of the documents and having a first side of the two sides being a far side from a first coordinate axis, the first side having the shortest distance to the first coordinate axis, the first coordinate axis being in parallel with the direction of the arrangement of the documents set with respect to an origin of the entire image; perform a second operation that extracts, as an document image of the same group, a second document image overlapping an extension of the first side of the extracted first image document; and perform a third operation that sets a page number on each of the extracted document images of the same group in an order of closeness fromType: ApplicationFiled: March 8, 2023Publication date: March 14, 2024Applicant: FUJIFILM Business Innovation Corp.Inventors: Shigeru TAMURA, Yuki TSUCHITOI, Manabu HAYASHI, Fumihito KASAI, Kanade KUBOTA, Yuki IGUCHI, Yuto SHIONO
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Publication number: 20230411194Abstract: This method is for conveying, in a processing system comprising at least one processing unit that performs a desired process on substrates and a conveyance unit that conveys the substrates to the processing unit, a plurality of substrates, which are to be continuously processed, from the conveyance unit to the processing unit. To each of the substrates, an adjustment value for optionally changing processing time is assigned in advance.Type: ApplicationFiled: September 10, 2021Publication date: December 21, 2023Inventors: Wataru NAKAGOMI, Shotaro MURAKAWA, Naoyuki SATO, Fumitaka SENTO, Tatsuya MUKOYAMA, Shigeru KUBOTA, Keisuke HIRAIDE
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Publication number: 20220018020Abstract: The disclosed laminated coating layer includes a metal oxide film formed on a processing target through low-temperature atomic layer deposition. The coating layer includes at least one set of at least two layers of an adhesion layer, a moisture-proof layer, and a waterproof layer, stacked from the surface of the processing target in this order. The adhesion layer is formed of at least one film selected from a metal oxide film and a resin film; the moisture-proof layer is a film containing alumina as a predominant ingredient; and the waterproof layer is formed of at least one film of a resin film and a metal oxide film which is selected from among a silica film, a niobium oxide film, and a zirconium oxide film.Type: ApplicationFiled: December 16, 2019Publication date: January 20, 2022Inventors: Fumihiko HIROSE, Masanori MIURA, Kensaku KANOMATA, Shigeru KUBOTA, Kazuki YOSHIDA
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Publication number: 20210280445Abstract: A substrate processing apparatus is provided. The substrate processing apparatus for processing substrates includes a plurality of processing modules that perform predetermined processes on the substrates, and an information display that displays information about an error that occurred in the predetermined processes. The information display displays, in the same screen, a substrate on which a predetermined process in which the error occurred, a processing module which was performing the predetermined process in which the error occurred, the timing at which the error occurred, and a main cause of the error.Type: ApplicationFiled: June 25, 2019Publication date: September 9, 2021Inventors: Wataru NAKAGOMI, Tatsuya MUKOYAMA, Kazunori KAZAMA, Shigeru KUBOTA, Sho ICHINOSE, Junya CHIZUWA, Akihito KOMIYAMA, Ryuhei HIGASHIMURA
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Patent number: 7774082Abstract: First feedforward calculation is executed when a preprocessing surface profile is measured and a processing chamber with its processing parameter value having been obtained through the first feedforward calculation judged to be within an allowable range is determined. Wafer transfer is executed only in conjunction with a processing chamber having a processing parameter value judged to be within the allowable range, and the wafer is carried to the entry point of the processing chamber. Then, second feedforward calculation is executed by reflecting the results of feedback calculation executed based upon the most recent processing having been executed in the particular processing chamber and wafer processing is executed in the processing chamber based upon the processing parameter value calculated in the second feedforward calculation.Type: GrantFiled: October 4, 2007Date of Patent: August 10, 2010Assignee: Tokyo Electron LimitedInventors: Shigeru Kubota, Shinji Sakano
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Publication number: 20080091290Abstract: First feedforward calculation is executed when a preprocessing surface profile is measured and a processing chamber with its processing parameter value having been obtained through the first feedforward calculation judged to be within an allowable range is determined. Wafer transfer is executed only in conjunction with a processing chamber having a processing parameter value judged to be within the allowable range, and the wafer is carried to the entry point of the processing chamber. Then, second feedforward calculation is executed by reflecting the results of feedback calculation executed based upon the most recent processing having been executed in the particular processing chamber and wafer processing is executed in the processing chamber based upon the processing parameter value calculated in the second feedforward calculation.Type: ApplicationFiled: October 4, 2007Publication date: April 17, 2008Applicant: TOKYO ELECTRON LIMITEDInventors: Shigeru KUBOTA, Shinji Sakano
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Patent number: 7219678Abstract: A dishwasher includes a main body being generally of a box shape with an open front, a washer tub being slidably extracted from and retracted into the main body through the open front, the washer tub having an open top, and a covering member for blocking a gap to be opened between the washer tub and the main body when the washer tub is fully extracted from the main body. Therefore, when the washer tub is fully extracted from the main body, a rear end of an inner wall of the washer tub is located in front of a front end of the main body to open the gap and the opened gap is covered by the covering member.Type: GrantFiled: September 23, 2003Date of Patent: May 22, 2007Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Hiroyuki Nakano, Yoshikazu Shinchi, Shigeru Kubota
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Publication number: 20040060308Abstract: Upon a selector operation of a valve such as a four-way selector valve provided in a refrigerating cycle for selecting a channel of fluid, prevention of environmental pollution and energy saving and the like are effectively achieved. A sliding valve is coupled with a piston in a housing of a channel selector valve provided in a refrigerating cycle and the sliding valve moves due to a difference in pressure and so on at both sides of the piston, thereby a channel of fluid is selected. A processing section of a control device is constituted with microcomputers of an indoor and outdoor control sections, while a detecting section of the control device includes temperature sensor, detection means for detecting pressure, detection means for detecting flow rate, detection means for detecting voltage/current, and detection means for detecting frequency.Type: ApplicationFiled: August 5, 2003Publication date: April 1, 2004Inventors: Yoshitaka Yoshizawa, Kenji Suzuki, Mitsuaki Noda, Shigeru Kubota, Tadashi Aoki, Hiroshi Ito, Nobuyuki Kiuchi, Seiichi Nakahara
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Patent number: 6684651Abstract: Upon a selector operation of a valve such as a four-way selector valve provided in a refrigerating cycle for selecting a channel of fluid, prevention of environmental pollution and energy saving and the like are effectively achieved. A sliding valve is coupled with a piston in a housing of a channel selector valve provided in a refrigerating cycle and the sliding valve moves due to a difference in pressure and so on at both sides of the piston, thereby a channel of fluid is selected. A processing section of a control device is constituted with microcomputers of an indoor and outdoor control sections, while a detecting section of the control device includes temperature sensor, detection means for detecting pressure, detection means for detecting flow rate, detection means for detecting voltage/current, and detection means for detecting frequency.Type: GrantFiled: January 2, 2001Date of Patent: February 3, 2004Assignee: Kabushiki Kaisha Saginomiya SeisakushoInventors: Yoshitaka Yoshizawa, Kenji Suzuki, Mitsuaki Noda, Shigeru Kubota, Tadashi Aoki, Hiroshi Ito, Nobuyuki Kiuchi, Seiichi Nakahara
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Patent number: 5981146Abstract: When a fine pattern is formed by using a chemical-amplification-type resist film, fall of acid in the surface of the resist can be inhibited so that a fine pattern exhibiting an excellent shape is formed. A resist coating film containing a compound having a sulfonic acid group or a carbonic acid group is formed on a chemical-amplification-type resist film of a semiconductor substrate, followed by performing exposure.Type: GrantFiled: January 28, 1997Date of Patent: November 9, 1999Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Teruhiko Kumada, Atsuko Sasahara, Youko Tanaka, Hideo Horibe, Shigeru Kubota, Hiroshi Koezuka, Tetsuro Hanawa
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Patent number: 5637443Abstract: An uncomplicated and easy to control process for forming patterns, wherein an active beam sensitive resin is exposed to an active beam such that a correctly formed pattern is produced on the resin. The process comprises the steps of forming a film of an active beam sensitive resin on a substrate, exposing the film to an active beam, and developing the exposed film with a developing solution comprising a weakly basic salt in a basic aqueous solution having a hydrogen ion concentration sufficient to finish the developing within a desired period of time and an ionic strength sufficient to prevent a substantial decrease in the thickness of the exposed film.Type: GrantFiled: July 5, 1994Date of Patent: June 10, 1997Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Yasuhiro Yoshida, Shigeru Kubota, Akihiko Yamaguchi, Kenichiro Ishibashi
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Patent number: 5204218Abstract: Disclosed herein is a photosensitive resin composition containing:a photobase generator expressed in the following general formula (I): ##STR1## where R.sub.1, R.sub.2 and R.sub.3 are individually selected from the group consisting of hydrogen, halogen, alkyl groups, alkenyl groups, alkinyl groups, phenyl groups and alkoxy groups; anda base-catalytic reaction compound which is cured or decomposed under basic conditions.Type: GrantFiled: June 17, 1991Date of Patent: April 20, 1993Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Teruhiko Kumada, Youko Tanaka, Hideo Horibe, Shigeru Kubota, Hiroshi Koezuka
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Patent number: 5152390Abstract: An automatic chip separating and feeding apparatus capable of permitting chips to be individually separated and transferred at a high speed and with high reliability for charging. A chip transfer controller which includes a projectable stopper pin and a photosensor are arranged between a linear alignment feeder and any one of chip supports of a wheel to control the projecting of said stopper pin and the actuation of the wheel in association with detection by the photosensor to individually separate chips fed by the feeder and transfer them one by one to the chip supports of the wheel by suction.Type: GrantFiled: December 29, 1990Date of Patent: October 6, 1992Assignee: Nitto Kogyo Kabushiki KaishaInventors: Shigeru Kubota, Shoji Kanou, Masahiro Kubo
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Patent number: 5100762Abstract: A radiation-sensitive polymer is capable of resistance to the dry etching when it is applied to form very fine patterns in VLSIs and other semiconductor devices, wherein the polymer is a radiation-sensitive polymer that contains at least one unit represented by the general formula (I): ##STR1## (where X is an alkyl group, a halogen atom or a halogenated alkyl group; R.sup.1 is an alkyl group, an alkoxy or an aryl group; R.sup.2 is carbon monoxide; M is Si, Ge, Sn, Ti, Mo or W; k is a number defined by the valence of (M minus 1); and l is zero or a positive integer), and which optionally contains at least one unit represented by the general formula (II): ##STR2## (where Y is an alkyl group, a halogen atom or a halogenated alkyl group; R.sup.3 is an alkyl group or an aryl group) and/or at least one unit represented by the general formula (III):--SO.sub.2 --R.sup.4 (III)(where R.sup.4 is a divalent alkyl or aryl group).Type: GrantFiled: July 9, 1990Date of Patent: March 31, 1992Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Youko Tanaka, Shigeru Kubota, Hideo Horibe, Hiroshi Koezuka, Teruhiko Kumada
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Patent number: 4988605Abstract: The present invention relates to a light-sensitive resin composition that has resistance to heat and chemicals, is particularly adapted for use in the formation of a protective film for chemical plating and which is also improved in resistance to the heat of soldering. This light-sensitive resin composition contains (a) a polyurethane (meth)acrylate, (aa) a bisphenol type epoxy (meth)acrylate, (b) a linear high-molecular weight compound, and (c) a polymerization initiator which generates free radicals upon exposure to light. This resin composition is applicable to the manufacture of printed circuit boards by the additive process.Type: GrantFiled: March 2, 1989Date of Patent: January 29, 1991Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Shigeru Kubota, Katsue Masui, Toshimoto Moriwaki, Torahiko Andou
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Patent number: 4983252Abstract: In a process for fabricating a printed circuit board, a positive resist layer is electrodeposited on a copper clad laminate to ensure that the walls of through-holes in the substrate are completely coated with the resist, or alternatively, a film having a positive resist layer coated thereon is thermocompressed onto the copper clad laminate with the film being in contract with the latter, so as to cover both top and bottom of each through-hole. By subsequent treatments including resist exposure, development, copper foil etching and resist stripping, a high-density wiring pattern can be formed on the substrate in a uniform and consistent way even if through-holes exist in the substrate.Type: GrantFiled: April 10, 1989Date of Patent: January 8, 1991Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Katsue Masui, Isao Kobayashi, Shigeru Kubota, Toshimoto Moriwaki
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Patent number: 4953749Abstract: A chip separation and alignment apparatus capable of accurately and readily accomplishing separation and alignment of chips with a simple construction. The apparatus includes a chip separation and alignment section and a chip separation section. The chip separation and alignment section includes a chip cassette formed into a flat rectangular box-like shape, in which are formed a chip storage chamber, a chip alignment hole provided with an upper end opening through which the chip alignment hole is communicated with a lower portion of the chip storage chamber and a lower end opening, and at least one air ejection port arranged near the upper end opening to intermittently eject air therethrough. The chip separation section is arranged at the lower end opening of the chip alignment hole to separate chips one by one and to successively supply the separated chips to a subsequent step.Type: GrantFiled: December 5, 1988Date of Patent: September 4, 1990Assignee: Nitto Kogyo Kabushiki KaishaInventors: Shigeru Kubota, Shoji Kanou, Masahiro Kubo
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Patent number: 4801044Abstract: A chip separation and alignment apparatus capable of accurately and readily accomplishing separation and alignment of chips with a simple construction. The apparatus includes a chip separation and alignment section and a chip separation section. The chip separation and alignment section includes a chip cassette formed into a flat rectangular box-like shape, in which are formed a chip storage chamber, a chip alignment hole provided with an upper end opening through which the chip alignment hole is communicated with a lower portion of the chip storage chamber and a lower end opening, and at least one air ejection port arranged near the upper end opening to intermittenly eject air therethrough. The chip separation section is arranged at the lower end opening of the chip alignment hole to separate chips one by one and to successively supply the separated chips to a subsequent step.Type: GrantFiled: May 27, 1987Date of Patent: January 31, 1989Assignee: Nitto Kogyo Kabushiki KaishaInventors: Shigeru Kubota, Shoji Kanou, Masahiro Kubo
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Patent number: 4670981Abstract: A method of mounting electronic parts on the predetermined positions of a printed circuit board is disclosed which is capable of simultaneously correcting the misregistration of a plurality of electronic parts by one cycle of operations so as to precisely position and mount the electronic parts on the printed circuit board. In the present invention, the misregistration of individual electronic parts with respect to suction tubes of a suction head in an automatic chip-mounting apparatus is corrected at the time when the suction tubes suck up the electronic parts from the cavities of the jig in which the electronic parts are charged to thereby place each of the suction tubes on the predetermined or exact suction position of the electronic parts or align the center of each of the electronic parts with that of the corresponding suction tube.Type: GrantFiled: February 28, 1986Date of Patent: June 9, 1987Assignee: Nitto Kogyo Kabushiki KaishaInventors: Shigeru Kubota, Shoji Kanou, Masahiro Kubo
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Patent number: 4376840Abstract: A flame retardant liquid rubber composition comprises a hydrogenated polyhydroxybutadiene polymer and castor oil, which are modified with an isocyanate having the formula ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 respectively represent a lower alkyl group or hydrogen atom and n is an integer of 1 to 4, and alumina hydrate and magnesium hydroxide. The castor oil can be incorporated before adding said isocyanate or can be converted into an isocyanate prepolymer by reacting with said isocyanate before the addition.Type: GrantFiled: October 7, 1980Date of Patent: March 15, 1983Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Toshimoto Moriwaki, Kiyoshi Hani, Shigeru Kubota, Shohei Eto, Akira Fukami, Ichiro Yamasaki