Abstract: A substrate processing apparatus that dries a liquid adhering to a substrate by using a processing fluid in a supercritical state, includes: a processing container in which the substrate is accommodated; a plurality of pipes configured to allow the processing fluid to flow to and from the processing container therethrough; a first fluid heating device configured to heat a first pipe that supplies the processing fluid to an interior of the processing container among the plurality of pipes; and a second fluid heating device configured to heat a second pipe that discharges the processing fluid from the interior of the processing container among the plurality of pipes.

Abstract: A substrate processing method according to an embodiment of the present disclosure includes a step of holding a substrate by a substrate holding unit (31) which is rotatable, a step of arranging a top plate portion (41) above the substrate, a step of supplying a processing liquid to the substrate, and a step of supplying a rinsing liquid (Lr) between the substrate and the top plate portion (41) to wash the substrate and the top plate portion (41) with the rinsing liquid (Lr).

Abstract: A substrate processing method according to an embodiment of the present disclosure includes a step of holding a substrate by a substrate holding unit (31) which is rotatable, a step of arranging a top plate portion (41) above the substrate, a step of supplying a processing liquid to the substrate, and a step of supplying a rinsing liquid (Lr) between the substrate and the top plate portion (41) to wash the substrate and the top plate portion (41) with the rinsing liquid (Lr).

Abstract: A substrate processing method according to an embodiment of the present disclosure includes a step of holding a substrate by a substrate holding unit (31) which is rotatable, a step of arranging a top plate portion (41) above the substrate, a step of supplying a processing liquid to the substrate, and a step of supplying a rinsing liquid (Lr) between the substrate and the top plate portion (41) to wash the substrate and the top plate portion (41) with the rinsing liquid (Lr).

Abstract: A local exposure apparatus for performing exposure processing on a specific area of a photosensitive film formed on a substrate includes a substrate conveyor configured to define a substrate conveying path and to horizontally convey the substrate along the substrate conveying path, a chamber configured to define an exposure processing space, a light source including a plurality of light-emitting elements linearly arranged above the substrate conveying path, a light emission drive unit configured to selectively drive one or more of the light-emitting elements of the light source, a substrate detector configured to detect the substrate conveyed by the substrate conveyor, and a control unit configured to control the light emission drive unit such that, when the specific area of the photosensitive film moves below the light source, only the light-emitting elements capable of irradiating the given area are driven to emit the light.

Abstract: A local exposure apparatus for performing exposure processing on a specific area of a photosensitive film formed on a substrate includes a substrate conveyor configured to define a substrate conveying path and to horizontally convey the substrate along the substrate conveying path, a chamber configured to define an exposure processing space, a light source including a plurality of light-emitting elements linearly arranged above the substrate conveying path, a light emission drive unit configured to selectively drive one or more of the light-emitting elements of the light source, a substrate detector configured to detect the substrate conveyed by the substrate conveyor, and a control unit configured to control the light emission drive unit such that, when the specific area of the photosensitive film moves below the light source, only the light-emitting elements capable of irradiating the given area are driven to emit the light.

Abstract: Sebum production inhibitors containing as an active ingredient a compound of general formula (1) below having a glucuronic acid derivative and a glucosamine derivative in the structure or a pharmacologically acceptable salt thereof

Abstract: {circle around (1)} Compounds of the following general formula (1) having a glucuronic acid derivative and a glucosamine derivative in the structure thereof, pharmacologically acceptable salts and solvates of the compounds, or solvates of the salts, {circle around (2)} a method for producing the compounds {circle around (1)}, {circle around (3)} a pharmaceutical composition containing the compounds {circle around (1)}, {circle around (4)} polymers having at least one of the compounds {circle around (1)} as a side chain structure, {circle around (5)} a coating agent containing the compound {circle around (1)} or the polymer as one of active ingredients, and {circle around (6)} molded products, artificial organs, medical devices, and equipment for cell culture, which have been produced using the polymer {circle around (4)} and/or the coating agent {circle around (5)}.

Abstract: A battery charger is capable of accurately determining that a battery has reached a fully charged condition regardless of the kind of the batteries to be charged, the condition of the battery, battery temperature at the time when charging starts, charge current, and ambient temperature. A battery temperature is sampled at every predetermined timing, and a change in battery temperature rise gradient is computed each time the battery temperature is sampled. It is determined that the battery has reached the fully charged condition based on a transition changing from increment to decrement of the change in battery temperature rise gradient.

Abstract: A battery charger is capable of accurately determining that a battery has reached a fully charged condition regardless of the kind of the batteries to be charged, the condition of the battery, battery temperature at the time when charging starts, charge current, and ambient temperature. A battery temperature is sampled at every predetermined timing, and a change in battery temperature rise gradient is computed each time the battery temperature is sampled. It is determined that the battery has reached the fully charged condition based on a transition changing from increment to decrement of the change in battery temperature rise gradient.

Abstract: A charging circuit generates a charging current from an ac supply which is supplied to a secondary battery in a battery package through first terminals. A second terminal receives a temperature detection signal from a thermistor on the secondary battery. A value of the temperature detection signal is sampled every predetermined interval. A memory stores the sampled value. A difference between the sampled value and the value from the memory is obtained, as well as the temperature decrease value between the sampled value and the value stored, when it applies. An error signal is generated when the difference is higher than a predetermined value and the operator is alarmed and informed of the error. The difference may be obtained between the sampled value and the value one-cycle-previously-sampled value from the memory, between the sampled value and a minimum of the sampled values, or between the sampled value and a charging start value of the sampled value.

Abstract: According to this invention, there is provided to a method of manufacturing semiconductor devices including the steps of ion-implanting at least one impurity selected from As, P, Sb, Si, B, Ga, and Al in a wafer prior to a predetermined manufactural process of semiconductor devices in the semiconductor wafer grown by the Czochralski technique, and thereafter annealing the wafer at a temperature of at least 900.degree. C. Nonuniformity of an impurity concentration of the wafer can be improved. The difference in characteristics among the semiconductor devices manufactured in the wafer is decreased, a product yield can be increased, and the quality of the semiconductor devices can be improved.

Abstract: A method for cold rolling a strip is wherein brushing roll are provided to both the work rolls and the back up rolls of the temper mill, to remove particles from the surface of the rolls of the mill and suction ducts adjacent to the brushing rolls transport the foreign objects out of the mill system. The sucking speed at the duct is at least 5 m/sec., and preferably 8 m/sec. The length of the bristle is from 15 to 60 mm, the diameter thereof being from 0.15 mm to 1.0 mm, and the material thereof is selected from a group of nylon, propyrene, or a the mixture thereof. The density of the bristle with respect to the peripheral surface area of the brushing rolls for the work roll is from 55 to 85% by area. Abrasive grains with a grain size of #300 to #1200 are incorporated in the brush of said brushing roll which enhance the brushing ability.

Abstract: A semiconductor device comprises a semiconductor substrate in which a plurality of semiconductor regions are formed, a front surface electrode in contact with the region, and a back surface electrode consisting of a gold alloy layer and a silver layer. After formation of the front surface electrode, the back side of the substrate is polished. Then, the gold alloy layer and the silver layer are formed in succession on the polished back surface of the substrate.