Abstract: At a surface region of an N?-type base region, surrounded by a P-type isolation region, a P+-type collector region, a P+-type emitter region, an N+-type base contact region, and an N-type rectifying region are formed. The N-type rectifying region straddles over the emitter region and the base contact region. The rectifying region has an impurity concentration higher than that of the base region, and lower than that of the base contact region. The forward voltage at the interface of the rectifying region and the emitter region is higher than the forward voltage at the interface of the base region and the emitter region. Therefore, the current from the emitter region flows to the collector region, and does not flow that much to the isolation region. By this, leakage current is small. Also, because the collector region does not surround the emitter region, the element size is small.

Abstract: An apparatus for controlling the progress of product processing comprises: processing state control means for controlling the states of processing for a plurality of products in a plurality of apparatus composing a production line; processing progress sensing means for sensing the progress of processing for a first product of the plurality of products based on the states of processing for the plurality of products; processing schedule extracting means for extracting a processing schedule for the first product from predetermined processing schedules for the plurality of products; and processing priority changing means for changing, based on the result of a comparison between the progress of processing for the first product and the processing schedule for the first product, a processing priority for a second product of the plurality of products which is related to the first product.

Abstract: An electric-power-generating-facility operation management support system includes a condition-input unit inputting costs of electric power generation in electric power generating facilities, probability distribution of predicted values of the demand for electric power, and probability distribution of predicted values of the transaction price of power on the market. An optimal-operational-condition calculating unit calculates the performance of power generation of the power generating facilities based upon the costs of power generation, the probability distribution of predicted values of the demand for power and the probability distribution of predicted values of the transaction price of power on the market, input from the condition-input unit so as to obtain the optimal operational conditions which exhibit the maximum performance of power generation A risk estimating unit calculates and estimates a risk value of damage of the optimal operation under the optimal operational conditions.

Abstract: A tape printing apparatus is provided which allows a tape cassette or battery to be replaced easily without removing a protector when the tape cassette or battery is replaced. The first protector member which covers a first end section of each of the upper unit of the main body, the lower unit of main body and the cover member to protect the tape printing apparatus and the second protector member located at a second end section for covering the second end section is separated between the main body and the cover member.

Abstract: An operation support system for a power plant includes an input unit for inputting measured data of the power plant over a communication network, a data evaluating unit for quantitatively evaluating performance deterioration of the power plant and component equipment thereof and creating operation support data base on the input measured data, and an output unit for outputting the operation support data to a computer for confirming operation support data connected thereto over the communication network.

Abstract: In the method for determining a preceding wafer, at least one semiconductor wafer is determined as a preceding wafer among a plurality of semiconductor wafers constituting one lot. The preceding wafer is then subjected to a given process among a plurality of processes for fabrication of a semiconductor device. The determination of the preceding wafer is based on processing results of an upstream process among the plurality of processes performed for the plurality of semiconductor wafers prior to the given process. After examination of processing results of the given process on the preceding wafer, the given process is performed for the plurality of semiconductor wafers other than the preceding wafer.

Abstract: In the method for determining a preceding wafer, at least one semiconductor wafer is determined as a preceding wafer among a plurality of semiconductor wafers constituting one lot. The preceding wafer is then subjected to a given process among a plurality of processes for fabrication of a semiconductor device. The determination of the preceding wafer is based on processing results of an upstream process among the plurality of processes performed for the plurality of semiconductor wafers prior to the given process. After examination of processing results of the given process on the preceding wafer, the given process is performed for the plurality of semiconductor wafers other than the preceding wafer.

Abstract: An anti fibrotic agent, comprising a sphingosine 1-phosphate (S1P) receptor agonist or sphingosine 1-phosphate (S1P) as an active ingredient. Since an S1P receptor agonist, particularly S1P, has activity of inhibiting fibrosis in various organs, it is useful in preventing and/or treating diseases caused by fibrosis in organs, such as pulmonary fibrosis, interstitial pneumonia, chronic hepatitis, hepatic cirrhosis, chronic renal failure, renal glomerulosclerosis, etc.

Abstract: When the operation of any of manufacturing apparatus is halted, influence exerted by the operation halt on the manufacturing state of each of products is evaluated based on the difference between the number of products in a processing waiting state in the manufacturing apparatus at a time at which the operation of the manufacturing apparatus is halted or at a time antecedent thereto and the number of products in the processing waiting state in the manufacturing apparatus at a time at which the manufacturing apparatus is reoperated after the operation thereof is halted or at a time posterior thereto or on the difference between the period during which the product processed by the manufacturing apparatus during a given period antecedent to the time at which the operation of the manufacturing apparatus is halted is in the processing waiting state in the manufacturing apparatus and the period during which the product processed by the manufacturing apparatus during the given period posterior to the time at which t

Abstract: In the method for determining a preceding wafer, at least one semiconductor wafer is determined as a preceding wafer among a plurality of semiconductor wafers constituting one lot. The preceding wafer is then subjected to a given process among a plurality of processes for fabrication of a semiconductor device. The determination of the preceding wafer is based on processing results of an upstream process among the plurality of processes performed for the plurality of semiconductor wafers prior to the given process. After examination of processing results of the given process on the preceding wafer, the given process is performed for the plurality of semiconductor wafers other than the preceding wafer.

Abstract: In the method for determining a preceding wafer, at least one semiconductor wafer is determined as a preceding wafer among a plurality of semiconductor wafers constituting one lot. The preceding wafer is then subjected to a given process among a plurality of processes for fabrication of a semiconductor device. The determination of the preceding wafer is based on processing results of an upstream process among the plurality of processes performed for the plurality of semiconductor wafers prior to the given process. After examination of processing results of the given process on the preceding wafer, the given process is performed for the plurality of semiconductor wafers other than the preceding wafer.

Abstract: This invention facilitates providing an information processing service. In an information processing service providing method of the present invention by a computer, an event which requests an additional information processing service associated with an information processing service provided through a network is detected. When the event is detected, a library in which invocation of an additional function of providing the additional information processing service is defined is referred to. On the basis of the reference result of the library, the additional function of providing the additional information processing service is requested to execute processing.

Abstract: The production control system of this invention includes a request system for setting executive functions to be executed for controlling apparatuses installed in manufacturing plants, and an agent system for instructing execution systems for controlling the apparatuses installed in the manufacturing plants to execute the executive functions. The agent system is connected with the request system or the execution systems through a computer network. Therefore, the request system controls the apparatuses installed in the manufacturing plants through the agent system.

Abstract: When the operation of any of manufacturing apparatus is halted, influence exerted by the operation halt on the manufacturing state of each of products is evaluated based on the difference between the number of products in a processing waiting state in the manufacturing apparatus at a time at which the operation of the manufacturing apparatus is halted or at a time antecedent thereto and the number of products in the processing waiting state in the manufacturing apparatus at a time at which the manufacturing apparatus is reoperated after the operation thereof is halted or at a time posterior thereto or on the difference between the period during which the product processed by the manufacturing apparatus during a given period antecedent to the time at which the operation of the manufacturing apparatus is halted is in the processing waiting state in the manufacturing apparatus and the period during which the product processed by the manufacturing apparatus during the given period posterior to the time at which t