Patents by Inventor Shigeru Ooyanagi

Shigeru Ooyanagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reducing agent forming device and exhaust gas control system using the same
    Patent number: 7763214
    Abstract: A reforming device includes a reforming part that subjects a hydrocarbon-based raw material to be reformed to a reforming reaction to form a reducing agent to be supplied to a reducing catalyst for reducing nitrogen oxide selectively. The reforming part has a reforming reaction region through which the raw material to be reformed passes and is reacted with supplied hydrogen atoms supplied so as to be reformed to the reducing agent. For example, a hydrogen permeable membrane having a first surface and a second surface may be provided in the reforming part to permeate hydrogen atoms from the first surface to the second surface and to produce the hydrogen atoms on the second surface. The reforming device can be suitably used for an exhaust gas control system for cleaning exhaust gas, for example.
    Type: Grant
    Filed: September 25, 2006
    Date of Patent: July 27, 2010
    Assignee: Denso Corporation
    Inventors: Katsunori Iwase, Tetsuo Toyama, Shigeru Ooyanagi, Yoshiaki Nishijima, Masahiro Okajima
  • Reducing agent reforming device and exhaust gas control system using the same
    Publication number: 20070068144
    Abstract: A reforming device includes a reforming part that subjects a hydrocarbon-based raw material to be reformed to a reforming reaction to form a reducing agent to be supplied to a reducing catalyst for reducing nitrogen oxide selectively. The reforming part has a reforming reaction region through which the raw material to be reformed passes and is reacted with supplied hydrogen atoms supplied so as to be reformed to the reducing agent. For example, a hydrogen permeable membrane having a first surface and a second surface may be provided in the reforming part to permeate hydrogen atoms from the first surface to the second surface and to produce the hydrogen atoms on the second surface. The reforming device can be suitably used for an exhaust gas control system for cleaning exhaust gas, for example.
    Type: Application
    Filed: September 25, 2006
    Publication date: March 29, 2007
    Applicant: DENSO CORPORATION
    Inventors: Katsunori Iwase, Tetsuo Toyama, Shigeru Ooyanagi, Yoshiaki Nishijima, Masahiro Okajima